NL8502275A - In slanke deelbundels opgedeelde bundel geladen deeltjes. - Google Patents

In slanke deelbundels opgedeelde bundel geladen deeltjes. Download PDF

Info

Publication number
NL8502275A
NL8502275A NL8502275A NL8502275A NL8502275A NL 8502275 A NL8502275 A NL 8502275A NL 8502275 A NL8502275 A NL 8502275A NL 8502275 A NL8502275 A NL 8502275A NL 8502275 A NL8502275 A NL 8502275A
Authority
NL
Netherlands
Prior art keywords
irradiation device
emitters
beams
objective lens
sub
Prior art date
Application number
NL8502275A
Other languages
English (en)
Dutch (nl)
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Priority to NL8502275A priority Critical patent/NL8502275A/nl
Priority to EP86201359A priority patent/EP0213664A1/fr
Priority to JP61192233A priority patent/JPS6245110A/ja
Publication of NL8502275A publication Critical patent/NL8502275A/nl

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
NL8502275A 1985-08-19 1985-08-19 In slanke deelbundels opgedeelde bundel geladen deeltjes. NL8502275A (nl)

Priority Applications (3)

Application Number Priority Date Filing Date Title
NL8502275A NL8502275A (nl) 1985-08-19 1985-08-19 In slanke deelbundels opgedeelde bundel geladen deeltjes.
EP86201359A EP0213664A1 (fr) 1985-08-19 1986-08-01 Faisceau de particules chargées divisé en minces sous-faisceaux
JP61192233A JPS6245110A (ja) 1985-08-19 1986-08-19 帯電粒子パタ−ン発生器

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL8502275A NL8502275A (nl) 1985-08-19 1985-08-19 In slanke deelbundels opgedeelde bundel geladen deeltjes.
NL8502275 1985-08-19

Publications (1)

Publication Number Publication Date
NL8502275A true NL8502275A (nl) 1987-03-16

Family

ID=19846434

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8502275A NL8502275A (nl) 1985-08-19 1985-08-19 In slanke deelbundels opgedeelde bundel geladen deeltjes.

Country Status (3)

Country Link
EP (1) EP0213664A1 (fr)
JP (1) JPS6245110A (fr)
NL (1) NL8502275A (fr)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4897552A (en) * 1987-04-28 1990-01-30 Canon Kabushiki Kaisha Multi-electron-beam pattern drawing apparatus
EP0289278B1 (fr) * 1987-04-28 1994-08-17 Canon Kabushiki Kaisha Appareil d'élaboration de motifs à faisceaux d'électrons multiples
NL8702570A (nl) * 1987-10-29 1989-05-16 Philips Nv Geladen deeltjes bundel apparaat.
WO1998048443A1 (fr) * 1997-04-18 1998-10-29 Etec Systems, Inc. Optique electronique a reseau multifaisceaux
EP1150327B1 (fr) 2000-04-27 2018-02-14 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Dispositif multi-faisceaux de particules chargées
EP1577926A1 (fr) 2004-03-19 2005-09-21 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik Mbh Système à faisceau de particules à haute densité de courant
JP2011238387A (ja) * 2010-05-07 2011-11-24 Jeol Ltd エミッタアレイを用いた電子プローブ装置
US9666074B2 (en) 2014-08-21 2017-05-30 Ford Global Technologies, Llc Method and system for vehicle parking
CN105550517B (zh) * 2015-12-13 2018-08-07 复旦大学 利用示踪粒子的关联扩散判断液体表面漂移运动方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2443085A1 (fr) * 1978-07-24 1980-06-27 Thomson Csf Dispositif de microlithographie par bombardement electronique
NL8200559A (nl) * 1982-02-15 1983-09-01 Ir Jan Bart Le Poole Prof Dr Bestralingsinrichting met bundelsplitsing.
NL8201732A (nl) * 1982-04-27 1983-11-16 Bernardus Johannes Gerardus Ma Bestralingsinrichting met bundelsplitsing.

Also Published As

Publication number Publication date
JPS6245110A (ja) 1987-02-27
EP0213664A1 (fr) 1987-03-11

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BV The patent application has lapsed