NL8001224A - Verdamper voor vacuum opdampinrichting. - Google Patents
Verdamper voor vacuum opdampinrichting. Download PDFInfo
- Publication number
- NL8001224A NL8001224A NL8001224A NL8001224A NL8001224A NL 8001224 A NL8001224 A NL 8001224A NL 8001224 A NL8001224 A NL 8001224A NL 8001224 A NL8001224 A NL 8001224A NL 8001224 A NL8001224 A NL 8001224A
- Authority
- NL
- Netherlands
- Prior art keywords
- vapor
- crucible
- evaporator
- screen
- recesses
- Prior art date
Links
- 239000004020 conductor Substances 0.000 claims description 15
- 230000004888 barrier function Effects 0.000 claims description 12
- 238000001704 evaporation Methods 0.000 claims description 11
- 238000010894 electron beam technology Methods 0.000 claims description 10
- 230000008020 evaporation Effects 0.000 claims description 10
- 239000000126 substance Substances 0.000 description 16
- 239000010410 layer Substances 0.000 description 7
- 238000011109 contamination Methods 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000005494 condensation Effects 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 235000004035 Cryptotaenia japonica Nutrition 0.000 description 1
- 102000007641 Trefoil Factors Human genes 0.000 description 1
- 235000015724 Trifolium pratense Nutrition 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000006200 vaporizer Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19792917841 DE2917841A1 (de) | 1979-05-03 | 1979-05-03 | Verdampfer fuer vakuumaufdampfanlagen |
| DE2917841 | 1979-05-03 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL8001224A true NL8001224A (nl) | 1980-11-05 |
Family
ID=6069838
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL8001224A NL8001224A (nl) | 1979-05-03 | 1980-02-28 | Verdamper voor vacuum opdampinrichting. |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4328763A (enExample) |
| JP (1) | JPS55152178A (enExample) |
| DE (1) | DE2917841A1 (enExample) |
| FR (1) | FR2455635A1 (enExample) |
| GB (1) | GB2049738B (enExample) |
| NL (1) | NL8001224A (enExample) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH651592A5 (de) * | 1982-10-26 | 1985-09-30 | Balzers Hochvakuum | Dampfquelle fuer vakuumbedampfungsanlagen. |
| DE3421538A1 (de) * | 1984-06-08 | 1985-12-12 | ATOMIKA Technische Physik GmbH, 8000 München | Vakuumaufdampfeinrichtung |
| US4791273A (en) * | 1987-05-15 | 1988-12-13 | Varian Associates, Inc. | Vaporizer system for ion source |
| GB2228948A (en) * | 1989-02-28 | 1990-09-12 | British Aerospace | Fabrication of thin films from a composite target |
| US5906857A (en) * | 1997-05-13 | 1999-05-25 | Ultratherm, Inc. | Apparatus, system and method for controlling emission parameters attending vaporized in a HV environment |
| US6342103B1 (en) * | 2000-06-01 | 2002-01-29 | The Boc Group, Inc. | Multiple pocket electron beam source |
| US6641674B2 (en) * | 2000-11-10 | 2003-11-04 | Helix Technology Inc. | Movable evaporation device |
| KR100461283B1 (ko) * | 2000-12-30 | 2004-12-14 | 현대엘씨디주식회사 | 유기전기발광소자 제조장치용 유기물증발보트구조 |
| GB0307745D0 (en) * | 2003-04-03 | 2003-05-07 | Microemissive Displays Ltd | Method and apparatus for depositing material on a substrate |
| CN100516284C (zh) * | 2006-01-21 | 2009-07-22 | 鸿富锦精密工业（深圳）有限公司 | 蒸镀装置 |
| US8297223B2 (en) * | 2007-10-02 | 2012-10-30 | Msp Corporation | Method and apparatus for particle filtration and enhancing tool performance in film deposition |
| CN101619446A (zh) * | 2008-06-30 | 2010-01-06 | 鸿富锦精密工业（深圳）有限公司 | 镀膜蒸发载具及使用该镀膜蒸发载具的真空镀膜装置 |
| EP2182087B1 (en) * | 2008-10-30 | 2012-07-25 | Essilor International (Compagnie Générale D'Optique) | A vacuum vapor coating device for coating a substrate |
| JP5582809B2 (ja) * | 2009-02-13 | 2014-09-03 | ワイエス電子工業株式会社 | プラズマ発生装置 |
| CN104789930B (zh) * | 2015-04-24 | 2016-05-11 | 京东方科技集团股份有限公司 | 蒸镀设备及采用该蒸镀设备的操作方法 |
| CN113227438B (zh) * | 2018-11-30 | 2023-07-11 | 磁性流体技术（美国）公司 | 用于电子束源涂覆的坩埚盖 |
| CN116770234B (zh) * | 2023-06-25 | 2023-12-15 | 苏州佑伦真空设备科技有限公司 | 一种防止串料的坩埚装置 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL291466A (enExample) * | 1962-04-13 | |||
| BE713308A (enExample) * | 1968-04-05 | 1968-10-07 | ||
| GB1371522A (en) * | 1971-10-01 | 1974-10-23 | Int Computers Ltd | Process for forming a manganese bismuthide film |
| GB1361771A (en) | 1972-02-15 | 1974-07-30 | Leybold Heraeus Verwaltung | Apparatus for heating material by means of a electron beam in a vacuum |
| US3853091A (en) * | 1973-12-03 | 1974-12-10 | Ibm | Thin film coating apparatus |
| CH580990A5 (enExample) * | 1974-03-04 | 1976-10-29 | Ebauches Sa | |
| CH626407A5 (enExample) * | 1977-07-08 | 1981-11-13 | Balzers Hochvakuum |
-
1979
- 1979-05-03 DE DE19792917841 patent/DE2917841A1/de not_active Withdrawn
-
1980
- 1980-02-28 NL NL8001224A patent/NL8001224A/nl not_active Application Discontinuation
- 1980-04-15 GB GB8012448A patent/GB2049738B/en not_active Expired
- 1980-04-25 FR FR8009410A patent/FR2455635A1/fr active Granted
- 1980-05-01 US US06/145,632 patent/US4328763A/en not_active Expired - Lifetime
- 1980-05-02 JP JP5803280A patent/JPS55152178A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| DE2917841A1 (de) | 1980-11-13 |
| US4328763A (en) | 1982-05-11 |
| JPS55152178A (en) | 1980-11-27 |
| GB2049738A (en) | 1980-12-31 |
| FR2455635A1 (fr) | 1980-11-28 |
| FR2455635B3 (enExample) | 1982-03-12 |
| GB2049738B (en) | 1983-02-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| BV | The patent application has lapsed |