NL8701100A - Werkwijze voor het vormen van beelden. - Google Patents

Werkwijze voor het vormen van beelden. Download PDF

Info

Publication number
NL8701100A
NL8701100A NL8701100A NL8701100A NL8701100A NL 8701100 A NL8701100 A NL 8701100A NL 8701100 A NL8701100 A NL 8701100A NL 8701100 A NL8701100 A NL 8701100A NL 8701100 A NL8701100 A NL 8701100A
Authority
NL
Netherlands
Prior art keywords
residue
group
radiation
parts
groups
Prior art date
Application number
NL8701100A
Other languages
English (en)
Dutch (nl)
Original Assignee
Ciba Geigy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB868611480A external-priority patent/GB8611480D0/en
Priority claimed from GB868614529A external-priority patent/GB8614529D0/en
Application filed by Ciba Geigy filed Critical Ciba Geigy
Publication of NL8701100A publication Critical patent/NL8701100A/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/148—Light sensitive titanium compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Polymerisation Methods In General (AREA)
  • Epoxy Resins (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Paints Or Removers (AREA)
NL8701100A 1986-05-10 1987-05-08 Werkwijze voor het vormen van beelden. NL8701100A (nl)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
GB8611480 1986-05-10
GB868611480A GB8611480D0 (en) 1986-05-10 1986-05-10 Forming images
GB8614529 1986-06-14
GB868614529A GB8614529D0 (en) 1986-06-14 1986-06-14 Forming images

Publications (1)

Publication Number Publication Date
NL8701100A true NL8701100A (nl) 1987-12-01

Family

ID=26290751

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8701100A NL8701100A (nl) 1986-05-10 1987-05-08 Werkwijze voor het vormen van beelden.

Country Status (12)

Country Link
US (1) US4849320A (US06342305-20020129-C00040.png)
JP (1) JP2660835B2 (US06342305-20020129-C00040.png)
BE (1) BE1001615A4 (US06342305-20020129-C00040.png)
CA (1) CA1315592C (US06342305-20020129-C00040.png)
CH (1) CH678897A5 (US06342305-20020129-C00040.png)
DE (1) DE3715181C2 (US06342305-20020129-C00040.png)
ES (1) ES2003717A6 (US06342305-20020129-C00040.png)
FR (1) FR2598522B1 (US06342305-20020129-C00040.png)
GB (1) GB2191199B (US06342305-20020129-C00040.png)
IT (1) IT1205008B (US06342305-20020129-C00040.png)
NL (1) NL8701100A (US06342305-20020129-C00040.png)
SE (1) SE467379B (US06342305-20020129-C00040.png)

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Also Published As

Publication number Publication date
BE1001615A4 (fr) 1989-12-19
GB2191199A (en) 1987-12-09
IT8720448A0 (it) 1987-05-08
FR2598522A1 (fr) 1987-11-13
SE8701902L (sv) 1987-11-11
DE3715181C2 (de) 1998-10-29
IT1205008B (it) 1989-03-10
JP2660835B2 (ja) 1997-10-08
US4849320A (en) 1989-07-18
CA1315592C (en) 1993-04-06
JPS62273529A (ja) 1987-11-27
GB8710794D0 (en) 1987-06-10
FR2598522B1 (fr) 1994-05-27
GB2191199B (en) 1990-06-13
DE3715181A1 (de) 1987-11-12
SE467379B (sv) 1992-07-06
SE8701902D0 (sv) 1987-05-08
CH678897A5 (US06342305-20020129-C00040.png) 1991-11-15
ES2003717A6 (es) 1988-11-01

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