CS193322B1 - Electron resisit - Google Patents
Electron resisitInfo
- Publication number
- CS193322B1 CS193322B1 CS777258A CS725877A CS193322B1 CS 193322 B1 CS193322 B1 CS 193322B1 CS 777258 A CS777258 A CS 777258A CS 725877 A CS725877 A CS 725877A CS 193322 B1 CS193322 B1 CS 193322B1
- Authority
- CS
- Czechoslovakia
- Prior art keywords
- resisit
- electron
- electron resisit
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CS777258A CS193322B1 (en) | 1977-11-07 | 1977-11-07 | Electron resisit |
GB7842258A GB2009759A (en) | 1977-11-07 | 1978-10-27 | Electron resist |
US05/955,457 US4269962A (en) | 1977-11-07 | 1978-10-27 | Electron resist |
NL7810885A NL7810885A (nl) | 1977-11-07 | 1978-11-01 | Voor electronen gevoelige beschermingsmaterialen of beschermingslagen. |
BE191560A BE871801A (fr) | 1977-11-07 | 1978-11-06 | Reserve electronique |
FR7831321A FR2422984A1 (fr) | 1977-11-07 | 1978-11-06 | Reserve electronique pour lithographie electronique |
JP13592378A JPS5476135A (en) | 1977-11-07 | 1978-11-06 | Electron beam resist |
DE19782848254 DE2848254A1 (de) | 1977-11-07 | 1978-11-07 | Elektronenresist |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CS777258A CS193322B1 (en) | 1977-11-07 | 1977-11-07 | Electron resisit |
Publications (1)
Publication Number | Publication Date |
---|---|
CS193322B1 true CS193322B1 (en) | 1979-10-31 |
Family
ID=5421395
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CS777258A CS193322B1 (en) | 1977-11-07 | 1977-11-07 | Electron resisit |
Country Status (8)
Country | Link |
---|---|
US (1) | US4269962A (cs) |
JP (1) | JPS5476135A (cs) |
BE (1) | BE871801A (cs) |
CS (1) | CS193322B1 (cs) |
DE (1) | DE2848254A1 (cs) |
FR (1) | FR2422984A1 (cs) |
GB (1) | GB2009759A (cs) |
NL (1) | NL7810885A (cs) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5614232A (en) * | 1979-07-16 | 1981-02-12 | Mitsubishi Rayon Co Ltd | Negative type resist resin |
CA2377081A1 (en) | 2002-03-15 | 2003-09-15 | Quantiscript Inc. | Method of producing an etch-resistant polymer structure using electron beam lithography |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3480441A (en) * | 1966-08-09 | 1969-11-25 | Ibm | Photosensitive compositions |
US3885060A (en) * | 1968-08-23 | 1975-05-20 | Hitachi Ltd | Production of insolubilized organic polymers |
US3840449A (en) * | 1968-12-13 | 1974-10-08 | Bridgestone Tire Co Ltd | Novel method of producing two-component and multi-component copolymers containing conjugated diene compounds and conjugated polar vinyl monomers using photo polymerization |
US3615469A (en) * | 1969-06-02 | 1971-10-26 | Goodrich Co B F | Polymeric printing plates |
BE794343A (fr) * | 1972-01-21 | 1973-07-19 | Westinghouse Electric Corp | Methode de protection d'une partie d'un substrat soumis a l'action d'1n faisceau electronique |
US3787212A (en) * | 1972-08-04 | 1974-01-22 | Monsanto Co | Polymeric photosensitive compositions and methods using same |
GB1448838A (en) * | 1972-11-14 | 1976-09-08 | Kansai Paint Co Ltd | Lithography |
US3865597A (en) * | 1973-03-26 | 1975-02-11 | Western Electric Co | Additives to negative photoresists which increase the sensitivity thereof |
US4061799A (en) * | 1973-11-05 | 1977-12-06 | Texas Instruments Incorporated | Method of patterning styrene diene block copolymer electron beam resists |
US3931435A (en) * | 1974-12-20 | 1976-01-06 | International Business Machines Corporation | Electron beam positive resists containing acetate polymers |
JPS51116893A (en) * | 1975-04-08 | 1976-10-14 | Ube Ind Ltd | Photo-setting compositions |
US4130424A (en) * | 1976-08-06 | 1978-12-19 | Bell Telephone Laboratories, Incorporated | Process using radiation curable epoxy containing resist and resultant product |
-
1977
- 1977-11-07 CS CS777258A patent/CS193322B1/cs unknown
-
1978
- 1978-10-27 US US05/955,457 patent/US4269962A/en not_active Expired - Lifetime
- 1978-10-27 GB GB7842258A patent/GB2009759A/en not_active Withdrawn
- 1978-11-01 NL NL7810885A patent/NL7810885A/xx not_active Application Discontinuation
- 1978-11-06 JP JP13592378A patent/JPS5476135A/ja active Pending
- 1978-11-06 BE BE191560A patent/BE871801A/xx unknown
- 1978-11-06 FR FR7831321A patent/FR2422984A1/fr active Pending
- 1978-11-07 DE DE19782848254 patent/DE2848254A1/de not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
GB2009759A (en) | 1979-06-20 |
BE871801A (fr) | 1979-03-01 |
JPS5476135A (en) | 1979-06-18 |
FR2422984A1 (fr) | 1979-11-09 |
NL7810885A (nl) | 1979-05-09 |
US4269962A (en) | 1981-05-26 |
DE2848254A1 (de) | 1979-05-10 |
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