PL2920341T3 - Electrolytic generation of manganese (iii) ions in strong sulfuric acid - Google Patents
Electrolytic generation of manganese (iii) ions in strong sulfuric acidInfo
- Publication number
- PL2920341T3 PL2920341T3 PL13854930T PL13854930T PL2920341T3 PL 2920341 T3 PL2920341 T3 PL 2920341T3 PL 13854930 T PL13854930 T PL 13854930T PL 13854930 T PL13854930 T PL 13854930T PL 2920341 T3 PL2920341 T3 PL 2920341T3
- Authority
- PL
- Poland
- Prior art keywords
- manganese
- ions
- iii
- sulfuric acid
- strong sulfuric
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/042—Electrodes formed of a single material
- C25B11/043—Carbon, e.g. diamond or graphene
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/02—Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/22—Roughening, e.g. by etching
- C23C18/24—Roughening, e.g. by etching using acid aqueous solutions
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/21—Manganese oxides
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/02—Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form
- C25B11/03—Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form perforated or foraminous
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
- C23C18/1653—Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/677,798 US9752241B2 (en) | 2012-01-23 | 2012-11-15 | Electrolytic generation of manganese (III) ions in strong sulfuric acid using an improved anode |
| PCT/US2013/061860 WO2014077957A1 (en) | 2012-11-15 | 2013-09-26 | Electrolytic generation of manganese (iii) ions in strong sulfuric acid |
| EP13854930.8A EP2920341B1 (en) | 2012-11-15 | 2013-09-26 | Electrolytic generation of manganese (iii) ions in strong sulfuric acid |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| PL2920341T3 true PL2920341T3 (en) | 2019-05-31 |
Family
ID=50731593
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PL13854930T PL2920341T3 (en) | 2012-11-15 | 2013-09-26 | Electrolytic generation of manganese (iii) ions in strong sulfuric acid |
Country Status (12)
| Country | Link |
|---|---|
| EP (1) | EP2920341B1 (en) |
| JP (1) | JP6060270B2 (en) |
| KR (2) | KR20170039315A (en) |
| CN (1) | CN104838044B (en) |
| BR (1) | BR112015011123B1 (en) |
| CA (2) | CA3056665A1 (en) |
| ES (1) | ES2704672T3 (en) |
| MX (1) | MX2015006178A (en) |
| PL (1) | PL2920341T3 (en) |
| TR (1) | TR201900116T4 (en) |
| TW (1) | TWI500582B (en) |
| WO (1) | WO2014077957A1 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014164272A1 (en) * | 2013-03-12 | 2014-10-09 | Macdermid Acumen, Inc. | Electrolytic generation of manganese (iii) ions in strong sulfuric acid |
| ES2828459T3 (en) | 2014-07-10 | 2021-05-26 | Okuno Chem Ind Co | Resin galvanizing method |
| WO2016030577A1 (en) * | 2014-08-28 | 2016-03-03 | Inkron Ltd | Crystalline transition metal oxide particles and continuous method of producing the same |
| US10889905B2 (en) * | 2018-12-11 | 2021-01-12 | Rohm And Haas Electronic Materials Llc | Methods of generating manganese (III) ions in mixed aqueous acid solutions using ozone |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3065155A (en) | 1960-09-02 | 1962-11-20 | Manganese Chemicals Corp | Electrolytic manganese dioxide process |
| AT310285B (en) | 1966-02-22 | 1973-09-25 | Photocircuits Corp | Process for the production of a laminated body for printed circuits |
| US4042729A (en) | 1972-12-13 | 1977-08-16 | Kollmorgen Technologies Corporation | Process for the activation of resinous bodies for adherent metallization |
| IT1159931B (en) * | 1978-10-13 | 1987-03-04 | Oronzio De Nora Impianti | INDUSTRIAL PROCEDURE FOR THE PRODUCTION OF TITANIUM DIOXIDE FROM ILMENITE |
| US4279705A (en) * | 1980-02-19 | 1981-07-21 | Kerr-Mcgee Corporation | Process for oxidizing a metal of variable valence by constant current electrolysis |
| IT1132194B (en) * | 1980-07-15 | 1986-06-25 | Anic Spa | ELECTROCHEMICAL PROCESS FOR THE SYNTHESIS OF ORGANIC COMPOUNDS |
| JPS58502027A (en) * | 1981-11-23 | 1983-11-24 | バロ−ス・コ−ポレ−ション | Peripherals adapted to monitor low data rate serial input/output interfaces |
| US4610895A (en) | 1984-02-01 | 1986-09-09 | Shipley Company Inc. | Process for metallizing plastics |
| US4948630A (en) | 1984-06-07 | 1990-08-14 | Enthone, Inc. | Three step process for treating plastics with alkaline permanganate solutions |
| JPS6447890A (en) * | 1987-08-13 | 1989-02-22 | Kenzo Yamaguchi | Electrolytic synthesis method |
| US5213665A (en) * | 1988-02-29 | 1993-05-25 | Nippon Shokubai Kagaku Kogyo, Co., Ltd. | Process for producing 1-aminoanthraquinones |
| US4936970A (en) * | 1988-11-14 | 1990-06-26 | Ebonex Technologies, Inc. | Redox reactions in an electrochemical cell including an electrode comprising Magneli phase titanium oxide |
| US5160600A (en) * | 1990-03-05 | 1992-11-03 | Patel Gordhanbai N | Chromic acid free etching of polymers for electroless plating |
| US5648125A (en) | 1995-11-16 | 1997-07-15 | Cane; Frank N. | Electroless plating process for the manufacture of printed circuit boards |
| GB9714275D0 (en) * | 1997-07-08 | 1997-09-10 | Ciba Geigy Ag | Oxidation process |
| EP1328809A1 (en) | 2000-10-15 | 2003-07-23 | Ortho-Mcneil Pharmaceutical, Inc. | Improved ligand binding assays for vanilloid receptors |
| CA2408951C (en) * | 2002-10-18 | 2008-12-16 | Kvaerner Canada Inc. | Mediated hydrohalic acid electrolysis |
| US8394289B2 (en) | 2006-04-18 | 2013-03-12 | Okuno Chemicals Industries Co., Ltd. | Composition for etching treatment of resin molded article |
| US8734992B2 (en) * | 2007-02-14 | 2014-05-27 | Tosoh Corporation | Electrolytic manganese dioxide, and method for its production and its application |
| DE502007001745D1 (en) | 2007-08-10 | 2009-11-26 | Enthone | Chrome-free stain for plastic surfaces |
| JP2010121143A (en) * | 2008-11-17 | 2010-06-03 | Okuno Chem Ind Co Ltd | Post-processing agent of etching for resin-formed body, post-processing method using the same, and plating method for resin-formed body |
| CN102742054B (en) * | 2010-01-29 | 2014-08-13 | 永备电池有限公司 | Method of making an electrochemical cell with a catalytic electrode including manganese dioxide |
| US10260000B2 (en) * | 2012-01-23 | 2019-04-16 | Macdermid Acumen, Inc. | Etching of plastic using acidic solutions containing trivalent manganese |
-
2013
- 2013-09-26 WO PCT/US2013/061860 patent/WO2014077957A1/en active Application Filing
- 2013-09-26 CA CA3056665A patent/CA3056665A1/en not_active Abandoned
- 2013-09-26 KR KR1020177008782A patent/KR20170039315A/en not_active Application Discontinuation
- 2013-09-26 ES ES13854930T patent/ES2704672T3/en active Active
- 2013-09-26 CA CA2889342A patent/CA2889342C/en active Active
- 2013-09-26 MX MX2015006178A patent/MX2015006178A/en unknown
- 2013-09-26 CN CN201380059513.3A patent/CN104838044B/en active Active
- 2013-09-26 EP EP13854930.8A patent/EP2920341B1/en active Active
- 2013-09-26 BR BR112015011123-8A patent/BR112015011123B1/en active IP Right Grant
- 2013-09-26 KR KR1020157015762A patent/KR101950169B1/en active IP Right Grant
- 2013-09-26 JP JP2015543041A patent/JP6060270B2/en active Active
- 2013-09-26 TR TR2019/00116T patent/TR201900116T4/en unknown
- 2013-09-26 PL PL13854930T patent/PL2920341T3/en unknown
- 2013-11-11 TW TW102140858A patent/TWI500582B/en active
Also Published As
| Publication number | Publication date |
|---|---|
| CA3056665A1 (en) | 2014-05-22 |
| MX2015006178A (en) | 2015-11-06 |
| KR20150082636A (en) | 2015-07-15 |
| TR201900116T4 (en) | 2019-01-21 |
| EP2920341A1 (en) | 2015-09-23 |
| BR112015011123B1 (en) | 2021-08-03 |
| WO2014077957A1 (en) | 2014-05-22 |
| TWI500582B (en) | 2015-09-21 |
| CA2889342C (en) | 2019-11-12 |
| TW201431793A (en) | 2014-08-16 |
| EP2920341A4 (en) | 2016-04-27 |
| JP2016504492A (en) | 2016-02-12 |
| CN104838044A (en) | 2015-08-12 |
| JP6060270B2 (en) | 2017-01-11 |
| KR101950169B1 (en) | 2019-02-20 |
| CA2889342A1 (en) | 2014-05-22 |
| EP2920341B1 (en) | 2018-11-14 |
| KR20170039315A (en) | 2017-04-10 |
| BR112015011123A2 (en) | 2017-07-11 |
| ES2704672T3 (en) | 2019-03-19 |
| CN104838044B (en) | 2017-12-05 |
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