NL7701700A - Initiatoren voor de fotopolymerisatie. - Google Patents

Initiatoren voor de fotopolymerisatie.

Info

Publication number
NL7701700A
NL7701700A NL7701700A NL7701700A NL7701700A NL 7701700 A NL7701700 A NL 7701700A NL 7701700 A NL7701700 A NL 7701700A NL 7701700 A NL7701700 A NL 7701700A NL 7701700 A NL7701700 A NL 7701700A
Authority
NL
Netherlands
Prior art keywords
photopolymerization
initiators
Prior art date
Application number
NL7701700A
Other languages
English (en)
Original Assignee
Ciba Geigy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy filed Critical Ciba Geigy
Publication of NL7701700A publication Critical patent/NL7701700A/nl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/04—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters
    • C08F299/0407—Processes of polymerisation
    • C08F299/0421—Polymerisation initiated by wave energy or particle radiation
    • C08F299/0428—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F299/0435—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
NL7701700A 1976-02-23 1977-02-17 Initiatoren voor de fotopolymerisatie. NL7701700A (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH217376A CH597262A5 (nl) 1976-02-23 1976-02-23

Publications (1)

Publication Number Publication Date
NL7701700A true NL7701700A (nl) 1977-08-25

Family

ID=4227591

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7701700A NL7701700A (nl) 1976-02-23 1977-02-17 Initiatoren voor de fotopolymerisatie.

Country Status (7)

Country Link
JP (1) JPS52107084A (nl)
BE (1) BE851689A (nl)
CH (1) CH597262A5 (nl)
DE (1) DE2704927A1 (nl)
FR (1) FR2341598A1 (nl)
GB (1) GB1526661A (nl)
NL (1) NL7701700A (nl)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2720560A1 (de) * 1977-05-07 1978-11-09 Basf Ag Verbesserte photopolymerisierbare massen fuer die herstellung von druckplatten und reliefformen
DE3464921D1 (en) * 1983-05-02 1987-08-27 Du Pont Constrained n-alkylamino aryl ketones as sensitizers for photopolymer compositions
JP5299838B2 (ja) * 2008-03-18 2013-09-25 川崎化成工業株式会社 １０−ヒドロキシ−１０−ナフチルメチルアントラセン−９（１０ｈ）−オン化合物及びその光ラジカル重合開始剤としての用途。
GB2476976A (en) * 2010-01-18 2011-07-20 Lintfield Ltd Protected aryl ketones and their use as photoinitiators

Also Published As

Publication number Publication date
DE2704927A1 (de) 1977-08-25
GB1526661A (en) 1978-09-27
CH597262A5 (nl) 1978-03-31
BE851689A (fr) 1977-08-22
FR2341598A1 (fr) 1977-09-16
FR2341598B1 (nl) 1980-04-18
JPS52107084A (en) 1977-09-08

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Legal Events

Date Code Title Description
BV The patent application has lapsed