NL7810963A - Werkwijze voor het zagen van plaatjes. - Google Patents

Werkwijze voor het zagen van plaatjes.

Info

Publication number
NL7810963A
NL7810963A NL7810963A NL7810963A NL7810963A NL 7810963 A NL7810963 A NL 7810963A NL 7810963 A NL7810963 A NL 7810963A NL 7810963 A NL7810963 A NL 7810963A NL 7810963 A NL7810963 A NL 7810963A
Authority
NL
Netherlands
Prior art keywords
cutting plates
cutting
plates
Prior art date
Application number
NL7810963A
Other languages
English (en)
Original Assignee
Gen Electric
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gen Electric filed Critical Gen Electric
Publication of NL7810963A publication Critical patent/NL7810963A/nl

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28D—WORKING STONE OR STONE-LIKE MATERIALS
    • B28D1/00—Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor
    • B28D1/003—Multipurpose machines; Equipment therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28D—WORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28D—WORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/02—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
    • B28D5/022—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • H01L21/3043—Making grooves, e.g. cutting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10—Methods of surface bonding and/or assembly therefor
    • Y10T156/1052—Methods of surface bonding and/or assembly therefor with cutting, punching, tearing or severing
    • Y10T156/1082—Partial cutting bonded sandwich [e.g., grooving or incising]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49789—Obtaining plural product pieces from unitary workpiece
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/4981—Utilizing transitory attached element or associated separate material
    • Y10T29/49812—Temporary protective coating, impregnation, or cast layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T83/00—Cutting
    • Y10T83/04—Processes
    • Y10T83/0405—With preparatory or simultaneous ancillary treatment of work

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mining & Mineral Resources (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Dicing (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)
NL7810963A 1977-11-03 1978-11-03 Werkwijze voor het zagen van plaatjes. NL7810963A (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/848,129 US4138304A (en) 1977-11-03 1977-11-03 Wafer sawing technique

Publications (1)

Publication Number Publication Date
NL7810963A true NL7810963A (nl) 1979-05-07

Family

ID=25302424

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7810963A NL7810963A (nl) 1977-11-03 1978-11-03 Werkwijze voor het zagen van plaatjes.

Country Status (7)

Country Link
US (1) US4138304A (nl)
JP (1) JPS5481066A (nl)
DE (1) DE2846398A1 (nl)
FR (1) FR2408218A1 (nl)
GB (1) GB2007429B (nl)
IT (1) IT1099883B (nl)
NL (1) NL7810963A (nl)

Families Citing this family (45)

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DE2929541A1 (de) * 1979-07-20 1981-02-05 Siemens Ag Ultraschallwandleranordnung
US4285433A (en) * 1979-12-19 1981-08-25 Western Electric Co., Inc. Method and apparatus for removing dice from a severed wafer
US4961804A (en) * 1983-08-03 1990-10-09 Investment Holding Corporation Carrier film with conductive adhesive for dicing of semiconductor wafers and dicing method employing same
WO1985005734A1 (en) * 1984-05-29 1985-12-19 Mitsui Toatsu Chemicals, Incorporated Film for machining wafers
GB2168840A (en) * 1984-08-22 1986-06-25 Plessey Co Plc Customerisation of integrated logic devices
GB2172141B (en) * 1985-03-08 1988-11-16 Stc Plc Single heterostructure laser chip manufacture
US4704369A (en) * 1985-04-01 1987-11-03 Energy Conversion Devices, Inc. Method of severing a semiconductor device
US4667650A (en) * 1985-11-21 1987-05-26 Pq Corporation Mounting beam for preparing wafers
JPH0740609B2 (ja) * 1985-12-20 1995-05-01 セイコー電子工業株式会社 半導体装置の製造方法
US5095664A (en) * 1990-01-30 1992-03-17 Massachusetts Institute Of Technology Optical surface polishing method
EP0477600A1 (de) * 1990-09-26 1992-04-01 Siemens Aktiengesellschaft Verfahren zum Befestigen eines mit wenigstens einem Halbleiterbauelement versehenen Halbleiterkörpers auf einem Substrat
US5494549A (en) * 1992-01-08 1996-02-27 Rohm Co., Ltd. Dicing method
US5273615A (en) * 1992-04-06 1993-12-28 Motorola, Inc. Apparatus and method for handling fragile semiconductor wafers
US5362681A (en) * 1992-07-22 1994-11-08 Anaglog Devices, Inc. Method for separating circuit dies from a wafer
US5476566A (en) * 1992-09-02 1995-12-19 Motorola, Inc. Method for thinning a semiconductor wafer
US5445559A (en) * 1993-06-24 1995-08-29 Texas Instruments Incorporated Wafer-like processing after sawing DMDs
JP3521099B2 (ja) * 1994-11-29 2004-04-19 リンテック株式会社 ダイシング用リングフレームへの接着剤の付着防止用粘着シートおよび該粘着シートを備えたウェハ加工用シート
DE19607695A1 (de) * 1996-02-29 1997-09-04 Wacker Siltronic Halbleitermat Verfahren zur Herstellung von Halbleiterscheiben
US5915370A (en) * 1996-03-13 1999-06-29 Micron Technology, Inc. Saw for segmenting a semiconductor wafer
DE19618895A1 (de) * 1996-05-10 1997-11-13 Itt Ind Gmbh Deutsche Verfahren zum Bearbeiten von Seitenflächen elektronischer Elemente
US6962829B2 (en) * 1996-10-31 2005-11-08 Amkor Technology, Inc. Method of making near chip size integrated circuit package
US6250192B1 (en) 1996-11-12 2001-06-26 Micron Technology, Inc. Method for sawing wafers employing multiple indexing techniques for multiple die dimensions
US6493934B2 (en) 1996-11-12 2002-12-17 Salman Akram Method for sawing wafers employing multiple indexing techniques for multiple die dimensions
US6006739A (en) * 1996-11-12 1999-12-28 Micron Technology, Inc. Method for sawing wafers employing multiple indexing techniques for multiple die dimensions
US5803797A (en) * 1996-11-26 1998-09-08 Micron Technology, Inc. Method and apparatus to hold intergrated circuit chips onto a chuck and to simultaneously remove multiple intergrated circuit chips from a cutting chuck
US5809987A (en) * 1996-11-26 1998-09-22 Micron Technology,Inc. Apparatus for reducing damage to wafer cutting blades during wafer dicing
EP0967634A4 (en) * 1997-11-18 2006-04-26 Mitsui Chemicals Inc METHOD FOR PRODUCING A SEMICONDUCTOR DISC
DE19850873A1 (de) 1998-11-05 2000-05-11 Philips Corp Intellectual Pty Verfahren zum Bearbeiten eines Erzeugnisses der Halbleitertechnik
US6283693B1 (en) * 1999-11-12 2001-09-04 General Semiconductor, Inc. Method and apparatus for semiconductor chip handling
US6209532B1 (en) * 2000-02-09 2001-04-03 Texas Instruments Incorporated Soft handling process tooling for low and medium volume known good die product
DE10054038B4 (de) * 2000-10-31 2006-11-30 Infineon Technologies Ag Verfahren zum Trennen eines plattenförmigen Körpers, insbesondere eines Halbleiterwafers, in Einzelstücke
US20020185121A1 (en) * 2001-06-06 2002-12-12 Farnworth Warren M. Group encapsulated dicing chuck
JP2003273136A (ja) * 2002-03-12 2003-09-26 Seiko Epson Corp ピックアップ装置、ピックアップ方法及び半導体装置の製造方法
JP2004221187A (ja) 2003-01-10 2004-08-05 Toshiba Corp 半導体装置の製造装置及びその製造方法
SG116533A1 (en) * 2003-03-26 2005-11-28 Toshiba Kk Semiconductor manufacturing apparatus and method of manufacturing semiconductor device.
DE10337920B4 (de) * 2003-08-18 2008-08-28 Schott Ag Verfahren zur Herstellung einer Mehrzahl von Bauteilen und Zwischenprodukt in Form eines Schichtverbundes
US20060043534A1 (en) * 2004-08-26 2006-03-02 Kirby Kyle K Microfeature dies with porous regions, and associated methods and systems
DE102005046031B3 (de) * 2005-09-26 2007-07-12 Schott Ag Verfahren zur Separierung von Teilen aus einem Substrat
US20070117259A1 (en) * 2005-11-18 2007-05-24 Semiconductor Components Industries, Llc. Semiconductor component and method of manufacture
US20080051017A1 (en) * 2006-08-22 2008-02-28 Essilor International (Compagnie Generale D'optique) Process for holding an optical lens on a holder of a lens machining equipment
US8168474B1 (en) 2011-01-10 2012-05-01 International Business Machines Corporation Self-dicing chips using through silicon vias
US9187947B2 (en) * 2011-12-05 2015-11-17 Rayotek Scientific, Inc. Method of forming a vacuum insulated glass panel spacer
US9410358B2 (en) 2011-12-05 2016-08-09 Rayotek Scientific, Inc. Vacuum insulated glass panel with spacers coated with micro particles and method of forming same
JP2014200888A (ja) * 2013-04-05 2014-10-27 ローム株式会社 吸引保持装置およびウエハ研磨装置
US9917000B2 (en) * 2015-10-01 2018-03-13 Infineon Technologies Ag Wafer carrier, method for manufacturing the same and method for carrying a wafer

Family Cites Families (12)

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Publication number Priority date Publication date Assignee Title
FR1240358A (fr) * 1959-04-10 1960-09-02 Intermetall Procédé de découpage de matériaux semi-conducteurs et éléments conformes à ceux obtenus
US3152939A (en) * 1960-08-12 1964-10-13 Westinghouse Electric Corp Process for preparing semiconductor members
US3241265A (en) * 1963-06-27 1966-03-22 Ibm Bombardment cutter
GB1098398A (en) * 1964-02-05 1968-01-10 Licentia Gmbh Improvements relating to the manufacture of semi-conductor devices
US3247589A (en) * 1964-02-28 1966-04-26 Int Resistance Co Method of cutting glass
DE1427772A1 (de) * 1965-11-23 1968-12-12 Telefunken Patent Verfahren zum Zerlegen einer Halbleiterscheibe in einzelne Halbleiterplaettchen
GB1182820A (en) * 1967-06-27 1970-03-04 Westinghouse Brake & Signal Manufacture of Semiconductor Elements.
US3727282A (en) * 1970-02-05 1973-04-17 Burroughs Corp Semiconductor handling apparatus
FR2081250A1 (en) * 1970-03-23 1971-12-03 Silec Semi Conducteurs Abrasive jet cutting of semiconductor slices - using resin mask
IT981199B (it) * 1972-04-26 1974-10-10 Ibm Apparecchiatura e procedimento per la separazione di chip semi conduttori
JPS4979684A (nl) * 1972-12-07 1974-08-01
US3918150A (en) * 1974-02-08 1975-11-11 Gen Electric System for separating a semiconductor wafer into discrete pellets

Also Published As

Publication number Publication date
JPS5481066A (en) 1979-06-28
IT1099883B (it) 1985-09-28
FR2408218A1 (fr) 1979-06-01
IT7829268A0 (it) 1978-10-31
US4138304A (en) 1979-02-06
GB2007429B (en) 1982-03-17
GB2007429A (en) 1979-05-16
DE2846398A1 (de) 1979-05-10

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Legal Events

Date Code Title Description
BA A request for search or an international-type search has been filed
BB A search report has been drawn up
BV The patent application has lapsed