NL7604774A - Fotogevoelige film. - Google Patents

Fotogevoelige film.

Info

Publication number
NL7604774A
NL7604774A NL7604774A NL7604774A NL7604774A NL 7604774 A NL7604774 A NL 7604774A NL 7604774 A NL7604774 A NL 7604774A NL 7604774 A NL7604774 A NL 7604774A NL 7604774 A NL7604774 A NL 7604774A
Authority
NL
Netherlands
Prior art keywords
photo
sensitive film
sensitive
film
Prior art date
Application number
NL7604774A
Other languages
English (en)
Dutch (nl)
Original Assignee
Napp Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Napp Systems Inc filed Critical Napp Systems Inc
Publication of NL7604774A publication Critical patent/NL7604774A/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/04Chromates
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/016Diazonium salts or compounds
    • G03F7/021Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/06Silver salts

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Formation Of Insulating Films (AREA)
NL7604774A 1975-06-19 1976-05-05 Fotogevoelige film. NL7604774A (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US58833475A 1975-06-19 1975-06-19

Publications (1)

Publication Number Publication Date
NL7604774A true NL7604774A (nl) 1976-12-21

Family

ID=24353419

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7604774A NL7604774A (nl) 1975-06-19 1976-05-05 Fotogevoelige film.

Country Status (12)

Country Link
JP (1) JPS5936731B2 (ja)
BE (1) BE841797A (ja)
CA (1) CA1091969A (ja)
CH (1) CH633893A5 (ja)
DE (1) DE2626066A1 (ja)
DK (1) DK232276A (ja)
FR (1) FR2315110A1 (ja)
GB (1) GB1548764A (ja)
IT (1) IT1061234B (ja)
NL (1) NL7604774A (ja)
NO (1) NO762006L (ja)
SE (1) SE422847B (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0008038A1 (de) * 1978-08-03 1980-02-20 Hoechst Aktiengesellschaft Verfahren zur Herstellung eines lichtempfindlichen Kopiermaterials auf Basis von Diazoniumsalz-Kondensationsprodukten

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52154627A (en) * 1976-06-18 1977-12-22 Fuji Photo Film Co Ltd Silver halide light sensitive material
JPS52154626A (en) * 1976-06-18 1977-12-22 Fuji Photo Film Co Ltd Silver halide light sensitive material
JPS5518621A (en) * 1978-07-26 1980-02-08 Fuji Photo Film Co Ltd Photosensitive lithographic printing plate
JPS5823026A (ja) * 1981-08-04 1983-02-10 Nippon Paint Co Ltd 水現像性平版印刷版材
JPS58174939A (ja) * 1982-03-18 1983-10-14 Konishiroku Photo Ind Co Ltd 画像形成材料
US4668604A (en) * 1982-04-22 1987-05-26 E.I. Du Pont De Nemours And Company Positive-working photosensitive elements containing crosslinked beads and process of use
US4551415A (en) * 1982-04-22 1985-11-05 E. I. Du Pont De Nemours And Company Photosensitive coatings containing crosslinked beads
US4601970A (en) * 1982-04-22 1986-07-22 E. I. Du Pont De Nemours And Company Dry photosensitive film containing crosslinked beads
DE3328019A1 (de) * 1982-09-21 1984-03-22 Polychrome Corp., 10702 Yonkers, N.Y. Mit wasser entwickelbare druckplatte
GB2273366B (en) * 1992-11-18 1996-03-27 Du Pont Forming images on radiation-sensitive plates
US5688627A (en) * 1996-07-02 1997-11-18 Precision Lithograining Corp. Light sensitive diazonium compounds having both bisulfate and zincate parts, method of making the compounds and compositions utilizing them

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3382069A (en) * 1964-06-18 1968-05-07 Azoplate Corp Planographic printing plate
GB1469941A (en) * 1973-04-10 1977-04-06 Andrews Paper & Chem Co Inc Diazotype reproduction layer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0008038A1 (de) * 1978-08-03 1980-02-20 Hoechst Aktiengesellschaft Verfahren zur Herstellung eines lichtempfindlichen Kopiermaterials auf Basis von Diazoniumsalz-Kondensationsprodukten

Also Published As

Publication number Publication date
CH633893A5 (en) 1982-12-31
NO762006L (ja) 1976-12-21
JPS522520A (en) 1977-01-10
GB1548764A (en) 1979-07-18
BE841797A (fr) 1976-09-01
FR2315110A1 (fr) 1977-01-14
SE7605083L (sv) 1976-12-20
DE2626066A1 (de) 1977-01-20
SE422847B (sv) 1982-03-29
DK232276A (da) 1976-12-20
FR2315110B1 (ja) 1981-11-13
JPS5936731B2 (ja) 1984-09-05
IT1061234B (it) 1983-02-28
CA1091969A (en) 1980-12-23

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Legal Events

Date Code Title Description
BA A request for search or an international-type search has been filed
BB A search report has been drawn up
BC A request for examination has been filed
A85 Still pending on 85-01-01
BV The patent application has lapsed