NL7413324A - Met een hoge spanning werkende en door een stof gekoelde inrichting en toevoer- ngen daarvoor. - Google Patents

Met een hoge spanning werkende en door een stof gekoelde inrichting en toevoer- ngen daarvoor.

Info

Publication number
NL7413324A
NL7413324A NL7413324A NL7413324A NL7413324A NL 7413324 A NL7413324 A NL 7413324A NL 7413324 A NL7413324 A NL 7413324A NL 7413324 A NL7413324 A NL 7413324A NL 7413324 A NL7413324 A NL 7413324A
Authority
NL
Netherlands
Prior art keywords
substance
high voltage
cooled device
voltage acting
supplies therefor
Prior art date
Application number
NL7413324A
Other languages
English (en)
Dutch (nl)
Original Assignee
Triplex Safety Glass Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Triplex Safety Glass Co filed Critical Triplex Safety Glass Co
Publication of NL7413324A publication Critical patent/NL7413324A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
NL7413324A 1973-10-11 1974-10-10 Met een hoge spanning werkende en door een stof gekoelde inrichting en toevoer- ngen daarvoor. NL7413324A (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB4758273A GB1478464A (en) 1973-10-11 1973-10-11 Reactive sputtering apparatus and supply leads therefor

Publications (1)

Publication Number Publication Date
NL7413324A true NL7413324A (nl) 1975-04-15

Family

ID=10445503

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7413324A NL7413324A (nl) 1973-10-11 1974-10-10 Met een hoge spanning werkende en door een stof gekoelde inrichting en toevoer- ngen daarvoor.

Country Status (9)

Country Link
US (1) US3962530A (ja)
JP (1) JPS5078577A (ja)
CA (1) CA1030487A (ja)
DE (1) DE2447280A1 (ja)
FR (1) FR2247814B1 (ja)
GB (1) GB1478464A (ja)
NL (1) NL7413324A (ja)
SE (1) SE7412362L (ja)
ZA (1) ZA746246B (ja)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51157267U (ja) * 1975-06-10 1976-12-15
JPS53135102U (ja) * 1977-03-22 1978-10-26
DE3306870A1 (de) * 1983-02-26 1984-08-30 Leybold-Heraeus GmbH, 5000 Köln Vorrichtung zum herstellen von schichten mit rotationssymmetrischem dickenprofil durch katodenzerstaeubung
DE3725571A1 (de) * 1987-08-01 1989-02-09 Leybold Ag Vorrichtung zum herstellen von schichten mit gleichmaessigem dickenprofil auf substraten durch kathodenzerstaeubung
DE3810175A1 (de) * 1988-03-25 1989-10-05 Elektronische Anlagen Gmbh Kathodenzerstaeubungsvorrichtung
DE4241927C2 (de) * 1992-12-11 1994-09-22 Max Planck Gesellschaft Zur Anordnung in einem Vakuumgefäß geeignete selbsttragende isolierte Elektrodenanordnung, insbesondere Antennenspule für einen Hochfrequenz-Plasmagenerator
US5736670A (en) * 1994-09-28 1998-04-07 Westinghouse Electric Corporation Flexible gas tight electrical connection for generators
US6087591A (en) * 1995-04-26 2000-07-11 Nguyen; Phu D. Insulated electrical conductors
US6134778A (en) * 1998-07-15 2000-10-24 Tyco Submarine Systems Ltd. Method of connecting a wire to an electrical device
CN106935460B (zh) * 2015-12-30 2018-09-28 核工业西南物理研究院 一种离子源放电室阴极灯丝杆的连接和冷却结构

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE596392C (de) * 1931-06-21 1934-05-05 Max Weiset Dr Ing Endverschluss fuer Einleiterbleikabel
US2483301A (en) * 1944-10-31 1949-09-27 Rca Corp Cooled, high-frequency electric cable
GB648558A (en) * 1948-09-10 1951-01-10 Gen Electric Co Ltd Improvements in or relating to electric plugs and sockets
GB1025628A (en) * 1963-11-07 1966-04-14 Steelweld Ltd Improvements in and relating to stranded wire electrical conductor cables with terminal lugs
JPS4413338Y1 (ja) * 1965-05-18 1969-06-03

Also Published As

Publication number Publication date
SE7412362L (ja) 1975-04-14
FR2247814A1 (ja) 1975-05-09
CA1030487A (en) 1978-05-02
JPS5078577A (ja) 1975-06-26
ZA746246B (en) 1976-05-26
DE2447280A1 (de) 1975-04-17
GB1478464A (en) 1977-06-29
FR2247814B1 (ja) 1979-02-09
US3962530A (en) 1976-06-08

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Legal Events

Date Code Title Description
BV The patent application has lapsed