IT1108954B - Sensore di campo - Google Patents

Sensore di campo

Info

Publication number
IT1108954B
IT1108954B IT24894/78A IT2489478A IT1108954B IT 1108954 B IT1108954 B IT 1108954B IT 24894/78 A IT24894/78 A IT 24894/78A IT 2489478 A IT2489478 A IT 2489478A IT 1108954 B IT1108954 B IT 1108954B
Authority
IT
Italy
Prior art keywords
field sensor
sensor
field
Prior art date
Application number
IT24894/78A
Other languages
English (en)
Other versions
IT7824894A0 (it
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Publication of IT7824894A0 publication Critical patent/IT7824894A0/it
Application granted granted Critical
Publication of IT1108954B publication Critical patent/IT1108954B/it

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00Arrangements or instruments for measuring magnetic variables
    • G01R33/02Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/06Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R29/00Arrangements for measuring or indicating electric quantities not covered by groups G01R19/00 - G01R27/00
    • G01R29/08Measuring electromagnetic field characteristics
    • G01R29/0864Measuring electromagnetic field characteristics characterised by constructional or functional features
    • G01R29/0878Sensors; antennas; probes; detectors
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/33Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/10Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/1025Channel region of field-effect devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/80Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/82Types of semiconductor device ; Multistep manufacturing processes therefor controllable by variation of the magnetic field applied to the device

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Ceramic Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Electromagnetism (AREA)
  • Hall/Mr Elements (AREA)
  • Measuring Magnetic Variables (AREA)
IT24894/78A 1977-07-01 1978-06-23 Sensore di campo IT1108954B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/812,298 US4129880A (en) 1977-07-01 1977-07-01 Channel depletion boundary modulation magnetic field sensor

Publications (2)

Publication Number Publication Date
IT7824894A0 IT7824894A0 (it) 1978-06-23
IT1108954B true IT1108954B (it) 1985-12-16

Family

ID=25209147

Family Applications (1)

Application Number Title Priority Date Filing Date
IT24894/78A IT1108954B (it) 1977-07-01 1978-06-23 Sensore di campo

Country Status (11)

Country Link
US (1) US4129880A (it)
EP (1) EP0000318B1 (it)
JP (1) JPS597232B2 (it)
AU (1) AU517615B2 (it)
CA (1) CA1100234A (it)
DE (1) DE2860402D1 (it)
ES (1) ES471288A1 (it)
IE (1) IE46921B1 (it)
IN (1) IN149637B (it)
IT (1) IT1108954B (it)
ZA (1) ZA783044B (it)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4163986A (en) * 1978-05-03 1979-08-07 International Business Machines Corporation Twin channel Lorentz coupled depletion width modulation effect magnetic field sensor
DE2852621C4 (de) * 1978-12-05 1995-11-30 Siemens Ag Isolierschicht-Feldeffekttransistor mit einer Drif tstrecke zwischen Gate-Elektrode und Drain-Zone
WO1981003083A1 (en) * 1980-04-18 1981-10-29 Rockwell International Corp Magnetotransistor detector
US4288708A (en) * 1980-05-01 1981-09-08 International Business Machines Corp. Differentially modulated avalanche area magnetically sensitive transistor
JPS5738375A (en) * 1980-08-12 1982-03-03 Toshiba Ceramics Co Continuous casting nozzle
FR2498815A1 (fr) * 1981-01-27 1982-07-30 Thomson Csf Dispositif semi-conducteur de deviation d'electrons du type " a transport balistique ", et procede de fabrication d'un tel dispositif
US4520413A (en) * 1982-04-13 1985-05-28 Minnesota Mining And Manufacturing Company Integrated magnetostrictive-piezoelectric-metal oxide semiconductor magnetic playback head
US4499515A (en) * 1982-07-14 1985-02-12 Minnesota Mining And Manufacturing Company Integrated magnetostrictive-piezoresistive magnetic recording playback head
US4516144A (en) * 1982-09-23 1985-05-07 Eaton Corporation Columnated and trimmed magnetically sensitive semiconductor
US4472727A (en) * 1983-08-12 1984-09-18 At&T Bell Laboratories Carrier freezeout field-effect device
EP0158941B2 (en) * 1984-04-06 1997-12-17 Fuji Photo Film Co., Ltd. Aluminium alloy material plate for printing
CH668146A5 (de) * 1985-05-22 1988-11-30 Landis & Gyr Ag Einrichtung mit einem hallelement in integrierter halbleitertechnologie.
CH668147A5 (de) * 1985-05-22 1988-11-30 Landis & Gyr Ag Einrichtung mit einem hallelement in integrierter halbleitertechnologie.
JPS61277825A (ja) * 1985-06-01 1986-12-08 Yanmar Diesel Engine Co Ltd 横形内燃機関
US5667289A (en) * 1989-05-18 1997-09-16 Seiko Epson Corporation Background lighting apparatus for liquid crystal display
US5192704A (en) * 1989-06-30 1993-03-09 Texas Instruments Incorporated Method and apparatus for a filament channel pass gate ferroelectric capacitor memory cell
US5136534A (en) * 1989-06-30 1992-08-04 Texas Instruments Incorporated Method and apparatus for a filament channel pass gate ferroelectric capacitor memory cell
US4939563A (en) * 1989-08-18 1990-07-03 Ibm Corporation Double carrier deflection high sensitivity magnetic sensor
US5208477A (en) * 1990-12-31 1993-05-04 The United States Of America As Represented By The Secretary Of The Navy Resistive gate magnetic field sensor
US5237529A (en) * 1991-02-01 1993-08-17 Richard Spitzer Microstructure array and activation system therefor
EP0607453B1 (en) * 1992-07-13 2002-05-08 Seiko Epson Corporation Surface illumination device and liquid crystal display
DK94995A (da) * 1995-08-24 1997-02-25 Microtronic As Magnetfeltsensor
JP3931686B2 (ja) * 2002-02-28 2007-06-20 株式会社デンソー 半導体磁気センサ
US7440227B2 (en) * 2005-02-28 2008-10-21 Hitachi Global Storage Technologies Netherlands B.V. Magnetic head having a hall effect sensor and circuit for detecting recorded bits from magnetic recording media
US10321969B2 (en) 2014-12-02 2019-06-18 Invuity, Inc. Methods and apparatus for coupling an optical input to an illumination device
FR3087959B1 (fr) * 2018-10-25 2020-11-20 Nexans Jonction de cable avec detecteur de charge d'espace integre

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1304899A (it) * 1969-05-19 1973-01-31
DE2338388C2 (de) * 1973-07-28 1982-04-15 Ibm Deutschland Gmbh, 7000 Stuttgart Feldeffekt-Halbleiteranordnung
US3994010A (en) * 1975-03-27 1976-11-23 Honeywell Inc. Hall effect elements
US3997909A (en) * 1975-05-14 1976-12-14 International Business Machines Corporation High carrier velocity magnetic sensor
US4048648A (en) * 1976-06-30 1977-09-13 International Business Machines Corporation High carrier velocity fet magnetic sensor

Also Published As

Publication number Publication date
DE2860402D1 (en) 1981-02-26
US4129880A (en) 1978-12-12
CA1100234A (en) 1981-04-28
EP0000318A1 (fr) 1979-01-10
JPS597232B2 (ja) 1984-02-17
IT7824894A0 (it) 1978-06-23
EP0000318B1 (fr) 1981-01-07
AU517615B2 (en) 1981-08-13
ZA783044B (en) 1980-01-30
JPS5440087A (en) 1979-03-28
ES471288A1 (es) 1979-01-16
IE781026L (en) 1979-01-01
IN149637B (it) 1982-02-27
IE46921B1 (en) 1983-11-02
AU3630278A (en) 1979-11-22

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