NL8006438A - Werkwijze voor het bewerken van een inrichting en inrichting verkregen volgens deze werkwijze. - Google Patents

Werkwijze voor het bewerken van een inrichting en inrichting verkregen volgens deze werkwijze. Download PDF

Info

Publication number
NL8006438A
NL8006438A NL8006438A NL8006438A NL8006438A NL 8006438 A NL8006438 A NL 8006438A NL 8006438 A NL8006438 A NL 8006438A NL 8006438 A NL8006438 A NL 8006438A NL 8006438 A NL8006438 A NL 8006438A
Authority
NL
Netherlands
Prior art keywords
thickness
lacquer
lacquer material
layer
bottom layer
Prior art date
Application number
NL8006438A
Other languages
English (en)
Dutch (nl)
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co filed Critical Western Electric Co
Publication of NL8006438A publication Critical patent/NL8006438A/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Electron Beam Exposure (AREA)
NL8006438A 1979-11-27 1980-11-26 Werkwijze voor het bewerken van een inrichting en inrichting verkregen volgens deze werkwijze. NL8006438A (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US9780979A 1979-11-27 1979-11-27
US9780979 1979-11-27

Publications (1)

Publication Number Publication Date
NL8006438A true NL8006438A (nl) 1981-07-01

Family

ID=22265225

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8006438A NL8006438A (nl) 1979-11-27 1980-11-26 Werkwijze voor het bewerken van een inrichting en inrichting verkregen volgens deze werkwijze.

Country Status (6)

Country Link
JP (1) JPS5691428A (enExample)
CA (1) CA1155238A (enExample)
DE (1) DE3044434A1 (enExample)
FR (1) FR2470402B1 (enExample)
GB (1) GB2064152B (enExample)
NL (1) NL8006438A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3131031A1 (de) * 1981-08-05 1983-02-24 Siemens AG, 1000 Berlin und 8000 München Verfahren zum erzeugen der felddotierung beim herstellen von integrierten komplementaeren mos-feldeffekttransistoren
US5139922A (en) * 1987-04-10 1992-08-18 Matsushita Electronics Corporation Method of making resist pattern
DE102006050363B4 (de) 2006-10-25 2018-08-16 Advanced Mask Technology Center Gmbh & Co. Kg Verfahren zur Herstellung einer Fotomaske, Verfahren zur Strukturierung einer Schicht oder eines Schichtstapels und Resiststapel auf einem Maskensubstrat

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1622302A1 (de) * 1968-02-01 1970-10-29 Telefunken Patent Verfahren zum photographischen UEbertragen von Strukturen auf Halbleiterkoerper
US3934057A (en) * 1973-12-19 1976-01-20 International Business Machines Corporation High sensitivity positive resist layers and mask formation process
JPS51129190A (en) * 1975-05-02 1976-11-10 Fujitsu Ltd Manufacturing method of semiconductor
US4024293A (en) * 1975-12-10 1977-05-17 International Business Machines Corporation High sensitivity resist system for lift-off metallization
JPS5387668A (en) * 1977-01-13 1978-08-02 Toshiba Corp Forming method of patterns
US4211834A (en) * 1977-12-30 1980-07-08 International Business Machines Corporation Method of using a o-quinone diazide sensitized phenol-formaldehyde resist as a deep ultraviolet light exposure mask

Also Published As

Publication number Publication date
FR2470402A1 (fr) 1981-05-29
JPH0468769B2 (enExample) 1992-11-04
GB2064152A (en) 1981-06-10
DE3044434A1 (de) 1981-08-27
GB2064152B (en) 1984-02-08
CA1155238A (en) 1983-10-11
JPS5691428A (en) 1981-07-24
FR2470402B1 (fr) 1987-03-20

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