NZ576185A - A PVD layer system for coating workpieces with a mixed crystal layer of a polyoxide - Google Patents
A PVD layer system for coating workpieces with a mixed crystal layer of a polyoxideInfo
- Publication number
- NZ576185A NZ576185A NZ576185A NZ57618507A NZ576185A NZ 576185 A NZ576185 A NZ 576185A NZ 576185 A NZ576185 A NZ 576185A NZ 57618507 A NZ57618507 A NZ 57618507A NZ 576185 A NZ576185 A NZ 576185A
- Authority
- NZ
- New Zealand
- Prior art keywords
- crystal layer
- mixed
- polyoxide
- target
- corundum structure
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Laminated Bodies (AREA)
Abstract
The disclosure relates to an arc evaporation deposited layer system for the coating of workpieces, comprising at least one mixed-crystal layer of a polyoxide of the following composition:(Me11-XMe2X)2O3 where 0<X<1, andwhere Me1 and Me2 each represent at least one of the elements Al, Cr, Fe, Li, Mg, Mn, Nb, Ti, Sb or V and the elements of Me1 and Me2 differ from one another, wherein the crystal lattice of the mixed-crystal layer exhibits a corundum structure which in a spectrum of the mixed crystal layer analyzed by x-ray diffractometry is characterized by at least three of the lines associated with the corundum structure. Also disclosed is a vacuum coating method for producing a mixed-crystal layer of a polyoxide on a workpiece, whereby an electric arc discharge takes place in an oxygenous process-gas atmosphere between at least one anode and a target constituting the cathode of an arc source, wherein on the target surface only an external magnetic field is generated essentially perpendicular to the target surface, comprising a vertical component BZ and a smaller, radial or surface-parallel component Br, the target being an alloy target whose composition essentially corresponds to that of the mixed-crystal layer to be deposited and wherein the process parameters are adjusted to deposit the mixed-crystal layer with a corundum structure; the polyoxide being an oxide with at least two or more metals or with at least one or more metals and additionally one or several semiconductor elements.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH16142006 | 2006-10-10 | ||
PCT/EP2007/059196 WO2008043606A1 (en) | 2006-10-10 | 2007-09-03 | Layer system having at least one mixed crystal layer of a polyoxide |
Publications (1)
Publication Number | Publication Date |
---|---|
NZ576185A true NZ576185A (en) | 2012-10-26 |
Family
ID=37607420
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NZ576185A NZ576185A (en) | 2006-10-10 | 2007-09-03 | A PVD layer system for coating workpieces with a mixed crystal layer of a polyoxide |
Country Status (17)
Country | Link |
---|---|
EP (1) | EP2082079B1 (en) |
JP (2) | JP5725466B2 (en) |
KR (1) | KR101508159B1 (en) |
CN (1) | CN101522950B (en) |
AU (1) | AU2007306494B2 (en) |
BR (1) | BRPI0719774A2 (en) |
CA (1) | CA2665044C (en) |
HK (1) | HK1135439A1 (en) |
IL (1) | IL198044A (en) |
MX (1) | MX2009003130A (en) |
MY (1) | MY151941A (en) |
NZ (1) | NZ576185A (en) |
RU (1) | RU2456371C2 (en) |
TW (1) | TWI421356B (en) |
UA (1) | UA99819C2 (en) |
WO (1) | WO2008043606A1 (en) |
ZA (1) | ZA200902479B (en) |
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-
2007
- 2007-09-03 EP EP07803181.2A patent/EP2082079B1/en active Active
- 2007-09-03 JP JP2009531796A patent/JP5725466B2/en active Active
- 2007-09-03 BR BRPI0719774-8A2A patent/BRPI0719774A2/en not_active IP Right Cessation
- 2007-09-03 KR KR1020097007421A patent/KR101508159B1/en active IP Right Grant
- 2007-09-03 UA UAA200904546A patent/UA99819C2/en unknown
- 2007-09-03 AU AU2007306494A patent/AU2007306494B2/en not_active Ceased
- 2007-09-03 CA CA2665044A patent/CA2665044C/en not_active Expired - Fee Related
- 2007-09-03 NZ NZ576185A patent/NZ576185A/en not_active IP Right Cessation
- 2007-09-03 ZA ZA200902479A patent/ZA200902479B/en unknown
- 2007-09-03 MY MYPI20091427 patent/MY151941A/en unknown
- 2007-09-03 WO PCT/EP2007/059196 patent/WO2008043606A1/en active Application Filing
- 2007-09-03 MX MX2009003130A patent/MX2009003130A/en active IP Right Grant
- 2007-09-03 CN CN2007800376573A patent/CN101522950B/en not_active Expired - Fee Related
- 2007-09-03 RU RU2009117577/02A patent/RU2456371C2/en active
- 2007-10-04 TW TW096137223A patent/TWI421356B/en not_active IP Right Cessation
-
2009
- 2009-04-06 IL IL198044A patent/IL198044A/en active IP Right Grant
- 2009-12-17 HK HK09111889.2A patent/HK1135439A1/en not_active IP Right Cessation
-
2013
- 2013-12-13 JP JP2013258080A patent/JP6000233B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP2010506049A (en) | 2010-02-25 |
HK1135439A1 (en) | 2010-06-04 |
AU2007306494A1 (en) | 2008-04-17 |
KR101508159B1 (en) | 2015-04-14 |
CA2665044C (en) | 2016-08-23 |
IL198044A (en) | 2015-05-31 |
JP5725466B2 (en) | 2015-05-27 |
MY151941A (en) | 2014-07-31 |
TW200833851A (en) | 2008-08-16 |
EP2082079A1 (en) | 2009-07-29 |
KR20090074035A (en) | 2009-07-03 |
CN101522950A (en) | 2009-09-02 |
CN101522950B (en) | 2012-08-29 |
AU2007306494B2 (en) | 2012-05-31 |
RU2456371C2 (en) | 2012-07-20 |
BRPI0719774A2 (en) | 2014-04-22 |
ZA200902479B (en) | 2010-07-28 |
MX2009003130A (en) | 2009-06-22 |
RU2009117577A (en) | 2010-11-20 |
UA99819C2 (en) | 2012-10-10 |
JP2014077201A (en) | 2014-05-01 |
TWI421356B (en) | 2014-01-01 |
EP2082079B1 (en) | 2019-09-18 |
WO2008043606A1 (en) | 2008-04-17 |
CA2665044A1 (en) | 2008-04-17 |
IL198044A0 (en) | 2009-12-24 |
JP6000233B2 (en) | 2016-09-28 |
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Legal Events
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Free format text: PATENT RENEWED FOR 3 YEARS UNTIL 03 SEP 2014 BY AJ PARK Effective date: 20130430 |
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RENW | Renewal (renewal fees accepted) |
Free format text: PATENT RENEWED FOR 3 YEARS UNTIL 03 SEP 2017 BY CPA GLOBAL Effective date: 20140717 |
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LAPS | Patent lapsed |