NO20035436D0 - Polymert halvledersystem, anordninger for innlemming av dette og dets anvendelse for kontroll av korrosjon - Google Patents

Polymert halvledersystem, anordninger for innlemming av dette og dets anvendelse for kontroll av korrosjon

Info

Publication number
NO20035436D0
NO20035436D0 NO20035436A NO20035436A NO20035436D0 NO 20035436 D0 NO20035436 D0 NO 20035436D0 NO 20035436 A NO20035436 A NO 20035436A NO 20035436 A NO20035436 A NO 20035436A NO 20035436 D0 NO20035436 D0 NO 20035436D0
Authority
NO
Norway
Prior art keywords
incorporation
devices
application
semiconductor system
polymer semiconductor
Prior art date
Application number
NO20035436A
Other languages
English (en)
Norwegian (no)
Inventor
David B Dowling
Original Assignee
Applied Semiconductor Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/875,992 external-priority patent/US6402933B1/en
Application filed by Applied Semiconductor Inc filed Critical Applied Semiconductor Inc
Publication of NO20035436D0 publication Critical patent/NO20035436D0/no

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/08—Anti-corrosive paints
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F13/00—Inhibiting corrosion of metals by anodic or cathodic protection
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F13/00—Inhibiting corrosion of metals by anodic or cathodic protection
    • C23F13/02—Inhibiting corrosion of metals by anodic or cathodic protection cathodic; Selection of conditions, parameters or procedures for cathodic protection, e.g. of electrical conditions
    • C23F13/04—Controlling or regulating desired parameters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N17/00—Investigating resistance of materials to the weather, to corrosion, or to light
    • G01N17/02—Electrochemical measuring systems for weathering, corrosion or corrosion-protection measurement
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F2201/00—Type of materials to be protected by cathodic protection
    • C23F2201/02—Concrete, e.g. reinforced
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12528—Semiconductor component

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Ecology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Environmental Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Biodiversity & Conservation Biology (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Prevention Of Electric Corrosion (AREA)
  • Paints Or Removers (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
  • Formation Of Insulating Films (AREA)
NO20035436A 2001-06-08 2003-12-05 Polymert halvledersystem, anordninger for innlemming av dette og dets anvendelse for kontroll av korrosjon NO20035436D0 (no)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/875,992 US6402933B1 (en) 2001-06-08 2001-06-08 Method and system of preventing corrosion of conductive structures
US09/887,024 US6562201B2 (en) 2001-06-08 2001-06-25 Semiconductive polymeric system, devices incorporating the same, and its use in controlling corrosion
PCT/US2002/016572 WO2002101117A1 (en) 2001-06-08 2002-06-07 Semiconductive polymeric system, devices incorporating the same, and its use in controlling corrosion

Publications (1)

Publication Number Publication Date
NO20035436D0 true NO20035436D0 (no) 2003-12-05

Family

ID=27128391

Family Applications (1)

Application Number Title Priority Date Filing Date
NO20035436A NO20035436D0 (no) 2001-06-08 2003-12-05 Polymert halvledersystem, anordninger for innlemming av dette og dets anvendelse for kontroll av korrosjon

Country Status (12)

Country Link
US (2) US6562201B2 (ko)
EP (1) EP1412556A4 (ko)
JP (1) JP4334999B2 (ko)
KR (1) KR100897320B1 (ko)
CN (1) CN1242097C (ko)
AU (1) AU2002348505B2 (ko)
CA (1) CA2450024C (ko)
EA (1) EA005659B1 (ko)
MX (1) MXPA03011320A (ko)
NO (1) NO20035436D0 (ko)
TW (1) TW548784B (ko)
WO (1) WO2002101117A1 (ko)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6562201B2 (en) * 2001-06-08 2003-05-13 Applied Semiconductor, Inc. Semiconductive polymeric system, devices incorporating the same, and its use in controlling corrosion
DE60315308T2 (de) * 2002-08-06 2007-12-20 Warner-Lambert Company Llc Verfahren zum herstell von 5-(4-fluorphenyl)-1-[2-((2r,4r)-4-hydroxy-6-oxotetrahydropyran-2-yl)ethyl]-2-isopropyl-4-phenyl-1h-pyrrol-3-carbonsäurephenylamid
AU2003276888B2 (en) * 2002-10-17 2008-04-17 Applied Semiconductor International, Ltd. Semiconductive corrosion and fouling control apparatus, system, and method
US6811681B2 (en) * 2002-11-12 2004-11-02 Applied Semiconductor International Ltd. Semiconductive corrosion and fouling control apparatus, system, and method
GB0401579D0 (en) * 2004-01-24 2004-02-25 Koninkl Philips Electronics Nv Transistor manufacture
WO2005078158A2 (en) * 2004-02-04 2005-08-25 Polyone Corporation Cathodic protection compounds
TW200533780A (en) * 2004-03-10 2005-10-16 Ulvac Inc Self-cleaning catalyst chemical vapor deposition device and cleaning method therefor
US20050274480A1 (en) * 2004-05-24 2005-12-15 Barsoum Michel W Reduction of spontaneous metal whisker formation
US7670511B2 (en) * 2004-10-01 2010-03-02 Polyone Corporation Use of cathodic protection compounds on treated metal articles
CA2601125A1 (en) * 2005-03-17 2006-09-28 David B. Dowling Control apparatus, system, and method for reduction and/or prevention of space weather induced corrosion
US7318889B2 (en) * 2005-06-02 2008-01-15 Applied Semiconductor International, Ltd. Apparatus, system and method for extending the life of sacrificial anodes on cathodic protection systems
SE529327C2 (sv) * 2005-11-09 2007-07-03 Totalfoersvarets Forskningsins Sätt att skapa en lågemissiv yta samt användning av en färg för att åstadkomma en lågemissiv yta
NO334350B1 (no) * 2006-05-16 2014-02-10 Hamworthy Plc Fremgangsmåte for frembringelse av en plateformet elektrode og en plateformet elektrode for en elektrostatisk koalescer
US8114267B2 (en) * 2006-10-27 2012-02-14 Acreo Ab Method of monitoring a substrate patterning process
KR20100093517A (ko) * 2007-09-07 2010-08-25 어플라이드 세미컨덕터 인터내셔널, 리미티드 고밀도 금속 산화물 층의 생성 방법 및 이 방법에 의해 생성된 금속 산화물 층

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH507882A (de) 1967-12-06 1971-05-31 Repla Sa Verfahren zur Herstellung kunstharzgebundener Platten
US3620784A (en) 1968-01-24 1971-11-16 Nasa Potassium silicate-zinc coatings
US3562124A (en) 1968-08-02 1971-02-09 Hooker Chemical Corp Composition for corrosion protection
US3864234A (en) 1973-05-08 1975-02-04 Smith Corp A O Cathodic Protection System for Water Heaters with Sealant
US4010759A (en) 1975-08-29 1977-03-08 Vitatron Medical B.V. Insulated, corrosion resistant medical electronic devices and method for producing same
GB2004560B (en) 1977-09-13 1982-08-18 Dainippon Toryo Kk Anti-corrosion coating composition
US4381981A (en) 1980-12-17 1983-05-03 S. A. Texaco Belgium N.V. Sacrificial cathodic protection system
GB8427138D0 (en) 1984-10-26 1984-12-05 Wilson A D Coated substrates
US4957612A (en) 1987-02-09 1990-09-18 Raychem Corporation Electrodes for use in electrochemical processes
US5009757A (en) 1988-01-19 1991-04-23 Marine Environmental Research, Inc. Electrochemical system for the prevention of fouling on steel structures in seawater
US4863578A (en) 1988-04-25 1989-09-05 Corrosion Service Company Limited Corrodible link for cathodic protection systems
GB9106218D0 (en) 1991-03-23 1991-05-08 Capcis March Ltd Electrochemical impedance monitoring
US5352342A (en) 1993-03-19 1994-10-04 William J. Riffe Method and apparatus for preventing corrosion of metal structures
IT1263451B (it) * 1993-07-01 1996-08-05 Ima Spa Macchina automatica, a giostra, per il dosaggio ed il confezionamento di prodotti fluidi, con dosatori disgiunti dalla giostra stessa e facilmente ispezionabili.
US5500629A (en) 1993-09-10 1996-03-19 Meyer Dennis R Noise suppressor
FI103190B1 (fi) 1994-11-01 1999-05-14 Savcor Marine Oy Menetelmä eliöstön kasvun estämiseksi nesteupotuksessa olevien rakenteiden pinnoilla
US5888374A (en) 1997-05-08 1999-03-30 The University Of Chicago In-situ process for the monitoring of localized pitting corrosion
JP4148373B2 (ja) 1998-04-06 2008-09-10 城南株式会社 金属製構造物の陰極防食法および装置
US6325915B1 (en) 1999-12-09 2001-12-04 Applied Semiconductor, Inc. Method and system of preventing corrosion of conductive structures
US6551491B2 (en) 2000-06-02 2003-04-22 Applied Semiconductor, Inc. Method and system of preventing corrosion of conductive structures
US6524466B1 (en) 2000-07-18 2003-02-25 Applied Semiconductor, Inc. Method and system of preventing fouling and corrosion of biomedical devices and structures
US6562201B2 (en) 2001-06-08 2003-05-13 Applied Semiconductor, Inc. Semiconductive polymeric system, devices incorporating the same, and its use in controlling corrosion
US6402933B1 (en) * 2001-06-08 2002-06-11 Applied Semiconductor, Inc. Method and system of preventing corrosion of conductive structures

Also Published As

Publication number Publication date
CA2450024A1 (en) 2002-12-19
EP1412556A4 (en) 2009-03-04
EA200400020A1 (ru) 2004-06-24
KR20040023613A (ko) 2004-03-18
KR100897320B1 (ko) 2009-05-14
US20020195353A1 (en) 2002-12-26
CN1242097C (zh) 2006-02-15
WO2002101117A1 (en) 2002-12-19
CA2450024C (en) 2011-05-24
EA005659B1 (ru) 2005-04-28
MXPA03011320A (es) 2004-12-06
US6562201B2 (en) 2003-05-13
CN1526036A (zh) 2004-09-01
EP1412556A1 (en) 2004-04-28
TW548784B (en) 2003-08-21
US6890420B2 (en) 2005-05-10
JP4334999B2 (ja) 2009-09-30
JP2004532935A (ja) 2004-10-28
US20040051332A1 (en) 2004-03-18
AU2002348505B2 (en) 2006-11-16

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