NL78025C - - Google Patents

Info

Publication number
NL78025C
NL78025C NL78025DA NL78025C NL 78025 C NL78025 C NL 78025C NL 78025D A NL78025D A NL 78025DA NL 78025 C NL78025 C NL 78025C
Authority
NL
Netherlands
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of NL78025C publication Critical patent/NL78025C/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B43/00—Preparation of azo dyes from other azo compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B39/00—Other azo dyes prepared by diazotising and coupling
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
NL78025D 1951-02-02 NL78025C ( )

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE302940X 1951-02-02

Publications (1)

Publication Number Publication Date
NL78025C true NL78025C ( )

Family

ID=6108771

Family Applications (2)

Application Number Title Priority Date Filing Date
NL78025D NL78025C ( ) 1951-02-02
NL7811348.A NL166823B (nl) 1951-02-02 Electrisch koppelingsorgaan voor koppeling onder water.

Family Applications After (1)

Application Number Title Priority Date Filing Date
NL7811348.A NL166823B (nl) 1951-02-02 Electrisch koppelingsorgaan voor koppeling onder water.

Country Status (6)

Country Link
US (1) US3046115A ( )
BE (1) BE508664A ( )
CH (1) CH302940A ( )
FR (1) FR1056917A ( )
GB (1) GB706879A ( )
NL (2) NL166823B ( )

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL78025C ( ) * 1951-02-02
NL198071A ( ) * 1954-08-26
NL125781C ( ) * 1959-02-04
DE1114705C2 (de) * 1959-04-16 1962-04-12 Kalle Ag Lichtempfindliche Schichten fuer die photomechanische Herstellung von Druckformen
JPS492284B1 ( ) * 1969-05-30 1974-01-19
GB1347759A (en) * 1971-06-17 1974-02-27 Howson Algraphy Ltd Light sensitive materials
DE2331377C2 (de) * 1973-06-20 1982-10-14 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Kopiermaterial
DE2547905C2 (de) * 1975-10-25 1985-11-21 Hoechst Ag, 6230 Frankfurt Lichtempfindliches Aufzeichnungsmaterial
JPS52109926A (en) * 1976-02-25 1977-09-14 Fuji Photo Film Co Ltd Metallic image forming material
DE2641099A1 (de) * 1976-09-13 1978-03-16 Hoechst Ag Lichtempfindliche kopierschicht
DE2641100A1 (de) * 1976-09-13 1978-03-16 Hoechst Ag Lichtempfindliche kopierschicht
GB1604652A (en) * 1977-04-12 1981-12-16 Vickers Ltd Radiation sensitive materials
US5217840A (en) * 1985-08-12 1993-06-08 Hoechst Celanese Corporation Image reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefrom
US5035976A (en) * 1986-05-02 1991-07-30 Hoechst Celanese Corporation Photosensitive article having phenolic photosensitizers containing quinone diazide and acid halide substituents
US5162510A (en) * 1986-05-02 1992-11-10 Hoechst Celanese Corporation Process for the preparation of photosensitive compositions containing a mixed ester o-quinone photosensitizer
US4902785A (en) * 1986-05-02 1990-02-20 Hoechst Celanese Corporation Phenolic photosensitizers containing quinone diazide and acidic halide substituents
US4732837A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
US4732836A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
US4818658A (en) * 1987-04-17 1989-04-04 Shipley Company Inc. Photoactive esterification product of a diazooxide compound and a curcumin dye and photoresist materials with product
US4970287A (en) * 1987-11-23 1990-11-13 Olin Hunt Specialty Products Inc. Thermally stable phenolic resin compositions with ortho, ortho methylene linkage
US4837121A (en) * 1987-11-23 1989-06-06 Olin Hunt Specialty Products Inc. Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin
US5024921A (en) * 1987-11-23 1991-06-18 Ocg Microelectronic Materials, Inc. Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin used in a method of forming a positive photoresist image
DE69029104T2 (de) 1989-07-12 1997-03-20 Fuji Photo Film Co Ltd Polysiloxane und positiv arbeitende Resistmasse
JP2639853B2 (ja) * 1990-05-18 1997-08-13 富士写真フイルム株式会社 新規キノンジアジド化合物及びそれを含有する感光性組成物
JPH0876380A (ja) 1994-09-06 1996-03-22 Fuji Photo Film Co Ltd ポジ型印刷版組成物
IL122318A (en) 1996-04-23 2001-01-28 Horsell Graphic Ind Ltd Lithographic printing forms
US6117610A (en) * 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
GB9622657D0 (en) 1996-10-31 1997-01-08 Horsell Graphic Ind Ltd Direct positive lithographic plate
US6090532A (en) * 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
US6063544A (en) * 1997-03-21 2000-05-16 Kodak Polychrome Graphics Llc Positive-working printing plate and method of providing a positive image therefrom using laser imaging
ATE204388T1 (de) 1997-07-05 2001-09-15 Kodak Polychrome Graphics Llc Bilderzeugungsverfahren
US6060217A (en) * 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
US6045963A (en) * 1998-03-17 2000-04-04 Kodak Polychrome Graphics Llc Negative-working dry planographic printing plate
US6296982B1 (en) 1999-11-19 2001-10-02 Kodak Polychrome Graphics Llc Imaging articles
CN104447393B (zh) * 2014-11-28 2016-06-15 济宁阳光化学有限公司 一种生产色酚as及废弃物回收利用的方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE506016A ( ) *
DE872154C (de) * 1950-12-23 1953-03-30 Kalle & Co Ag Photomechanisches Verfahren zur Herstellung von Bildern und Druckformen mit Hilfe von Diazoverbindungen
NL78025C ( ) * 1951-02-02

Also Published As

Publication number Publication date
US3046115A (en) 1962-07-24
FR1056917A (fr) 1954-03-03
NL166823B (nl)
GB706879A (en) 1954-04-07
CH302940A (de) 1954-11-15
BE508664A ( )

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