BE871801A - Reserve electronique - Google Patents

Reserve electronique

Info

Publication number
BE871801A
BE871801A BE191560A BE191560A BE871801A BE 871801 A BE871801 A BE 871801A BE 191560 A BE191560 A BE 191560A BE 191560 A BE191560 A BE 191560A BE 871801 A BE871801 A BE 871801A
Authority
BE
Belgium
Prior art keywords
electronic reserve
reserve
electronic
Prior art date
Application number
BE191560A
Other languages
English (en)
Original Assignee
Ceskoslovenska Akademie Ved
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ceskoslovenska Akademie Ved filed Critical Ceskoslovenska Akademie Ved
Publication of BE871801A publication Critical patent/BE871801A/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
BE191560A 1977-11-07 1978-11-06 Reserve electronique BE871801A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CS777258A CS193322B1 (en) 1977-11-07 1977-11-07 Electron resisit

Publications (1)

Publication Number Publication Date
BE871801A true BE871801A (fr) 1979-03-01

Family

ID=5421395

Family Applications (1)

Application Number Title Priority Date Filing Date
BE191560A BE871801A (fr) 1977-11-07 1978-11-06 Reserve electronique

Country Status (8)

Country Link
US (1) US4269962A (fr)
JP (1) JPS5476135A (fr)
BE (1) BE871801A (fr)
CS (1) CS193322B1 (fr)
DE (1) DE2848254A1 (fr)
FR (1) FR2422984A1 (fr)
GB (1) GB2009759A (fr)
NL (1) NL7810885A (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5614232A (en) * 1979-07-16 1981-02-12 Mitsubishi Rayon Co Ltd Negative type resist resin
CA2377081A1 (fr) 2002-03-15 2003-09-15 Quantiscript Inc. Methode de production d'une structure de polymere resistant a la gravure au moyen de la lithographie par faisceau electronique

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3480441A (en) * 1966-08-09 1969-11-25 Ibm Photosensitive compositions
US3885060A (en) * 1968-08-23 1975-05-20 Hitachi Ltd Production of insolubilized organic polymers
US3840449A (en) * 1968-12-13 1974-10-08 Bridgestone Tire Co Ltd Novel method of producing two-component and multi-component copolymers containing conjugated diene compounds and conjugated polar vinyl monomers using photo polymerization
US3615469A (en) * 1969-06-02 1971-10-26 Goodrich Co B F Polymeric printing plates
BE794343A (fr) * 1972-01-21 1973-07-19 Westinghouse Electric Corp Methode de protection d'une partie d'un substrat soumis a l'action d'1n faisceau electronique
US3787212A (en) * 1972-08-04 1974-01-22 Monsanto Co Polymeric photosensitive compositions and methods using same
GB1448838A (en) * 1972-11-14 1976-09-08 Kansai Paint Co Ltd Lithography
US3865597A (en) * 1973-03-26 1975-02-11 Western Electric Co Additives to negative photoresists which increase the sensitivity thereof
US4061799A (en) * 1973-11-05 1977-12-06 Texas Instruments Incorporated Method of patterning styrene diene block copolymer electron beam resists
US3931435A (en) * 1974-12-20 1976-01-06 International Business Machines Corporation Electron beam positive resists containing acetate polymers
JPS51116893A (en) * 1975-04-08 1976-10-14 Ube Ind Ltd Photo-setting compositions
US4130424A (en) * 1976-08-06 1978-12-19 Bell Telephone Laboratories, Incorporated Process using radiation curable epoxy containing resist and resultant product

Also Published As

Publication number Publication date
DE2848254A1 (de) 1979-05-10
US4269962A (en) 1981-05-26
FR2422984A1 (fr) 1979-11-09
CS193322B1 (en) 1979-10-31
JPS5476135A (en) 1979-06-18
NL7810885A (nl) 1979-05-09
GB2009759A (en) 1979-06-20

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