NL8603009A - Halfgeleiderlaser en werkwijze ter vervaardiging daarvan. - Google Patents
Halfgeleiderlaser en werkwijze ter vervaardiging daarvan. Download PDFInfo
- Publication number
- NL8603009A NL8603009A NL8603009A NL8603009A NL8603009A NL 8603009 A NL8603009 A NL 8603009A NL 8603009 A NL8603009 A NL 8603009A NL 8603009 A NL8603009 A NL 8603009A NL 8603009 A NL8603009 A NL 8603009A
- Authority
- NL
- Netherlands
- Prior art keywords
- layer
- conductivity type
- passive
- semiconductor laser
- region
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title claims description 19
- 238000004519 manufacturing process Methods 0.000 title description 3
- 238000000034 method Methods 0.000 title description 3
- 238000010521 absorption reaction Methods 0.000 claims description 27
- 230000000903 blocking effect Effects 0.000 claims description 22
- 239000000758 substrate Substances 0.000 claims description 9
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 claims description 7
- 239000004020 conductor Substances 0.000 claims description 6
- 230000001427 coherent effect Effects 0.000 claims description 4
- 230000005855 radiation Effects 0.000 claims description 4
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 claims description 3
- 230000005670 electromagnetic radiation Effects 0.000 claims description 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 2
- MDPILPRLPQYEEN-UHFFFAOYSA-N aluminium arsenide Chemical compound [As]#[Al] MDPILPRLPQYEEN-UHFFFAOYSA-N 0.000 claims description 2
- 229910052738 indium Inorganic materials 0.000 claims 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims 1
- 239000000203 mixture Substances 0.000 description 7
- 239000011701 zinc Substances 0.000 description 5
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical group [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 4
- 239000013078 crystal Substances 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical group [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- OEDMOCYNWLHUDP-UHFFFAOYSA-N bromomethanol Chemical compound OCBr OEDMOCYNWLHUDP-UHFFFAOYSA-N 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical group [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000007648 laser printing Methods 0.000 description 1
- 239000012035 limiting reagent Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
- H01S5/2275—Buried mesa structure ; Striped active layer mesa created by etching
- H01S5/2277—Buried mesa structure ; Striped active layer mesa created by etching double channel planar buried heterostructure [DCPBH] laser
Landscapes
- Physics & Mathematics (AREA)
- Geometry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL8603009A NL8603009A (nl) | 1986-11-27 | 1986-11-27 | Halfgeleiderlaser en werkwijze ter vervaardiging daarvan. |
DE8787202312T DE3774542D1 (de) | 1986-11-27 | 1987-11-25 | Halbleiterlaser und verfahren zu seiner herstellung. |
JP62295397A JP2537924B2 (ja) | 1986-11-27 | 1987-11-25 | 半導体レ―ザ |
EP87202312A EP0270170B1 (fr) | 1986-11-27 | 1987-11-25 | Laser à semi-conducteurs et sa méthode de fabrication |
US07/304,894 US4870650A (en) | 1986-11-27 | 1989-01-30 | Semiconductor laser having a boundary-region absorption layer |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL8603009A NL8603009A (nl) | 1986-11-27 | 1986-11-27 | Halfgeleiderlaser en werkwijze ter vervaardiging daarvan. |
NL8603009 | 1986-11-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL8603009A true NL8603009A (nl) | 1988-06-16 |
Family
ID=19848893
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL8603009A NL8603009A (nl) | 1986-11-27 | 1986-11-27 | Halfgeleiderlaser en werkwijze ter vervaardiging daarvan. |
Country Status (5)
Country | Link |
---|---|
US (1) | US4870650A (fr) |
EP (1) | EP0270170B1 (fr) |
JP (1) | JP2537924B2 (fr) |
DE (1) | DE3774542D1 (fr) |
NL (1) | NL8603009A (fr) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2679388B1 (fr) * | 1991-07-19 | 1995-02-10 | Cit Alcatel | Laser semi-conducteur a double canal et son procede de realisation. |
DE69404367T2 (de) * | 1993-03-25 | 1998-02-26 | Nec Corp | Planar-Vergrabene-Heterostruktur-Laserdiode mit zwei Kanälen und niedrigem Leckstrom |
JP2699888B2 (ja) * | 1994-09-20 | 1998-01-19 | 日本電気株式会社 | 埋め込み型p型基板半導体レーザ |
US5956360A (en) * | 1997-03-28 | 1999-09-21 | Lucent Technologies Inc. | Uncooled lasers with reduced low bias capacitance effect |
DE19963807A1 (de) * | 1999-12-30 | 2001-07-19 | Osram Opto Semiconductors Gmbh | Streifenlaserdiodenelement |
US6862300B1 (en) * | 2002-09-17 | 2005-03-01 | Bookham Technology Plc | High power semiconductor laser diode and method for making such a diode |
DE102017108435A1 (de) * | 2017-04-20 | 2018-10-25 | Osram Opto Semiconductors Gmbh | Halbleiterlaserdiode und Verfahren zur Herstellung einer Halbleiterlaserdiode |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS576265U (fr) * | 1980-06-13 | 1982-01-13 | ||
JPS5957486A (ja) * | 1982-09-27 | 1984-04-03 | Nec Corp | 埋め込み形半導体レ−ザ |
GB2139422B (en) * | 1983-03-24 | 1987-06-03 | Hitachi Ltd | Semiconductor laser and method of fabricating the same |
JPS6034088A (ja) * | 1983-08-04 | 1985-02-21 | Nec Corp | 光半導体素子 |
NL8401172A (nl) * | 1984-04-12 | 1985-11-01 | Philips Nv | Halfgeleiderlaser. |
JPS617682A (ja) * | 1984-06-22 | 1986-01-14 | Nec Corp | 双安定半導体レ−ザ |
JPS61150393A (ja) * | 1984-12-25 | 1986-07-09 | Fujitsu Ltd | 半導体レ−ザおよびその製造方法 |
JPS61164287A (ja) * | 1985-01-16 | 1986-07-24 | Nec Corp | 半導体レ−ザ |
JPH0766994B2 (ja) * | 1985-02-19 | 1995-07-19 | シャープ株式会社 | 半導体レーザ素子 |
FR2581801B1 (fr) * | 1985-05-13 | 1987-06-26 | Devoldere Pascal | Procede de realisation de lasers a semiconducteurs a jonctions bloquantes assurant un confinement electrique |
-
1986
- 1986-11-27 NL NL8603009A patent/NL8603009A/nl not_active Application Discontinuation
-
1987
- 1987-11-25 JP JP62295397A patent/JP2537924B2/ja not_active Expired - Lifetime
- 1987-11-25 DE DE8787202312T patent/DE3774542D1/de not_active Expired - Lifetime
- 1987-11-25 EP EP87202312A patent/EP0270170B1/fr not_active Expired
-
1989
- 1989-01-30 US US07/304,894 patent/US4870650A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE3774542D1 (de) | 1991-12-19 |
JPS63142888A (ja) | 1988-06-15 |
US4870650A (en) | 1989-09-26 |
EP0270170A1 (fr) | 1988-06-08 |
JP2537924B2 (ja) | 1996-09-25 |
EP0270170B1 (fr) | 1991-11-13 |
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Legal Events
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A1B | A search report has been drawn up | ||
BV | The patent application has lapsed |