PL1894449T3 - Method for treating plasma under continuous atmospheric pressure of work pieces, in particular, material plates or strips - Google Patents

Method for treating plasma under continuous atmospheric pressure of work pieces, in particular, material plates or strips

Info

Publication number
PL1894449T3
PL1894449T3 PL06754430T PL06754430T PL1894449T3 PL 1894449 T3 PL1894449 T3 PL 1894449T3 PL 06754430 T PL06754430 T PL 06754430T PL 06754430 T PL06754430 T PL 06754430T PL 1894449 T3 PL1894449 T3 PL 1894449T3
Authority
PL
Poland
Prior art keywords
workpiece
atmospheric pressure
strips
work pieces
under continuous
Prior art date
Application number
PL06754430T
Other languages
Polish (pl)
Inventor
Eckhard Prinz
Peter Palm
Frank Förster
Original Assignee
Softal Corona & Plasma Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Softal Corona & Plasma Gmbh filed Critical Softal Corona & Plasma Gmbh
Publication of PL1894449T3 publication Critical patent/PL1894449T3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32348—Dielectric barrier discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2418—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the electrodes being embedded in the dielectric
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2437—Multilayer systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Treatment Of Fiber Materials (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

Method for continuous plasma treatment or coating of electrically insulated workpieces under atmospheric pressure, especially plates or strip, where the workpiece is located below a high voltage, preferably ac electrode which extends transversely in the movement direction over the width of the workpiece surface, where the electrode and workpiece are offset in the movement direction. A first chamber between the electrode and workpiece is filled with a first atmosphere and a second chamber on the workpiece side oriented away from the eletrode and adjacent to its rear side is filled with a second, different from the first atmosphere. The high voltage and the two atmospheres are selected so that a plasma discharge is provoked in the second atmosphere.
PL06754430T 2005-06-24 2006-06-19 Method for treating plasma under continuous atmospheric pressure of work pieces, in particular, material plates or strips PL1894449T3 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102005029360A DE102005029360B4 (en) 2005-06-24 2005-06-24 Two methods for continuous atmospheric pressure Plasma treatment of workpieces, in particular material plates or sheets
PCT/EP2006/005839 WO2007016999A2 (en) 2005-06-24 2006-06-19 Method for treating plasma under continuous atmospheric pressure of work pieces, in particular, material plates or strips
EP06754430A EP1894449B1 (en) 2005-06-24 2006-06-19 Method for treating plasma under continuous atmospheric pressure of work pieces, in particular, material plates or strips

Publications (1)

Publication Number Publication Date
PL1894449T3 true PL1894449T3 (en) 2012-04-30

Family

ID=36997862

Family Applications (1)

Application Number Title Priority Date Filing Date
PL06754430T PL1894449T3 (en) 2005-06-24 2006-06-19 Method for treating plasma under continuous atmospheric pressure of work pieces, in particular, material plates or strips

Country Status (9)

Country Link
US (2) US7989034B2 (en)
EP (2) EP1894449B1 (en)
JP (1) JP2008547166A (en)
CN (1) CN101198718B (en)
AT (2) ATE533339T1 (en)
DE (2) DE102005029360B4 (en)
DK (1) DK1902156T3 (en)
PL (1) PL1894449T3 (en)
WO (2) WO2007000255A2 (en)

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Also Published As

Publication number Publication date
US20100221451A1 (en) 2010-09-02
EP1894449A2 (en) 2008-03-05
EP1902156A2 (en) 2008-03-26
WO2007000255A2 (en) 2007-01-04
DE502006003822D1 (en) 2009-07-09
US7989034B2 (en) 2011-08-02
DE102005029360B4 (en) 2011-11-10
EP1894449B1 (en) 2011-11-09
DE102005029360A1 (en) 2006-12-28
DK1902156T3 (en) 2009-08-24
JP2008547166A (en) 2008-12-25
ATE533339T1 (en) 2011-11-15
WO2007016999A2 (en) 2007-02-15
US20100112235A1 (en) 2010-05-06
EP1902156B1 (en) 2009-05-27
CN101198718B (en) 2010-05-26
WO2007000255A3 (en) 2007-04-26
WO2007016999A3 (en) 2009-09-03
ATE432379T1 (en) 2009-06-15
CN101198718A (en) 2008-06-11

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