EP2971260A4 - Electrolytic generation of manganese (iii) ions in strong sulfuric acid - Google Patents

Electrolytic generation of manganese (iii) ions in strong sulfuric acid Download PDF

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Publication number
EP2971260A4
EP2971260A4 EP14779082.8A EP14779082A EP2971260A4 EP 2971260 A4 EP2971260 A4 EP 2971260A4 EP 14779082 A EP14779082 A EP 14779082A EP 2971260 A4 EP2971260 A4 EP 2971260A4
Authority
EP
European Patent Office
Prior art keywords
manganese
ions
iii
sulfuric acid
strong sulfuric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP14779082.8A
Other languages
German (de)
French (fr)
Other versions
EP2971260B1 (en
EP2971260A1 (en
Inventor
Trevor Pearson
Terence Clarke
Roshan V. CHAPANERI
Craig Robinson
Alison Hyslop
Amrik Singh
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MacDermid Acumen Inc
Original Assignee
MacDermid Acumen Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US13/795,382 external-priority patent/US9534306B2/en
Application filed by MacDermid Acumen Inc filed Critical MacDermid Acumen Inc
Priority to PL14779082T priority Critical patent/PL2971260T3/en
Priority to SI201431343T priority patent/SI2971260T1/en
Publication of EP2971260A1 publication Critical patent/EP2971260A1/en
Publication of EP2971260A4 publication Critical patent/EP2971260A4/en
Application granted granted Critical
Publication of EP2971260B1 publication Critical patent/EP2971260B1/en
Priority to HRP20191626 priority patent/HRP20191626T1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00Electrolytic production of inorganic compounds or non-metals
    • C25B1/01Products
    • C25B1/21Manganese oxides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/2006Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
    • C23C18/2046Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
    • C23C18/2073Multistep pretreatment
    • C23C18/2086Multistep pretreatment with use of organic or inorganic compounds other than metals, first
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/22Roughening, e.g. by etching
    • C23C18/24Roughening, e.g. by etching using acid aqueous solutions
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/042Electrodes formed of a single material
    • C25B11/043Carbon, e.g. diamond or graphene
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/075Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound
    • C25B11/081Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound the element being a noble metal
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00Operating or servicing cells
    • C25B15/02Process control or regulation
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/54Electroplating of non-metallic surfaces
    • C25D5/56Electroplating of non-metallic surfaces of plastics

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Automation & Control Theory (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Chemically Coating (AREA)
  • ing And Chemical Polishing (AREA)
  • Chemical Or Physical Treatment Of Fibers (AREA)
EP14779082.8A 2013-03-12 2014-03-07 Electrolytic generation of manganese (iii) ions in strong sulfuric acid Active EP2971260B1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
PL14779082T PL2971260T3 (en) 2013-03-12 2014-03-07 Electrolytic generation of manganese (iii) ions in strong sulfuric acid
SI201431343T SI2971260T1 (en) 2013-03-12 2014-03-07 Electrolytic generation of manganese (iii) ions in strong sulfuric acid
HRP20191626 HRP20191626T1 (en) 2013-03-12 2019-09-10 Electrolytic generation of manganese (iii) ions in strong sulfuric acid

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/795,382 US9534306B2 (en) 2012-01-23 2013-03-12 Electrolytic generation of manganese (III) ions in strong sulfuric acid
PCT/US2014/021618 WO2014164272A1 (en) 2013-03-12 2014-03-07 Electrolytic generation of manganese (iii) ions in strong sulfuric acid

Publications (3)

Publication Number Publication Date
EP2971260A1 EP2971260A1 (en) 2016-01-20
EP2971260A4 true EP2971260A4 (en) 2017-04-19
EP2971260B1 EP2971260B1 (en) 2019-06-19

Family

ID=51658840

Family Applications (1)

Application Number Title Priority Date Filing Date
EP14779082.8A Active EP2971260B1 (en) 2013-03-12 2014-03-07 Electrolytic generation of manganese (iii) ions in strong sulfuric acid

Country Status (18)

Country Link
EP (1) EP2971260B1 (en)
JP (1) JP6167222B2 (en)
KR (1) KR101749947B1 (en)
CN (1) CN105209667B (en)
AU (1) AU2014249521B2 (en)
BR (1) BR112015021067B1 (en)
CA (2) CA2901589C (en)
DK (1) DK2971260T3 (en)
ES (1) ES2745071T3 (en)
HR (1) HRP20191626T1 (en)
HU (1) HUE045344T2 (en)
LT (1) LT2971260T (en)
MX (1) MX2015012584A (en)
PL (1) PL2971260T3 (en)
PT (1) PT2971260T (en)
SI (1) SI2971260T1 (en)
TW (1) TWI489007B (en)
WO (1) WO2014164272A1 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9267077B2 (en) * 2013-04-16 2016-02-23 Rohm And Haas Electronic Materials Llc Chrome-free methods of etching organic polymers with mixed acid solutions
EP2937446B1 (en) * 2013-10-22 2018-06-13 Okuno Chemical Industries Co., Ltd. Composition for etching treatment of resin material
CN105483715B (en) * 2015-12-09 2018-01-30 哈尔滨工业大学 The template 3D etching preparation methods of the micro-nano combined multi-stage Porous materials of magnesium based metal
CN106830204B (en) * 2017-03-13 2020-04-28 重庆大学 Method and device for degrading pollutants in water by exciting permanganate through electrochemical cathode
BR112020000505A2 (en) * 2017-07-10 2020-07-14 Srg Global, Inc. hexavalent chromium-free manganese chemical attack agent recovery system
CN109256180B (en) * 2018-07-03 2022-02-11 南昌立德生物技术有限公司 Sensitivity analysis algorithm for computer-aided pilot medicament optimization design
JP7336126B2 (en) * 2019-03-11 2023-08-31 国立研究開発法人産業技術総合研究所 High-value manganese production method and production apparatus
EP3825441A1 (en) * 2019-11-21 2021-05-26 COVENTYA S.p.A. An electrolytic treatment device for preparing plastic parts to be metallized and a method for etching plastic parts
US11842958B2 (en) * 2022-03-18 2023-12-12 Chun-Ming Lin Conductive structure including copper-phosphorous alloy and a method of manufacturing conductive structure

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1979000258A1 (en) * 1977-11-02 1979-05-17 Diamond Shamrock Techn The production of electrolytic manganese dioxide
US5213665A (en) * 1988-02-29 1993-05-25 Nippon Shokubai Kagaku Kogyo, Co., Ltd. Process for producing 1-aminoanthraquinones
EP2025708A1 (en) * 2007-08-10 2009-02-18 Enthone Inc. Chromium-free etchant for plastic surfaces
US20100155255A1 (en) * 2007-05-22 2010-06-24 Okuno Chemical Industries Co., Ltd. Pretreatment process for electroless plating of resin molded body, method for plating resin molded body, and pretreatment agent
WO2013112268A2 (en) * 2012-01-23 2013-08-01 Macdermid Acumen, Inc. Etching of plastic using acidic solutions containing trivalent manganese

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3065155A (en) 1960-09-02 1962-11-20 Manganese Chemicals Corp Electrolytic manganese dioxide process
US3793171A (en) * 1970-09-04 1974-02-19 Carrier Corp Process for removing pollutants from gas streams
JPS51764A (en) * 1974-06-25 1976-01-06 Mitsui Mining & Smelting Co MUDENKAIDOMETSUKIHAISUINO SHORIHOHO
US3941677A (en) * 1974-06-27 1976-03-02 Carrier Corporation Electrolytic regeneration cell
US4279705A (en) * 1980-02-19 1981-07-21 Kerr-Mcgee Corporation Process for oxidizing a metal of variable valence by constant current electrolysis
JPS6013087A (en) * 1983-07-05 1985-01-23 Kawasaki Kasei Chem Ltd Electrolyzing method of cerous sulfate
JPS6447890A (en) * 1987-08-13 1989-02-22 Kenzo Yamaguchi Electrolytic synthesis method
US4911802A (en) * 1988-03-09 1990-03-27 Macdermid, Incorporated Conversion of manganate to permanganate
US4936970A (en) * 1988-11-14 1990-06-26 Ebonex Technologies, Inc. Redox reactions in an electrochemical cell including an electrode comprising Magneli phase titanium oxide
US5318803A (en) * 1990-11-13 1994-06-07 International Business Machines Corporation Conditioning of a substrate for electroless plating thereon
JPH05112872A (en) * 1991-10-21 1993-05-07 Okuno Seiyaku Kogyo Kk Method for electroless-plating polyimide resin and pre-etching composition
US5246553A (en) * 1992-03-05 1993-09-21 Hydro-Quebec Tetravalent titanium electrolyte and trivalent titanium reducing agent obtained thereby
JP3806181B2 (en) * 1996-05-31 2006-08-09 株式会社大和化成研究所 Method for producing naphthalene aldehydes
GB9714275D0 (en) * 1997-07-08 1997-09-10 Ciba Geigy Ag Oxidation process
US6616828B2 (en) * 2001-08-06 2003-09-09 Micron Technology, Inc. Recovery method for platinum plating bath
EP1824945A4 (en) * 2004-11-19 2008-08-06 Honeywell Int Inc Selective removal chemistries for semiconductor applications, methods of production and uses thereof
ES2413095T3 (en) * 2010-03-12 2013-07-15 Sumitomo Electric Industries, Ltd. Redox flow battery
US8603352B1 (en) * 2012-10-25 2013-12-10 Rohm and Haas Electroncis Materials LLC Chrome-free methods of etching organic polymers
WO2014077957A1 (en) * 2012-11-15 2014-05-22 Macdermid Acumen, Inc. Electrolytic generation of manganese (iii) ions in strong sulfuric acid

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1979000258A1 (en) * 1977-11-02 1979-05-17 Diamond Shamrock Techn The production of electrolytic manganese dioxide
US5213665A (en) * 1988-02-29 1993-05-25 Nippon Shokubai Kagaku Kogyo, Co., Ltd. Process for producing 1-aminoanthraquinones
US20100155255A1 (en) * 2007-05-22 2010-06-24 Okuno Chemical Industries Co., Ltd. Pretreatment process for electroless plating of resin molded body, method for plating resin molded body, and pretreatment agent
EP2025708A1 (en) * 2007-08-10 2009-02-18 Enthone Inc. Chromium-free etchant for plastic surfaces
US20110140035A1 (en) * 2007-08-10 2011-06-16 Enthone Inc. Chromium-free pickle for plastic surfaces
WO2013112268A2 (en) * 2012-01-23 2013-08-01 Macdermid Acumen, Inc. Etching of plastic using acidic solutions containing trivalent manganese

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
CH COMNINELLIS ET AL: "Electrochemical production of manganic sulfate in concentrated H2SO4", JOURNAL OF THE ELECTROCHEMICAL SOCIETY, ELECTROCHEMICAL SOCIETY, INC, US, vol. 129, no. 4, April 1982 (1982-04-01), pages 749 - 752, XP002082878, ISSN: 0013-4651 *
P. VAUDANO: "Oxydation d'alkyltoluène par le sulfate manganique préparé par électrochimie", CHIMIA, vol. 46, no. 4, April 1992 (1992-04-01), pages 103 - 106, XP009192297 *
See also references of WO2014164272A1 *

Also Published As

Publication number Publication date
CN105209667A (en) 2015-12-30
JP2016512574A (en) 2016-04-28
ES2745071T3 (en) 2020-02-27
AU2014249521A1 (en) 2015-08-27
CA2955467A1 (en) 2014-10-09
CN105209667B (en) 2017-12-05
PL2971260T3 (en) 2020-03-31
MX2015012584A (en) 2016-01-14
CA2955467C (en) 2021-03-16
HRP20191626T1 (en) 2019-12-13
KR101749947B1 (en) 2017-06-22
LT2971260T (en) 2019-09-25
AU2014249521B2 (en) 2018-03-01
JP6167222B2 (en) 2017-07-19
TWI489007B (en) 2015-06-21
HUE045344T2 (en) 2019-12-30
WO2014164272A1 (en) 2014-10-09
CA2901589C (en) 2019-01-22
BR112015021067B1 (en) 2021-06-08
EP2971260B1 (en) 2019-06-19
CA2901589A1 (en) 2014-10-09
KR20150126935A (en) 2015-11-13
BR112015021067A2 (en) 2017-07-18
TW201500593A (en) 2015-01-01
DK2971260T3 (en) 2019-09-23
SI2971260T1 (en) 2019-12-31
PT2971260T (en) 2019-09-27
EP2971260A1 (en) 2016-01-20

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