NL7810885A - Voor electronen gevoelige beschermingsmaterialen of beschermingslagen. - Google Patents

Voor electronen gevoelige beschermingsmaterialen of beschermingslagen.

Info

Publication number
NL7810885A
NL7810885A NL7810885A NL7810885A NL7810885A NL 7810885 A NL7810885 A NL 7810885A NL 7810885 A NL7810885 A NL 7810885A NL 7810885 A NL7810885 A NL 7810885A NL 7810885 A NL7810885 A NL 7810885A
Authority
NL
Netherlands
Prior art keywords
electronics
protective materials
coatings sensitive
coatings
sensitive
Prior art date
Application number
NL7810885A
Other languages
English (en)
Dutch (nl)
Original Assignee
Ceskoslovenska Akademie Ved
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ceskoslovenska Akademie Ved filed Critical Ceskoslovenska Akademie Ved
Publication of NL7810885A publication Critical patent/NL7810885A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
NL7810885A 1977-11-07 1978-11-01 Voor electronen gevoelige beschermingsmaterialen of beschermingslagen. NL7810885A (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CS777258A CS193322B1 (en) 1977-11-07 1977-11-07 Electron resisit

Publications (1)

Publication Number Publication Date
NL7810885A true NL7810885A (nl) 1979-05-09

Family

ID=5421395

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7810885A NL7810885A (nl) 1977-11-07 1978-11-01 Voor electronen gevoelige beschermingsmaterialen of beschermingslagen.

Country Status (8)

Country Link
US (1) US4269962A (xx)
JP (1) JPS5476135A (xx)
BE (1) BE871801A (xx)
CS (1) CS193322B1 (xx)
DE (1) DE2848254A1 (xx)
FR (1) FR2422984A1 (xx)
GB (1) GB2009759A (xx)
NL (1) NL7810885A (xx)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5614232A (en) * 1979-07-16 1981-02-12 Mitsubishi Rayon Co Ltd Negative type resist resin
CA2377081A1 (en) 2002-03-15 2003-09-15 Quantiscript Inc. Method of producing an etch-resistant polymer structure using electron beam lithography

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3480441A (en) * 1966-08-09 1969-11-25 Ibm Photosensitive compositions
US3885060A (en) * 1968-08-23 1975-05-20 Hitachi Ltd Production of insolubilized organic polymers
US3840449A (en) * 1968-12-13 1974-10-08 Bridgestone Tire Co Ltd Novel method of producing two-component and multi-component copolymers containing conjugated diene compounds and conjugated polar vinyl monomers using photo polymerization
US3615469A (en) * 1969-06-02 1971-10-26 Goodrich Co B F Polymeric printing plates
BE794343A (fr) * 1972-01-21 1973-07-19 Westinghouse Electric Corp Methode de protection d'une partie d'un substrat soumis a l'action d'1n faisceau electronique
US3787212A (en) * 1972-08-04 1974-01-22 Monsanto Co Polymeric photosensitive compositions and methods using same
GB1448838A (en) * 1972-11-14 1976-09-08 Kansai Paint Co Ltd Lithography
US3865597A (en) * 1973-03-26 1975-02-11 Western Electric Co Additives to negative photoresists which increase the sensitivity thereof
US4061799A (en) * 1973-11-05 1977-12-06 Texas Instruments Incorporated Method of patterning styrene diene block copolymer electron beam resists
US3931435A (en) * 1974-12-20 1976-01-06 International Business Machines Corporation Electron beam positive resists containing acetate polymers
JPS51116893A (en) * 1975-04-08 1976-10-14 Ube Ind Ltd Photo-setting compositions
US4130424A (en) * 1976-08-06 1978-12-19 Bell Telephone Laboratories, Incorporated Process using radiation curable epoxy containing resist and resultant product

Also Published As

Publication number Publication date
DE2848254A1 (de) 1979-05-10
US4269962A (en) 1981-05-26
FR2422984A1 (fr) 1979-11-09
CS193322B1 (en) 1979-10-31
JPS5476135A (en) 1979-06-18
BE871801A (fr) 1979-03-01
GB2009759A (en) 1979-06-20

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Legal Events

Date Code Title Description
BA A request for search or an international-type search has been filed
BV The patent application has lapsed