NL7307936A - - Google Patents
Info
- Publication number
- NL7307936A NL7307936A NL7307936A NL7307936A NL7307936A NL 7307936 A NL7307936 A NL 7307936A NL 7307936 A NL7307936 A NL 7307936A NL 7307936 A NL7307936 A NL 7307936A NL 7307936 A NL7307936 A NL 7307936A
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- ing And Chemical Polishing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US26198272A | 1972-06-12 | 1972-06-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL7307936A true NL7307936A (en:Method) | 1973-12-14 |
Family
ID=22995688
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL7307936A NL7307936A (en:Method) | 1972-06-12 | 1973-06-07 |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS5114042B2 (en:Method) |
| BE (1) | BE800708A (en:Method) |
| DE (1) | DE2329208A1 (en:Method) |
| FR (1) | FR2188193A1 (en:Method) |
| GB (1) | GB1440244A (en:Method) |
| NL (1) | NL7307936A (en:Method) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2403054C2 (de) * | 1972-07-27 | 1983-01-13 | Hoechst Ag, 6000 Frankfurt | Verfahren zur Herstellung eines lichtempfindlichen Aufzeichnungsmaterials |
| JPS56122031A (en) * | 1980-03-01 | 1981-09-25 | Japan Synthetic Rubber Co Ltd | Positive type photosensitive resin composition |
| JPS57173941A (en) * | 1981-04-21 | 1982-10-26 | Oki Electric Ind Co Ltd | Formation of positive type photo resist pattern |
| JP2593305B2 (ja) * | 1987-02-02 | 1997-03-26 | 日本ペイント株式会社 | ポジ型感光性樹脂組成物 |
| EP0302941B1 (en) * | 1987-02-02 | 1993-12-29 | Nippon Paint Co., Ltd. | Positive photosensitive resin composition and process for its production |
| DE69028834T2 (de) * | 1989-12-01 | 1997-02-13 | Tosoh Corp | Positiv arbeitende lichtempfindliche Zusammensetzungen zur Herstellung von Linsen |
| KR20010112227A (ko) | 1999-10-07 | 2001-12-20 | 데머 얀, 당코 제니아 떼. | 감광성 조성물 |
| JP4213366B2 (ja) * | 2001-06-12 | 2009-01-21 | Ａｚエレクトロニックマテリアルズ株式会社 | 厚膜レジストパターンの形成方法 |
-
1973
- 1973-06-02 JP JP48062462A patent/JPS5114042B2/ja not_active Expired
- 1973-06-06 FR FR7320573A patent/FR2188193A1/fr not_active Withdrawn
- 1973-06-07 DE DE19732329208 patent/DE2329208A1/de active Pending
- 1973-06-07 NL NL7307936A patent/NL7307936A/xx unknown
- 1973-06-08 BE BE132093A patent/BE800708A/xx unknown
- 1973-06-12 GB GB2785873A patent/GB1440244A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| FR2188193A1 (en:Method) | 1974-01-18 |
| GB1440244A (en) | 1976-06-23 |
| JPS5114042B2 (en:Method) | 1976-05-06 |
| DE2329208A1 (de) | 1974-01-03 |
| BE800708A (fr) | 1973-10-01 |
| JPS4957055A (en:Method) | 1974-06-03 |