NO20014634L - Magnetisk stoff med maksimal kompleks-permeabilitet i kvasimikrobölgebåndet og fremgangsmåte for fremstilling - Google Patents

Magnetisk stoff med maksimal kompleks-permeabilitet i kvasimikrobölgebåndet og fremgangsmåte for fremstilling

Info

Publication number
NO20014634L
NO20014634L NO20014634A NO20014634A NO20014634L NO 20014634 L NO20014634 L NO 20014634L NO 20014634 A NO20014634 A NO 20014634A NO 20014634 A NO20014634 A NO 20014634A NO 20014634 L NO20014634 L NO 20014634L
Authority
NO
Norway
Prior art keywords
quasimicro
preparation
wave band
complex permeability
maximum complex
Prior art date
Application number
NO20014634A
Other languages
English (en)
Other versions
NO20014634D0 (no
NO322311B1 (no
Inventor
Shigeyoshi Yoshida
Hiroshi Ono
Yutaka Shimada
Shinsuke Andoh
Wei-Dong Li
Original Assignee
Tokin Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokin Corp filed Critical Tokin Corp
Publication of NO20014634D0 publication Critical patent/NO20014634D0/no
Publication of NO20014634L publication Critical patent/NO20014634L/no
Publication of NO322311B1 publication Critical patent/NO322311B1/no

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K9/00—Screening of apparatus or components against electric or magnetic fields
    • H05K9/0073—Shielding materials
    • H05K9/0081—Electromagnetic shielding materials, e.g. EMI, RFI shielding
    • H05K9/0084—Electromagnetic shielding materials, e.g. EMI, RFI shielding comprising a single continuous metallic layer on an electrically insulating supporting structure, e.g. metal foil, film, plating coating, electro-deposition, vapour-deposition
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
    • H01F1/0036—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties showing low dimensional magnetism, i.e. spin rearrangements due to a restriction of dimensions, e.g. showing giant magnetoresistivity
    • H01F1/0045—Zero dimensional, e.g. nanoparticles, soft nanoparticles for medical/biological use
    • H01F1/0063—Zero dimensional, e.g. nanoparticles, soft nanoparticles for medical/biological use in a non-magnetic matrix, e.g. granular solids
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
    • H01F1/01—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
    • H01F1/03—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
    • H01F1/12—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials
    • H01F1/33—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials mixtures of metallic and non-metallic particles; metallic particles having oxide skin
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/007—Thin magnetic films, e.g. of one-domain structure ultrathin or granular films
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/30—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE]
    • H01F41/301—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE] for applying ultrathin or granular layers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K9/00—Screening of apparatus or components against electric or magnetic fields
    • H05K9/0073—Shielding materials
    • H05K9/0081—Electromagnetic shielding materials, e.g. EMI, RFI shielding
    • H05K9/0083—Electromagnetic shielding materials, e.g. EMI, RFI shielding comprising electro-conductive non-fibrous particles embedded in an electrically insulating supporting structure, e.g. powder, flakes, whiskers

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electromagnetism (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Molecular Biology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biomedical Technology (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Dispersion Chemistry (AREA)
  • Thin Magnetic Films (AREA)
  • Physical Vapour Deposition (AREA)
  • Soft Magnetic Materials (AREA)
  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
NO20014634A 2000-01-24 2001-09-24 Magnetisk stoff med maksimal kompleks-permeabilitet i kvasimikrobolgebandet og fremgangsmate for fremstilling NO322311B1 (no)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000052507A JP2001210518A (ja) 2000-01-24 2000-01-24 磁気損失材料とその製造方法およびそれを用いた高周波電流抑制体
PCT/JP2001/000437 WO2001054145A1 (en) 2000-01-24 2001-01-24 Magnetic substance with maximum complex permeability in quasi-microwave band and method for production of the same

Publications (3)

Publication Number Publication Date
NO20014634D0 NO20014634D0 (no) 2001-09-24
NO20014634L true NO20014634L (no) 2001-09-24
NO322311B1 NO322311B1 (no) 2006-09-11

Family

ID=18574011

Family Applications (1)

Application Number Title Priority Date Filing Date
NO20014634A NO322311B1 (no) 2000-01-24 2001-09-24 Magnetisk stoff med maksimal kompleks-permeabilitet i kvasimikrobolgebandet og fremgangsmate for fremstilling

Country Status (10)

Country Link
US (1) US20030024605A1 (no)
EP (2) EP1166288B1 (no)
JP (1) JP2001210518A (no)
KR (1) KR100749679B1 (no)
CN (1) CN1190804C (no)
DE (2) DE60110865T2 (no)
MY (1) MY128745A (no)
NO (1) NO322311B1 (no)
TW (1) TW521283B (no)
WO (1) WO2001054145A1 (no)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MY131112A (en) 2000-04-04 2007-07-31 Nec Tokin Corp Electromagnetic noise suppressor, semiconductor device using the same, and method of manufacturing the same
US7371471B2 (en) 2004-03-08 2008-05-13 Nec Tokin Corporation Electromagnetic noise suppressing thin film
WO2005086556A1 (ja) * 2004-03-08 2005-09-15 Nec Tokin Corporation 電磁雑音吸収薄膜
JP4719109B2 (ja) * 2006-04-21 2011-07-06 株式会社東芝 磁性材料およびアンテナデバイス

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09181476A (ja) * 1995-12-26 1997-07-11 Mitsui Mining & Smelting Co Ltd 超微結晶磁性膜からなる電波吸収体
JP3608063B2 (ja) * 1996-08-23 2005-01-05 Ｎｅｃトーキン株式会社 Ｅｍｉ対策部品及びそれを備えた能動素子
JPH10270246A (ja) * 1997-03-22 1998-10-09 Res Inst Electric Magnetic Alloys 磁性薄膜
EP0991087A3 (en) * 1998-09-28 2000-10-25 Matsushita Electric Industrial Co., Ltd. Soft magnetic thin film, soft magnetic multi-layered film, producing method thereof and magnetic device using them
US6379810B1 (en) * 1999-01-18 2002-04-30 Matsushita Electric Industrial Co., Ltd. High resistance magnetic film

Also Published As

Publication number Publication date
TW521283B (en) 2003-02-21
KR20020033602A (ko) 2002-05-07
DE60110865T2 (de) 2006-04-27
DE60129854T2 (de) 2007-12-13
EP1377150B1 (en) 2007-08-08
KR100749679B1 (ko) 2007-08-16
NO20014634D0 (no) 2001-09-24
DE60129854D1 (de) 2007-09-20
EP1166288A1 (en) 2002-01-02
DE60110865D1 (de) 2005-06-23
EP1166288B1 (en) 2005-05-18
WO2001054145A1 (en) 2001-07-26
EP1377150A1 (en) 2004-01-02
MY128745A (en) 2007-02-28
CN1190804C (zh) 2005-02-23
US20030024605A1 (en) 2003-02-06
CN1365502A (zh) 2002-08-21
JP2001210518A (ja) 2001-08-03
NO322311B1 (no) 2006-09-11

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