NL7213625A - - Google Patents

Info

Publication number
NL7213625A
NL7213625A NL7213625A NL7213625A NL7213625A NL 7213625 A NL7213625 A NL 7213625A NL 7213625 A NL7213625 A NL 7213625A NL 7213625 A NL7213625 A NL 7213625A NL 7213625 A NL7213625 A NL 7213625A
Authority
NL
Netherlands
Application number
NL7213625A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to NL7213625A priority Critical patent/NL7213625A/xx
Priority to US400879A priority patent/US3919066A/en
Priority to DE19732348779 priority patent/DE2348779C3/de
Priority to CA182,588A priority patent/CA1020494A/en
Priority to IT69925/73A priority patent/IT1055539B/it
Priority to AU61039/73A priority patent/AU493297B2/en
Priority to GB4637673A priority patent/GB1440349A/en
Priority to FR7335435A priority patent/FR2202369B2/fr
Priority to JP48112424A priority patent/JPS5232954B2/ja
Publication of NL7213625A publication Critical patent/NL7213625A/xx

Links

Classifications

    • H10W74/40
    • H10P76/4083
    • H10P95/00
    • H10W74/43
NL7213625A 1972-10-07 1972-10-07 NL7213625A (cg-RX-API-DMAC10.html)

Priority Applications (9)

Application Number Priority Date Filing Date Title
NL7213625A NL7213625A (cg-RX-API-DMAC10.html) 1972-10-07 1972-10-07
US400879A US3919066A (en) 1972-10-07 1973-09-26 Method of manufacturing etched patterns
DE19732348779 DE2348779C3 (de) 1972-10-07 1973-09-28 Verfahren zur Herstellung geätzter Muster
CA182,588A CA1020494A (en) 1972-10-07 1973-10-03 Method of manufacturing etched patterns
IT69925/73A IT1055539B (it) 1972-10-07 1973-10-04 Procedimento per la produzione di disegvi mediante incisione a polve rizzazione catodica
AU61039/73A AU493297B2 (en) 1972-10-07 1973-10-04 Method of manufacturing etched patterns
GB4637673A GB1440349A (en) 1972-10-07 1973-10-04 Method of manufacturing etched patterns
FR7335435A FR2202369B2 (cg-RX-API-DMAC10.html) 1972-10-07 1973-10-04
JP48112424A JPS5232954B2 (cg-RX-API-DMAC10.html) 1972-10-07 1973-10-08

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7213625A NL7213625A (cg-RX-API-DMAC10.html) 1972-10-07 1972-10-07

Publications (1)

Publication Number Publication Date
NL7213625A true NL7213625A (cg-RX-API-DMAC10.html) 1974-04-09

Family

ID=19817096

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7213625A NL7213625A (cg-RX-API-DMAC10.html) 1972-10-07 1972-10-07

Country Status (7)

Country Link
US (1) US3919066A (cg-RX-API-DMAC10.html)
JP (1) JPS5232954B2 (cg-RX-API-DMAC10.html)
CA (1) CA1020494A (cg-RX-API-DMAC10.html)
FR (1) FR2202369B2 (cg-RX-API-DMAC10.html)
GB (1) GB1440349A (cg-RX-API-DMAC10.html)
IT (1) IT1055539B (cg-RX-API-DMAC10.html)
NL (1) NL7213625A (cg-RX-API-DMAC10.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5210080A (en) * 1975-07-15 1977-01-26 Nippon Telegr & Teleph Corp <Ntt> Method for manufacturing semiconductor device

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4057831A (en) * 1972-09-05 1977-11-08 U.S. Philips Corporation Video record disc manufactured by a process involving chemical or sputter etching
DE2547792C3 (de) * 1974-10-25 1978-08-31 Hitachi, Ltd., Tokio Verfahren zur Herstellung eines Halbleiterbauelementes
NL7607298A (nl) * 1976-07-02 1978-01-04 Philips Nv Werkwijze voor het vervaardigen van een inrichting en inrichting vervaardigd volgens de werkwijze.
JPS5381110A (en) * 1976-12-25 1978-07-18 Toshiba Corp Manufacture of magnetic film head
JPS5539646A (en) * 1978-09-12 1980-03-19 Nec Corp Ion taper etching
US4534826A (en) * 1983-12-29 1985-08-13 Ibm Corporation Trench etch process for dielectric isolation

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2117199C3 (de) * 1971-04-08 1974-08-22 Philips Patentverwaltung Gmbh, 2000 Hamburg Verfahren zur Herstellung geätzter Muster in dünnen Schichten mit definierten Kantenprofilen
US3723277A (en) * 1971-07-14 1973-03-27 Molekularelektronik Method for the production of masks in the manufacture of semiconductor components

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5210080A (en) * 1975-07-15 1977-01-26 Nippon Telegr & Teleph Corp <Ntt> Method for manufacturing semiconductor device

Also Published As

Publication number Publication date
DE2348779A1 (de) 1974-04-11
JPS4974483A (cg-RX-API-DMAC10.html) 1974-07-18
AU6103973A (en) 1975-04-10
FR2202369A2 (cg-RX-API-DMAC10.html) 1974-05-03
IT1055539B (it) 1982-01-11
FR2202369B2 (cg-RX-API-DMAC10.html) 1976-10-01
DE2348779B2 (de) 1976-05-26
US3919066A (en) 1975-11-11
GB1440349A (en) 1976-06-23
CA1020494A (en) 1977-11-08
JPS5232954B2 (cg-RX-API-DMAC10.html) 1977-08-25

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