CH597262A5 - - Google Patents

Info

Publication number
CH597262A5
CH597262A5 CH217376A CH217376A CH597262A5 CH 597262 A5 CH597262 A5 CH 597262A5 CH 217376 A CH217376 A CH 217376A CH 217376 A CH217376 A CH 217376A CH 597262 A5 CH597262 A5 CH 597262A5
Authority
CH
Switzerland
Application number
CH217376A
Inventor
Louis Dr Felder
Rudolf Dr Kirchmayr
Original Assignee
Ciba Geigy Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy Ag filed Critical Ciba Geigy Ag
Priority to CH217376A priority Critical patent/CH597262A5/xx
Priority to DE19772704927 priority patent/DE2704927A1/de
Priority to NL7701700A priority patent/NL7701700A/xx
Priority to GB7519/77A priority patent/GB1526661A/en
Priority to BE175138A priority patent/BE851689A/xx
Priority to FR7705212A priority patent/FR2341598A1/fr
Priority to JP1910477A priority patent/JPS52107084A/ja
Publication of CH597262A5 publication Critical patent/CH597262A5/xx
Priority to US05/892,568 priority patent/US4188224A/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/10Printing inks based on artificial resins
    • C09D11/101Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/04Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters
    • C08F299/0407Processes of polymerisation
    • C08F299/0421Polymerisation initiated by wave energy or particle radiation
    • C08F299/0428Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F299/0435Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Polymerisation Methods In General (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
CH217376A 1976-02-23 1976-02-23 CH597262A5 (xx)

Priority Applications (8)

Application Number Priority Date Filing Date Title
CH217376A CH597262A5 (xx) 1976-02-23 1976-02-23
DE19772704927 DE2704927A1 (de) 1976-02-23 1977-02-07 Initiatoren fuer die photopolymerisation
NL7701700A NL7701700A (nl) 1976-02-23 1977-02-17 Initiatoren voor de fotopolymerisatie.
GB7519/77A GB1526661A (en) 1976-02-23 1977-02-22 Initiators for photo polymerisation
BE175138A BE851689A (fr) 1976-02-23 1977-02-22 Inducteurs de photopolymerisation a base de derives de l'anthrone
FR7705212A FR2341598A1 (fr) 1976-02-23 1977-02-23 Inducteurs de photopolymerisation a base de derives de l'anthrone
JP1910477A JPS52107084A (en) 1976-02-23 1977-02-23 Photopolymerization initiator for unsaturated compound
US05/892,568 US4188224A (en) 1976-02-23 1978-04-03 Photopolymerizable composition containing anthrones

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH217376A CH597262A5 (xx) 1976-02-23 1976-02-23

Publications (1)

Publication Number Publication Date
CH597262A5 true CH597262A5 (xx) 1978-03-31

Family

ID=4227591

Family Applications (1)

Application Number Title Priority Date Filing Date
CH217376A CH597262A5 (xx) 1976-02-23 1976-02-23

Country Status (7)

Country Link
JP (1) JPS52107084A (xx)
BE (1) BE851689A (xx)
CH (1) CH597262A5 (xx)
DE (1) DE2704927A1 (xx)
FR (1) FR2341598A1 (xx)
GB (1) GB1526661A (xx)
NL (1) NL7701700A (xx)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2720560A1 (de) * 1977-05-07 1978-11-09 Basf Ag Verbesserte photopolymerisierbare massen fuer die herstellung von druckplatten und reliefformen
EP0127762B1 (en) * 1983-05-02 1987-07-22 E.I. Du Pont De Nemours And Company Constrained n-alkylamino aryl ketones as sensitizers for photopolymer compositions
JP5299838B2 (ja) * 2008-03-18 2013-09-25 川崎化成工業株式会社 10−ヒドロキシ−10−ナフチルメチルアントラセン−9(10h)−オン化合物及びその光ラジカル重合開始剤としての用途。
GB2476976A (en) * 2010-01-18 2011-07-20 Lintfield Ltd Protected aryl ketones and their use as photoinitiators

Also Published As

Publication number Publication date
GB1526661A (en) 1978-09-27
DE2704927A1 (de) 1977-08-25
NL7701700A (nl) 1977-08-25
FR2341598B1 (xx) 1980-04-18
JPS52107084A (en) 1977-09-08
FR2341598A1 (fr) 1977-09-16
BE851689A (fr) 1977-08-22

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Legal Events

Date Code Title Description
PL Patent ceased