NO822328L - Preparat og prosess for elektroavsetning av sammensatte nikkelsjikt. - Google Patents
Preparat og prosess for elektroavsetning av sammensatte nikkelsjikt.Info
- Publication number
- NO822328L NO822328L NO822328A NO822328A NO822328L NO 822328 L NO822328 L NO 822328L NO 822328 A NO822328 A NO 822328A NO 822328 A NO822328 A NO 822328A NO 822328 L NO822328 L NO 822328L
- Authority
- NO
- Norway
- Prior art keywords
- approx
- nickel
- layer
- sulfur content
- containing layer
- Prior art date
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims description 186
- 229910052759 nickel Inorganic materials 0.000 title claims description 83
- 238000000034 method Methods 0.000 title claims description 18
- 239000002131 composite material Substances 0.000 title claims description 16
- 238000002360 preparation method Methods 0.000 title description 5
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 59
- 229910052717 sulfur Inorganic materials 0.000 claims description 54
- 239000011593 sulfur Substances 0.000 claims description 54
- 239000011248 coating agent Substances 0.000 claims description 14
- 238000000576 coating method Methods 0.000 claims description 14
- 238000004070 electrodeposition Methods 0.000 claims description 14
- -1 diazole compound Chemical class 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 12
- 238000000151 deposition Methods 0.000 claims description 11
- 238000009713 electroplating Methods 0.000 claims description 7
- RAIPHJJURHTUIC-UHFFFAOYSA-N 1,3-thiazol-2-amine Chemical compound NC1=NC=CS1 RAIPHJJURHTUIC-UHFFFAOYSA-N 0.000 claims description 6
- XMXLBDNVSIHRRA-UHFFFAOYSA-N 4,5-dimethyl-1,3-thiazol-2-amine Chemical compound CC=1N=C(N)SC=1C XMXLBDNVSIHRRA-UHFFFAOYSA-N 0.000 claims description 4
- 229910052736 halogen Inorganic materials 0.000 claims description 4
- 150000002367 halogens Chemical class 0.000 claims description 4
- 150000003839 salts Chemical class 0.000 claims description 4
- NUSVDASTCPBUIP-UHFFFAOYSA-N (5-bromo-1,3-thiazol-2-yl)azanium;bromide Chemical compound [Br-].BrC1=C[NH2+]C(=N)S1 NUSVDASTCPBUIP-UHFFFAOYSA-N 0.000 claims description 3
- WGJCBBASTRWVJL-UHFFFAOYSA-N 1,3-thiazolidine-2-thione Chemical compound SC1=NCCS1 WGJCBBASTRWVJL-UHFFFAOYSA-N 0.000 claims description 3
- MIHADVKEHAFNPG-UHFFFAOYSA-N 2-Amino-5-nitrothiazole Chemical compound NC1=NC=C([N+]([O-])=O)S1 MIHADVKEHAFNPG-UHFFFAOYSA-N 0.000 claims description 3
- 229940018167 2-amino-5-nitrothiazole Drugs 0.000 claims description 3
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 claims description 3
- 239000003929 acidic solution Substances 0.000 claims description 3
- 229910001453 nickel ion Inorganic materials 0.000 claims description 3
- OUQMXTJYCAJLGO-UHFFFAOYSA-N 4-methyl-1,3-thiazol-2-amine Chemical compound CC1=CSC(N)=N1 OUQMXTJYCAJLGO-UHFFFAOYSA-N 0.000 claims description 2
- 229950003476 aminothiazole Drugs 0.000 claims description 2
- 230000001464 adherent effect Effects 0.000 claims 2
- 239000010410 layer Substances 0.000 description 80
- 239000012488 sample solution Substances 0.000 description 47
- 239000003792 electrolyte Substances 0.000 description 21
- 150000001875 compounds Chemical class 0.000 description 20
- 239000000654 additive Substances 0.000 description 16
- 230000000996 additive effect Effects 0.000 description 16
- 239000011888 foil Substances 0.000 description 9
- 229910001369 Brass Inorganic materials 0.000 description 8
- 239000010951 brass Substances 0.000 description 8
- 238000005260 corrosion Methods 0.000 description 8
- 230000007797 corrosion Effects 0.000 description 8
- 238000007747 plating Methods 0.000 description 7
- 239000005864 Sulphur Substances 0.000 description 6
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 150000003464 sulfur compounds Chemical class 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 5
- 229920003023 plastic Polymers 0.000 description 5
- 239000004033 plastic Substances 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 4
- 239000004327 boric acid Substances 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 239000000080 wetting agent Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 3
- 238000013019 agitation Methods 0.000 description 3
- 239000010953 base metal Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- SOSQXPIKTBUEKF-UHFFFAOYSA-N 1,4-dihexoxy-1,4-dioxobutane-2-sulfonic acid Chemical compound CCCCCCOC(=O)CC(S(O)(=O)=O)C(=O)OCCCCCC SOSQXPIKTBUEKF-UHFFFAOYSA-N 0.000 description 2
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 239000006172 buffering agent Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- LAIZPRYFQUWUBN-UHFFFAOYSA-L nickel chloride hexahydrate Chemical compound O.O.O.O.O.O.[Cl-].[Cl-].[Ni+2] LAIZPRYFQUWUBN-UHFFFAOYSA-L 0.000 description 2
- 150000002825 nitriles Chemical class 0.000 description 2
- 239000012085 test solution Substances 0.000 description 2
- 150000003557 thiazoles Chemical class 0.000 description 2
- RILZRCJGXSFXNE-UHFFFAOYSA-N 2-[4-(trifluoromethoxy)phenyl]ethanol Chemical compound OCCC1=CC=C(OC(F)(F)F)C=C1 RILZRCJGXSFXNE-UHFFFAOYSA-N 0.000 description 1
- VZWOXDYRBDIHMA-UHFFFAOYSA-N 2-methyl-1,3-thiazole Chemical compound CC1=NC=CS1 VZWOXDYRBDIHMA-UHFFFAOYSA-N 0.000 description 1
- JHUFGBSGINLPOW-UHFFFAOYSA-N 3-chloro-4-(trifluoromethoxy)benzoyl cyanide Chemical compound FC(F)(F)OC1=CC=C(C(=O)C#N)C=C1Cl JHUFGBSGINLPOW-UHFFFAOYSA-N 0.000 description 1
- CATCJRCKBGAMKK-UHFFFAOYSA-N 4,5-dimethyl-1,3-thiazol-2-amine;hydron;bromide Chemical compound Br.CC=1N=C(N)SC=1C CATCJRCKBGAMKK-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- KHBQMWCZKVMBLN-UHFFFAOYSA-N Benzenesulfonamide Chemical compound NS(=O)(=O)C1=CC=CC=C1 KHBQMWCZKVMBLN-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 229910001313 Cobalt-iron alloy Inorganic materials 0.000 description 1
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- JEHKKBHWRAXMCH-UHFFFAOYSA-M benzenesulfinate Chemical compound [O-]S(=O)C1=CC=CC=C1 JEHKKBHWRAXMCH-UHFFFAOYSA-M 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- 239000000872 buffer Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012799 electrically-conductive coating Substances 0.000 description 1
- 239000002659 electrodeposit Substances 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- SLGWESQGEUXWJQ-UHFFFAOYSA-N formaldehyde;phenol Chemical compound O=C.OC1=CC=CC=C1 SLGWESQGEUXWJQ-UHFFFAOYSA-N 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 150000004687 hexahydrates Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- GPUMPJNVOBTUFM-UHFFFAOYSA-N naphthalene-1,2,3-trisulfonic acid Chemical compound C1=CC=C2C(S(O)(=O)=O)=C(S(O)(=O)=O)C(S(=O)(=O)O)=CC2=C1 GPUMPJNVOBTUFM-UHFFFAOYSA-N 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- RRIWRJBSCGCBID-UHFFFAOYSA-L nickel sulfate hexahydrate Chemical compound O.O.O.O.O.O.[Ni+2].[O-]S([O-])(=O)=O RRIWRJBSCGCBID-UHFFFAOYSA-L 0.000 description 1
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- PXHVJJICTQNCMI-OUBTZVSYSA-N nickel-60 atom Chemical compound [60Ni] PXHVJJICTQNCMI-OUBTZVSYSA-N 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 1
- 229940081974 saccharin Drugs 0.000 description 1
- 235000019204 saccharin Nutrition 0.000 description 1
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 description 1
- MNCGMVDMOKPCSQ-UHFFFAOYSA-M sodium;2-phenylethenesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C=CC1=CC=CC=C1 MNCGMVDMOKPCSQ-UHFFFAOYSA-M 0.000 description 1
- 150000003463 sulfur Chemical class 0.000 description 1
- 150000008111 thiosulfinates Chemical class 0.000 description 1
- GWIKYPMLNBTJHR-UHFFFAOYSA-M thiosulfonate group Chemical group S(=S)(=O)[O-] GWIKYPMLNBTJHR-UHFFFAOYSA-M 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
- C25D3/14—Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
- C25D3/18—Heterocyclic compounds
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
- C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/623—Porosity of the layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/625—Discontinuous layers, e.g. microcracked layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
- Laminated Bodies (AREA)
- Chemically Coating (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/280,643 US4384929A (en) | 1981-07-06 | 1981-07-06 | Process for electro-depositing composite nickel layers |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NO822328L true NO822328L (no) | 1983-01-07 |
Family
ID=23073986
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NO822328A NO822328L (no) | 1981-07-06 | 1982-07-02 | Preparat og prosess for elektroavsetning av sammensatte nikkelsjikt. |
Country Status (18)
| Country | Link |
|---|---|
| US (1) | US4384929A (es) |
| JP (1) | JPS5816086A (es) |
| AR (1) | AR231152A1 (es) |
| AU (1) | AU541941B2 (es) |
| BE (1) | BE893774A (es) |
| BR (1) | BR8203902A (es) |
| CA (1) | CA1195947A (es) |
| DE (1) | DE3223698A1 (es) |
| ES (1) | ES8307929A1 (es) |
| FR (1) | FR2508936A1 (es) |
| GB (1) | GB2101162A (es) |
| IT (1) | IT1208431B (es) |
| MX (1) | MX157957A (es) |
| NL (1) | NL8202563A (es) |
| NO (1) | NO822328L (es) |
| PT (1) | PT75096B (es) |
| SE (1) | SE8203614L (es) |
| ZA (1) | ZA824289B (es) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4549942A (en) * | 1981-07-06 | 1985-10-29 | Omi International Corporation | Process for electrodepositing composite nickel layers |
| JPS60155823A (ja) * | 1984-01-24 | 1985-08-15 | Matsushita Electric Ind Co Ltd | 酸欠安全装置 |
| US5058799A (en) * | 1986-07-24 | 1991-10-22 | Zsamboky Kalman F | Metallized ceramic substrate and method therefor |
| US5348639A (en) * | 1991-08-06 | 1994-09-20 | Hitachi Magnetics Corporation | Surface treatment for iron-based permanent magnet including rare-earth element |
| US5286366A (en) * | 1991-11-05 | 1994-02-15 | Hitachi Magnetic Corp. | Surface treatment for iron-based permanent magnet including rare-earth element |
| US6045682A (en) * | 1998-03-24 | 2000-04-04 | Enthone-Omi, Inc. | Ductility agents for nickel-tungsten alloys |
| US6344128B1 (en) * | 2000-05-18 | 2002-02-05 | Emil Toledo | Aqueous electroplating bath |
| US7451906B2 (en) * | 2001-11-21 | 2008-11-18 | Dana Canada Corporation | Products for use in low temperature fluxless brazing |
| US20060102696A1 (en) | 2001-11-21 | 2006-05-18 | Graham Michael E | Layered products for fluxless brazing of substrates |
| US20040035911A1 (en) * | 2001-11-21 | 2004-02-26 | Dockus Kostas F. | Fluxless brazing |
| US8449948B2 (en) * | 2009-09-10 | 2013-05-28 | Western Digital (Fremont), Llc | Method and system for corrosion protection of layers in a structure of a magnetic recording transducer |
| JP6220359B2 (ja) * | 2015-03-26 | 2017-10-25 | Ｊｘ金属株式会社 | フィルム外装電池用タブリード材料及びその製造方法 |
| EP3147388A1 (en) * | 2015-09-25 | 2017-03-29 | Enthone, Incorporated | Flexible color adjustment for dark cr(iii)-platings |
| US20240124999A1 (en) * | 2022-09-26 | 2024-04-18 | Rohm And Haas Electronic Materials Llc | Nickel electroplating compositions for rough nickel |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US309733A (en) * | 1884-12-23 | Heney l | ||
| GB890528A (en) * | 1959-09-28 | 1962-03-07 | Canning & Co Ltd W | Nickel plating salt solutions |
| US3090733A (en) * | 1961-04-17 | 1963-05-21 | Udylite Res Corp | Composite nickel electroplate |
| FR1447970A (fr) * | 1964-10-12 | 1966-08-05 | Renault | Dépôts de chrome décoratif résistant à la corrosion |
| US3795591A (en) * | 1972-07-03 | 1974-03-05 | Oxy Metal Finishing Corp | Electrodeposition of bright nickel iron deposits employing a compound containing a sulfide and a sulfonate |
| US3857765A (en) * | 1973-09-20 | 1974-12-31 | Metalux Corp | Purification of nickel and cobalt electroplating solutions |
| AU8469875A (en) * | 1975-03-07 | 1977-03-17 | Oxy Metal Industries Corp | Thioether sulphonates |
| SU551415A1 (ru) * | 1975-04-28 | 1977-03-25 | Водный электролит блест щего никелировани |
-
1981
- 1981-07-06 US US06/280,643 patent/US4384929A/en not_active Expired - Lifetime
-
1982
- 1982-06-10 SE SE8203614A patent/SE8203614L/ not_active Application Discontinuation
- 1982-06-11 AU AU84803/82A patent/AU541941B2/en not_active Expired - Fee Related
- 1982-06-14 CA CA000405089A patent/CA1195947A/en not_active Expired
- 1982-06-17 ZA ZA824289A patent/ZA824289B/xx unknown
- 1982-06-22 PT PT75096A patent/PT75096B/pt unknown
- 1982-06-24 NL NL8202563A patent/NL8202563A/nl not_active Application Discontinuation
- 1982-06-25 DE DE19823223698 patent/DE3223698A1/de not_active Withdrawn
- 1982-06-29 AR AR289816A patent/AR231152A1/es active
- 1982-07-02 IT IT8248739A patent/IT1208431B/it active
- 1982-07-02 FR FR8211662A patent/FR2508936A1/fr not_active Withdrawn
- 1982-07-02 NO NO822328A patent/NO822328L/no unknown
- 1982-07-05 ES ES513731A patent/ES8307929A1/es not_active Expired
- 1982-07-05 MX MX193444A patent/MX157957A/es unknown
- 1982-07-05 GB GB08219383A patent/GB2101162A/en not_active Withdrawn
- 1982-07-05 BR BR8203902A patent/BR8203902A/pt unknown
- 1982-07-06 JP JP57117631A patent/JPS5816086A/ja active Granted
- 1982-07-06 BE BE0/208541A patent/BE893774A/fr unknown
Also Published As
| Publication number | Publication date |
|---|---|
| AU541941B2 (en) | 1985-01-31 |
| DE3223698A1 (de) | 1983-01-27 |
| NL8202563A (nl) | 1983-02-01 |
| JPS5816086A (ja) | 1983-01-29 |
| MX157957A (es) | 1988-12-28 |
| BR8203902A (pt) | 1983-06-28 |
| IT8248739A0 (it) | 1982-07-02 |
| FR2508936A1 (fr) | 1983-01-07 |
| GB2101162A (en) | 1983-01-12 |
| ES513731A0 (es) | 1983-08-01 |
| PT75096B (en) | 1984-10-09 |
| ZA824289B (en) | 1983-05-25 |
| AR231152A1 (es) | 1984-09-28 |
| AU8480382A (en) | 1983-01-13 |
| BE893774A (fr) | 1983-01-06 |
| PT75096A (en) | 1982-07-01 |
| CA1195947A (en) | 1985-10-29 |
| JPH0237434B2 (es) | 1990-08-24 |
| US4384929A (en) | 1983-05-24 |
| SE8203614L (sv) | 1983-01-07 |
| ES8307929A1 (es) | 1983-08-01 |
| IT1208431B (it) | 1989-06-12 |
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