BE508664A - - Google Patents

Info

Publication number
BE508664A
BE508664A BE508664DA BE508664A BE 508664 A BE508664 A BE 508664A BE 508664D A BE508664D A BE 508664DA BE 508664 A BE508664 A BE 508664A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of BE508664A publication Critical patent/BE508664A/xx
Priority to DE302940X priority Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B43/00Preparation of azo dyes from other azo compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B39/00Other azo dyes prepared by diazotising and coupling
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
BE508664D 1951-02-02 BE508664A (xx)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE302940X 1951-02-02

Publications (1)

Publication Number Publication Date
BE508664A true BE508664A (xx)

Family

ID=6108771

Family Applications (1)

Application Number Title Priority Date Filing Date
BE508664D BE508664A (xx) 1951-02-02

Country Status (6)

Country Link
US (1) US3046115A (xx)
BE (1) BE508664A (xx)
CH (1) CH302940A (xx)
FR (1) FR1056917A (xx)
GB (1) GB706879A (xx)
NL (2) NL166823B (xx)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2890115A (en) * 1954-08-26 1959-06-09 Azoplate Corp Lithoplate from diazonium-diazosulfonates
US3046115A (en) * 1951-02-02 1962-07-24 Azoplate Corp Light sensitive material for printing and process for making printing plates

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL125781C (xx) * 1959-02-04
DE1114705C2 (xx) * 1959-04-16 1962-04-12
JPS492284B1 (xx) * 1969-05-30 1974-01-19
GB1347759A (en) * 1971-06-17 1974-02-27 Howson Algraphy Ltd Light sensitive materials
DE2331377C2 (xx) * 1973-06-20 1982-10-14 Hoechst Ag, 6000 Frankfurt, De
DE2547905C2 (xx) * 1975-10-25 1985-11-21 Hoechst Ag, 6230 Frankfurt, De
JPS52109926A (en) * 1976-02-25 1977-09-14 Fuji Photo Film Co Ltd Metallic image forming material
DE2641100C2 (xx) * 1976-09-13 1987-02-26 Hoechst Ag, 6230 Frankfurt, De
DE2641099C2 (xx) * 1976-09-13 1988-10-20 Hoechst Ag, 6230 Frankfurt, De
GB1604652A (en) * 1977-04-12 1981-12-16 Vickers Ltd Radiation sensitive materials
US5217840A (en) * 1985-08-12 1993-06-08 Hoechst Celanese Corporation Image reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefrom
US5035976A (en) * 1986-05-02 1991-07-30 Hoechst Celanese Corporation Photosensitive article having phenolic photosensitizers containing quinone diazide and acid halide substituents
US4732837A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
US5162510A (en) * 1986-05-02 1992-11-10 Hoechst Celanese Corporation Process for the preparation of photosensitive compositions containing a mixed ester o-quinone photosensitizer
US4732836A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
US4902785A (en) * 1986-05-02 1990-02-20 Hoechst Celanese Corporation Phenolic photosensitizers containing quinone diazide and acidic halide substituents
US4818658A (en) * 1987-04-17 1989-04-04 Shipley Company Inc. Photoactive esterification product of a diazooxide compound and a curcumin dye and photoresist materials with product
US4970287A (en) * 1987-11-23 1990-11-13 Olin Hunt Specialty Products Inc. Thermally stable phenolic resin compositions with ortho, ortho methylene linkage
US5024921A (en) * 1987-11-23 1991-06-18 Ocg Microelectronic Materials, Inc. Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin used in a method of forming a positive photoresist image
US4837121A (en) * 1987-11-23 1989-06-06 Olin Hunt Specialty Products Inc. Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin
DE69029104D1 (de) 1989-07-12 1996-12-19 Fuji Photo Film Co Ltd Polysiloxane und positiv arbeitende Resistmasse
JP2639853B2 (ja) * 1990-05-18 1997-08-13 富士写真フイルム株式会社 新規キノンジアジド化合物及びそれを含有する感光性組成物
JPH0876380A (ja) 1994-09-06 1996-03-22 Fuji Photo Film Co Ltd ポジ型印刷版組成物
CN1078132C (zh) 1996-04-23 2002-01-23 霍西尔绘图工业有限公司 热敏组合物及用其制造平版印刷版型的方法
GB9622657D0 (en) 1996-10-31 1997-01-08 Horsell Graphic Ind Ltd Direct positive lithographic plate
US6090532A (en) * 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
US6063544A (en) * 1997-03-21 2000-05-16 Kodak Polychrome Graphics Llc Positive-working printing plate and method of providing a positive image therefrom using laser imaging
AT204388T (de) 1997-07-05 2001-09-15 Kodak Polychrome Graphics Llc Bilderzeugungsverfahren
US6117610A (en) * 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
US6060217A (en) * 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
US6045963A (en) * 1998-03-17 2000-04-04 Kodak Polychrome Graphics Llc Negative-working dry planographic printing plate
US6296982B1 (en) 1999-11-19 2001-10-02 Kodak Polychrome Graphics Llc Imaging articles
CN104447393B (zh) * 2014-11-28 2016-06-15 济宁阳光化学有限公司 一种生产色酚as及废弃物回收利用的方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE506016A (xx) *
DE872154C (de) * 1950-12-23 1953-03-30 Kalle & Co Ag Photomechanisches Verfahren zur Herstellung von Bildern und Druckformen mit Hilfe von Diazoverbindungen
BE508664A (xx) * 1951-02-02

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3046115A (en) * 1951-02-02 1962-07-24 Azoplate Corp Light sensitive material for printing and process for making printing plates
US2890115A (en) * 1954-08-26 1959-06-09 Azoplate Corp Lithoplate from diazonium-diazosulfonates

Also Published As

Publication number Publication date
FR1056917A (fr) 1954-03-03
NL78025C (xx)
US3046115A (en) 1962-07-24
NL166823B (nl)
GB706879A (en) 1954-04-07
CH302940A (de) 1954-11-15

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