NL8104808A - Elektrolysebad en werkwijze voor snelle afzetting van een nikkellaag. - Google Patents
Elektrolysebad en werkwijze voor snelle afzetting van een nikkellaag. Download PDFInfo
- Publication number
- NL8104808A NL8104808A NL8104808A NL8104808A NL8104808A NL 8104808 A NL8104808 A NL 8104808A NL 8104808 A NL8104808 A NL 8104808A NL 8104808 A NL8104808 A NL 8104808A NL 8104808 A NL8104808 A NL 8104808A
- Authority
- NL
- Netherlands
- Prior art keywords
- electrolysis bath
- nickel
- electrolysis
- bath
- nickel layer
- Prior art date
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims description 30
- 238000005868 electrolysis reaction Methods 0.000 title claims description 21
- 229910052759 nickel Inorganic materials 0.000 title claims description 14
- 238000000034 method Methods 0.000 title claims description 4
- 230000008021 deposition Effects 0.000 title claims description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 7
- 239000004327 boric acid Substances 0.000 claims description 6
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 5
- 239000003792 electrolyte Substances 0.000 claims description 5
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical group [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 claims description 4
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 claims description 4
- SHHKMWMIKILKQW-UHFFFAOYSA-N 2-formylbenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1C=O SHHKMWMIKILKQW-UHFFFAOYSA-N 0.000 claims description 3
- 150000002815 nickel Chemical class 0.000 claims description 3
- 229910052700 potassium Inorganic materials 0.000 claims description 2
- 239000011591 potassium Substances 0.000 claims description 2
- -1 potassium perfluoroalkyl sulfonates Chemical class 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims description 2
- 239000000080 wetting agent Substances 0.000 claims description 2
- 238000000151 deposition Methods 0.000 claims 2
- 125000005619 boric acid group Chemical group 0.000 claims 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 229910000008 nickel(II) carbonate Inorganic materials 0.000 description 3
- ZULUUIKRFGGGTL-UHFFFAOYSA-L nickel(ii) carbonate Chemical compound [Ni+2].[O-]C([O-])=O ZULUUIKRFGGGTL-UHFFFAOYSA-L 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 239000003906 humectant Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 2
- UPPLJLAHMKABPR-UHFFFAOYSA-H 2-hydroxypropane-1,2,3-tricarboxylate;nickel(2+) Chemical compound [Ni+2].[Ni+2].[Ni+2].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O.[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O UPPLJLAHMKABPR-UHFFFAOYSA-H 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005065 mining Methods 0.000 description 1
- PXIGQZGKWPSHTM-UHFFFAOYSA-N molecular fluorine;potassium Chemical class [K].FF PXIGQZGKWPSHTM-UHFFFAOYSA-N 0.000 description 1
- 229910001453 nickel ion Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000004323 potassium nitrate Substances 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US19989480A | 1980-10-23 | 1980-10-23 | |
US19989480 | 1980-10-23 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL8104808A true NL8104808A (nl) | 1982-05-17 |
Family
ID=22739453
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL8104808A NL8104808A (nl) | 1980-10-23 | 1981-10-23 | Elektrolysebad en werkwijze voor snelle afzetting van een nikkellaag. |
Country Status (15)
Country | Link |
---|---|
JP (1) | JPS6020475B2 (de) |
AU (1) | AU527954B2 (de) |
BE (1) | BE890836A (de) |
BR (1) | BR8106819A (de) |
CA (1) | CA1180677A (de) |
CH (1) | CH649579A5 (de) |
DE (1) | DE3139641C2 (de) |
DK (1) | DK422181A (de) |
ES (1) | ES506173A0 (de) |
FR (1) | FR2492849A1 (de) |
GB (1) | GB2085924B (de) |
HK (1) | HK66786A (de) |
IT (1) | IT1171598B (de) |
NL (1) | NL8104808A (de) |
SE (1) | SE8106250L (de) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1162505A (en) * | 1980-10-31 | 1984-02-21 | Donald R. Rosegren | Process for high speed nickel and gold electroplate system |
US4543166A (en) * | 1984-10-01 | 1985-09-24 | Omi International Corporation | Zinc-alloy electrolyte and process |
JP4904933B2 (ja) * | 2005-09-27 | 2012-03-28 | 日立電線株式会社 | ニッケルめっき液とその製造方法、ニッケルめっき方法およびプリント配線板用銅箔 |
KR102281132B1 (ko) * | 2019-10-24 | 2021-07-26 | 일진머티리얼즈 주식회사 | 박막형 커패시터 제조용 전해니켈박 및 그의 제조방법 |
CN112323096A (zh) * | 2020-09-23 | 2021-02-05 | 河北东恩企业管理咨询有限公司 | 一种含硫镍圆饼的制备方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3334032A (en) * | 1964-05-08 | 1967-08-01 | Hanson Van Winkle Munning Co | Electrodeposition of nickel |
US3697391A (en) * | 1970-07-17 | 1972-10-10 | M & T Chemicals Inc | Electroplating processes and compositions |
ZA721964B (en) * | 1971-04-01 | 1972-12-27 | M & T Chemicals Inc | Nickel plating |
-
1981
- 1981-09-24 DK DK422181A patent/DK422181A/da not_active Application Discontinuation
- 1981-09-25 AU AU75676/81A patent/AU527954B2/en not_active Ceased
- 1981-09-25 CA CA000386693A patent/CA1180677A/en not_active Expired
- 1981-10-06 DE DE3139641A patent/DE3139641C2/de not_active Expired
- 1981-10-09 ES ES506173A patent/ES506173A0/es active Granted
- 1981-10-13 JP JP56163363A patent/JPS6020475B2/ja not_active Expired
- 1981-10-21 IT IT49529/81A patent/IT1171598B/it active
- 1981-10-22 FR FR8119853A patent/FR2492849A1/fr active Granted
- 1981-10-22 BE BE0/206326A patent/BE890836A/fr not_active IP Right Cessation
- 1981-10-22 SE SE8106250A patent/SE8106250L/ unknown
- 1981-10-22 BR BR8106819A patent/BR8106819A/pt not_active IP Right Cessation
- 1981-10-22 CH CH6755/81A patent/CH649579A5/de not_active IP Right Cessation
- 1981-10-23 NL NL8104808A patent/NL8104808A/nl not_active Application Discontinuation
- 1981-10-23 GB GB8132066A patent/GB2085924B/en not_active Expired
-
1986
- 1986-09-11 HK HK667/86A patent/HK66786A/xx unknown
Also Published As
Publication number | Publication date |
---|---|
CA1180677A (en) | 1985-01-08 |
FR2492849A1 (fr) | 1982-04-30 |
ES8302802A1 (es) | 1983-01-16 |
GB2085924B (en) | 1983-06-02 |
DE3139641C2 (de) | 1986-07-31 |
AU527954B2 (en) | 1983-03-31 |
DK422181A (da) | 1982-04-24 |
SE8106250L (sv) | 1982-04-24 |
DE3139641A1 (de) | 1982-09-30 |
BE890836A (fr) | 1982-04-22 |
IT8149529A0 (it) | 1981-10-21 |
FR2492849B1 (de) | 1984-11-23 |
BR8106819A (pt) | 1982-07-06 |
GB2085924A (en) | 1982-05-06 |
AU7567681A (en) | 1982-04-29 |
IT1171598B (it) | 1987-06-10 |
JPS5794589A (en) | 1982-06-12 |
CH649579A5 (de) | 1985-05-31 |
HK66786A (en) | 1986-09-18 |
ES506173A0 (es) | 1983-01-16 |
JPS6020475B2 (ja) | 1985-05-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A1A | A request for search or an international-type search has been filed | ||
BB | A search report has been drawn up | ||
BC | A request for examination has been filed | ||
A85 | Still pending on 85-01-01 | ||
DNT | Communications of changes of names of applicants whose applications have been laid open to public inspection |
Free format text: OCCIDENTAL CHEMICAL CORPORATION TE WARREN |
|
CNR | Transfer of rights (patent application after its laying open for public inspection) |
Free format text: OMI INTERNATIONAL CORPORATION |
|
BV | The patent application has lapsed |