NL73698C - - Google Patents

Info

Publication number
NL73698C
NL73698C NL130843A NL130843A NL73698C NL 73698 C NL73698 C NL 73698C NL 130843 A NL130843 A NL 130843A NL 130843 A NL130843 A NL 130843A NL 73698 C NL73698 C NL 73698C
Authority
NL
Netherlands
Application number
NL130843A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Application granted granted Critical
Publication of NL73698C publication Critical patent/NL73698C/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/288—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/037—Purification
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
NL130843A 1941-03-27 1947-03-10 NL73698C (cs)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US385425A US2402839A (en) 1941-03-27 1941-03-27 Electrical translating device utilizing silicon

Publications (1)

Publication Number Publication Date
NL73698C true NL73698C (cs) 1953-12-15

Family

ID=23521328

Family Applications (1)

Application Number Title Priority Date Filing Date
NL130843A NL73698C (cs) 1941-03-27 1947-03-10

Country Status (6)

Country Link
US (1) US2402839A (cs)
BE (1) BE473051A (cs)
DE (1) DE823468C (cs)
FR (1) FR941900A (cs)
GB (1) GB594121A (cs)
NL (1) NL73698C (cs)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2631356A (en) * 1953-03-17 Method of making p-n junctions
BE471989A (cs) * 1941-07-16
US2569892A (en) * 1941-11-05 1951-10-02 Hazeltine Research Inc Crystal contacts of which one element is mainly silicon
US2544842A (en) * 1943-06-23 1951-03-13 James L Lawson Overload protection of highfrequency receivers
US2469569A (en) * 1945-03-02 1949-05-10 Bell Telephone Labor Inc Point contact negative resistance devices
NL34436C (cs) * 1945-04-20
US2503837A (en) * 1945-07-27 1950-04-11 Bell Telephone Labor Inc Electrical translating device
US2472770A (en) * 1945-11-20 1949-06-07 Sylvania Electric Prod Resistance apparatus for converting mechanical movement into electrical pulses
NL70486C (cs) * 1945-12-29
US2571163A (en) * 1946-02-18 1951-10-16 Robert H Rines Electric system
US2646536A (en) * 1946-11-14 1953-07-21 Purdue Research Foundation Rectifier
US2704818A (en) * 1947-04-24 1955-03-22 Gen Electric Asymmetrically conductive device
US2542115A (en) * 1948-01-30 1951-02-20 Fay C Brown Photosensitive device
US2569347A (en) * 1948-06-26 1951-09-25 Bell Telephone Labor Inc Circuit element utilizing semiconductive material
US2673930A (en) * 1948-08-08 1954-03-30 Westinghouse Freins & Signaux Ultrahigh-frequency crystal device of the asymmetrical conductivity type
US2661448A (en) * 1948-12-20 1953-12-01 North American Aviation Inc Transfer resistor and method of making
US2750654A (en) * 1950-10-03 1956-06-19 Harry L Owens Miniature rectifier
US2708646A (en) * 1951-05-09 1955-05-17 Hughes Aircraft Co Methods of making germanium alloy semiconductors
US2876400A (en) * 1953-02-27 1959-03-03 Siemens Ag Composite electrodes for directional crystal devices
US2865082A (en) * 1953-07-16 1958-12-23 Sylvania Electric Prod Semiconductor mount and method
DE1039646B (de) * 1953-10-19 1958-09-25 Siemens Ag Verfahren zur Herstellung einer Halbleiteranordnung mit mehreren UEbergaengen zwischen Zonen unterschiedlichen Leitungstyps
US2861230A (en) * 1953-11-24 1958-11-18 Gen Electric Calorized point contact electrode for semiconductor devices
NL183885B (nl) * 1953-12-23 Texaco Development Corp Werkwijze voor de bereiding van een gasmengsel, dat in hoofdzaak waterstof en koolmonoxide bevat door partiele oxydatie van een brandstof.
DE1067131B (de) * 1954-09-15 1959-10-15 Siemens &. Halske Aktiengesell schatt Berlin und München Verfahren zum Herstellen einer Halbleiteranordnung mit einer zwischen einer Metallschicht und der Oberflache des Halbleiterkristalls erzeugten Randschicht
CH332463A (de) * 1954-09-24 1958-09-15 Lonza Ag Verfahren zur Reinigung von Rohsilizium
US2885364A (en) * 1955-05-31 1959-05-05 Columbia Broadcasting Syst Inc Method of treating semiconducting materials for electrical devices
BE555318A (cs) * 1956-03-07
NL109587C (cs) * 1957-11-05
GB922150A (en) * 1958-08-04 1963-03-27 Philips Electrical Ind Ltd Improvements in or relating to methods of making semiconductor bodies
US3017251A (en) * 1958-08-19 1962-01-16 Du Pont Process for the production of silicon
US3032412A (en) * 1960-04-08 1962-05-01 Union Carbide Corp Nondisintegrating alloy
US3221221A (en) * 1961-05-31 1965-11-30 Nippon Electric Co Point contact detector
BE621965A (cs) * 1961-09-02 1900-01-01
US3159462A (en) * 1962-09-24 1964-12-01 Int Rectifier Corp Semiconductor and secured metal base and method of making the same
DE1264618C2 (de) * 1963-08-28 1977-06-02 Siemens AG, 1000 Berlin und 8000 München Spitzendiode mit einem federnden molybdaen- oder wolfram-draht und verfahren zu deren herstellung
DE2508803C3 (de) * 1975-02-28 1982-07-08 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Verfahren zur Herstellung plattenförmiger Siliciumkristalle mit Kolumnarstruktur
JP4436904B2 (ja) * 2002-07-23 2010-03-24 新日鉄マテリアルズ株式会社 Ｓｉ製造方法

Also Published As

Publication number Publication date
US2402839A (en) 1946-06-25
DE823468C (de) 1951-12-03
FR941900A (fr) 1949-01-24
GB594121A (en) 1947-11-04
BE473051A (cs) 1947-06-30

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