NL7907434A - Werkwijze voor het vervaardigen van een halfgeleider- inrichting. - Google Patents

Werkwijze voor het vervaardigen van een halfgeleider- inrichting. Download PDF

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Publication number
NL7907434A
NL7907434A NL7907434A NL7907434A NL7907434A NL 7907434 A NL7907434 A NL 7907434A NL 7907434 A NL7907434 A NL 7907434A NL 7907434 A NL7907434 A NL 7907434A NL 7907434 A NL7907434 A NL 7907434A
Authority
NL
Netherlands
Prior art keywords
insulating layer
insulating
layer
conductor pattern
parts
Prior art date
Application number
NL7907434A
Other languages
English (en)
Dutch (nl)
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=19833974&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=NL7907434(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Philips Nv filed Critical Philips Nv
Priority to NL7907434A priority Critical patent/NL7907434A/nl
Priority to US06/191,101 priority patent/US4332078A/en
Priority to EP80200926A priority patent/EP0026953B1/en
Priority to CA000361925A priority patent/CA1150855A/en
Priority to DE8080200926T priority patent/DE3067007D1/de
Priority to JP13944280A priority patent/JPS5658246A/ja
Priority to AU63012/80A priority patent/AU532313B2/en
Publication of NL7907434A publication Critical patent/NL7907434A/nl

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D44/00—Charge transfer devices
    • H10D44/01—Manufacture or treatment
    • H10D44/041—Manufacture or treatment having insulated gates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
    • H01L21/321—After treatment
    • H10P76/40—
    • H10P95/00—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/981—Utilizing varying dielectric thickness

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Weting (AREA)
  • Formation Of Insulating Films (AREA)
NL7907434A 1979-10-08 1979-10-08 Werkwijze voor het vervaardigen van een halfgeleider- inrichting. NL7907434A (nl)

Priority Applications (7)

Application Number Priority Date Filing Date Title
NL7907434A NL7907434A (nl) 1979-10-08 1979-10-08 Werkwijze voor het vervaardigen van een halfgeleider- inrichting.
US06/191,101 US4332078A (en) 1979-10-08 1980-09-26 Method of manufacturing a semiconductor device
EP80200926A EP0026953B1 (en) 1979-10-08 1980-10-01 Method of manufacturing a semiconductor device
CA000361925A CA1150855A (en) 1979-10-08 1980-10-01 Method of manufacturing a semiconductor device
DE8080200926T DE3067007D1 (en) 1979-10-08 1980-10-01 Method of manufacturing a semiconductor device
JP13944280A JPS5658246A (en) 1979-10-08 1980-10-07 Method of manufacturing semiconductor device
AU63012/80A AU532313B2 (en) 1979-10-08 1980-10-07 Insulation in semiconductor device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL7907434A NL7907434A (nl) 1979-10-08 1979-10-08 Werkwijze voor het vervaardigen van een halfgeleider- inrichting.
NL7907434 1979-10-08

Publications (1)

Publication Number Publication Date
NL7907434A true NL7907434A (nl) 1981-04-10

Family

ID=19833974

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7907434A NL7907434A (nl) 1979-10-08 1979-10-08 Werkwijze voor het vervaardigen van een halfgeleider- inrichting.

Country Status (7)

Country Link
US (1) US4332078A (enExample)
EP (1) EP0026953B1 (enExample)
JP (1) JPS5658246A (enExample)
AU (1) AU532313B2 (enExample)
CA (1) CA1150855A (enExample)
DE (1) DE3067007D1 (enExample)
NL (1) NL7907434A (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5687346A (en) * 1979-12-18 1981-07-15 Nec Corp Manufacture of semiconductor device
FR2533371B1 (fr) * 1982-09-21 1985-12-13 Thomson Csf Structure de grille pour circuit integre comportant des elements du type grille-isolant-semi-conducteur et procede de realisation d'un circuit integre utilisant une telle structure
NL8502478A (nl) * 1985-09-11 1987-04-01 Philips Nv Werkwijze ter vervaardiging van een halfgeleiderinrichting.
US4888298A (en) * 1988-12-23 1989-12-19 Eastman Kodak Company Process to eliminate the re-entrant profile in a double polysilicon gate structure
KR930006128B1 (ko) * 1991-01-31 1993-07-07 삼성전자 주식회사 반도체장치의 금속 배선 형성방법
TW218426B (enExample) * 1992-05-11 1994-01-01 Samsung Electronics Co Ltd
TW219407B (enExample) * 1992-06-24 1994-01-21 American Telephone & Telegraph
US5936286A (en) * 1996-06-20 1999-08-10 United Microelectronics Corp. Differential poly-edge oxidation for stable SRAM cells
JPH10163311A (ja) * 1996-11-27 1998-06-19 Mitsubishi Electric Corp 半導体装置およびその製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7404659A (nl) * 1974-04-05 1975-10-07 Philips Nv Werkwijze voor het vervaardigen van een halfge- leiderinrichting, en inrichting vervaardigd door toepassing van de werkwijze.
US3909925A (en) * 1974-05-06 1975-10-07 Telex Computer Products N-Channel charge coupled device fabrication process
US4077112A (en) * 1974-09-24 1978-03-07 U.S. Philips Corporation Method of manufacturing charge transfer device
JPS5928992B2 (ja) * 1975-02-14 1984-07-17 日本電信電話株式会社 Ｍｏｓトランジスタおよびその製造方法
US3961999A (en) * 1975-06-30 1976-06-08 Ibm Corporation Method for forming recessed dielectric isolation with a minimized "bird's beak" problem
US4027382A (en) * 1975-07-23 1977-06-07 Texas Instruments Incorporated Silicon gate CCD structure
NL7703942A (nl) * 1977-04-12 1978-10-16 Philips Nv Werkwijze ter vervaardiging van een halfgelei- derinrichting en inrichting, vervaardigd door toepassing van de werkwijze.
JPS5841659B2 (ja) * 1977-08-30 1983-09-13 株式会社東芝 絶縁膜の形成方法
US4288256A (en) * 1977-12-23 1981-09-08 International Business Machines Corporation Method of making FET containing stacked gates

Also Published As

Publication number Publication date
AU532313B2 (en) 1983-09-22
EP0026953A1 (en) 1981-04-15
DE3067007D1 (en) 1984-04-19
US4332078A (en) 1982-06-01
AU6301280A (en) 1981-04-16
CA1150855A (en) 1983-07-26
JPH0214784B2 (enExample) 1990-04-10
EP0026953B1 (en) 1984-03-14
JPS5658246A (en) 1981-05-21

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A1B A search report has been drawn up
BV The patent application has lapsed