NL8801255A - Werkwijze voor het vervaardigen van een halfgeleiderinrichting. - Google Patents

Werkwijze voor het vervaardigen van een halfgeleiderinrichting. Download PDF

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Publication number
NL8801255A
NL8801255A NL8801255A NL8801255A NL8801255A NL 8801255 A NL8801255 A NL 8801255A NL 8801255 A NL8801255 A NL 8801255A NL 8801255 A NL8801255 A NL 8801255A NL 8801255 A NL8801255 A NL 8801255A
Authority
NL
Netherlands
Prior art keywords
layer
radiation
selectivity
compound
silylation reaction
Prior art date
Application number
NL8801255A
Other languages
English (en)
Dutch (nl)
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Priority to NL8801255A priority Critical patent/NL8801255A/nl
Priority to DE1989611748 priority patent/DE68911748T2/de
Priority to EP19890201182 priority patent/EP0342737B1/de
Priority to JP11882889A priority patent/JPH0222659A/ja
Publication of NL8801255A publication Critical patent/NL8801255A/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/265—Selective reaction with inorganic or organometallic reagents after image-wise exposure, e.g. silylation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
NL8801255A 1988-05-16 1988-05-16 Werkwijze voor het vervaardigen van een halfgeleiderinrichting. NL8801255A (nl)

Priority Applications (4)

Application Number Priority Date Filing Date Title
NL8801255A NL8801255A (nl) 1988-05-16 1988-05-16 Werkwijze voor het vervaardigen van een halfgeleiderinrichting.
DE1989611748 DE68911748T2 (de) 1988-05-16 1989-05-10 Verfahren zur Herstellung einer Halbleitervorrichtung.
EP19890201182 EP0342737B1 (de) 1988-05-16 1989-05-10 Verfahren zur Herstellung einer Halbleitervorrichtung
JP11882889A JPH0222659A (ja) 1988-05-16 1989-05-15 半導体デバイスの製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL8801255 1988-05-16
NL8801255A NL8801255A (nl) 1988-05-16 1988-05-16 Werkwijze voor het vervaardigen van een halfgeleiderinrichting.

Publications (1)

Publication Number Publication Date
NL8801255A true NL8801255A (nl) 1989-12-18

Family

ID=19852302

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8801255A NL8801255A (nl) 1988-05-16 1988-05-16 Werkwijze voor het vervaardigen van een halfgeleiderinrichting.

Country Status (4)

Country Link
EP (1) EP0342737B1 (de)
JP (1) JPH0222659A (de)
DE (1) DE68911748T2 (de)
NL (1) NL8801255A (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5036452A (en) * 1989-12-28 1991-07-30 At&T Bell Laboratories Current sharing control with limited output voltage range for paralleled power converters
US5550007A (en) * 1993-05-28 1996-08-27 Lucent Technologies Inc. Surface-imaging technique for lithographic processes for device fabrication
US7368396B2 (en) 2005-07-01 2008-05-06 Lexmark International, Inc. Dry etching methods

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2170015A (en) * 1985-01-11 1986-07-23 Philips Electronic Associated Method of manufacturing a semiconductor device
US4782008A (en) * 1985-03-19 1988-11-01 International Business Machines Corporation Plasma-resistant polymeric material, preparation thereof, and use thereof
GB8611229D0 (en) * 1986-05-08 1986-06-18 Ucb Sa Forming positive pattern
US4808511A (en) * 1987-05-19 1989-02-28 International Business Machines Corporation Vapor phase photoresist silylation process

Also Published As

Publication number Publication date
DE68911748T2 (de) 1994-06-30
DE68911748D1 (de) 1994-02-10
EP0342737B1 (de) 1993-12-29
EP0342737A1 (de) 1989-11-23
JPH0222659A (ja) 1990-01-25

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