NL7212014A - - Google Patents
Info
- Publication number
- NL7212014A NL7212014A NL7212014A NL7212014A NL7212014A NL 7212014 A NL7212014 A NL 7212014A NL 7212014 A NL7212014 A NL 7212014A NL 7212014 A NL7212014 A NL 7212014A NL 7212014 A NL7212014 A NL 7212014A
- Authority
- NL
- Netherlands
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical, image processing or photographic arrangements associated with the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/295—Electron or ion diffraction tubes
- H01J37/2955—Electron or ion diffraction tubes using scanning ray
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP46073581A JPS5126227B2 (en:Method) | 1971-09-21 | 1971-09-21 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL7212014A true NL7212014A (en:Method) | 1973-03-23 |
Family
ID=13522395
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL7212014A NL7212014A (en:Method) | 1971-09-21 | 1972-09-04 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3795809A (en:Method) |
| JP (1) | JPS5126227B2 (en:Method) |
| DE (1) | DE2246404C3 (en:Method) |
| FR (1) | FR2153346B1 (en:Method) |
| GB (1) | GB1411793A (en:Method) |
| NL (1) | NL7212014A (en:Method) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3872305A (en) * | 1972-12-06 | 1975-03-18 | Jeol Ltd | Convertible scanning electron microscope |
| JPS5243058B2 (en:Method) * | 1974-04-22 | 1977-10-28 | ||
| NL7416395A (nl) * | 1974-12-17 | 1976-06-21 | Philips Nv | Elektronenmikroskoop. |
| DE2542356C2 (de) * | 1975-09-19 | 1977-10-20 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur Fokussierung der Objektivlinse eines Korpuskular-Durchstrahlungs-Rastermikroskops und Einrichtung zur selbsttätigen Durchführung des Verfahrens, sowie Anwendung |
| NL175245C (nl) * | 1977-05-26 | 1984-10-01 | Philips Nv | Elektronenmicroscoop met hulplens en elektromagnetische lens hiervoor. |
| JPS6029186B2 (ja) | 1980-07-28 | 1985-07-09 | 株式会社国際精工 | 電子顕微鏡 |
| US4399360A (en) * | 1980-08-08 | 1983-08-16 | University Patents, Inc. | Transmission electron microscope employing sequential pixel acquistion for display |
| EP0049872B1 (en) * | 1980-10-15 | 1985-09-25 | Kabushiki Kaisha Toshiba | Electron beam exposure system |
| JP2748956B2 (ja) * | 1984-05-18 | 1998-05-13 | 株式会社日立製作所 | 走査形電子顕微鏡 |
| JPS63298949A (ja) * | 1987-05-28 | 1988-12-06 | Jeol Ltd | 広狭領域が同時観察可能な分析電子顕微鏡 |
| DE3825103A1 (de) * | 1988-07-23 | 1990-01-25 | Zeiss Carl Fa | Verfahren zum beleuchten eines objektes in einem transmissions-elektronenmikroskop |
| JPH0233843A (ja) * | 1988-07-25 | 1990-02-05 | Hitachi Ltd | 走査電子顕微鏡 |
| JP3148353B2 (ja) * | 1991-05-30 | 2001-03-19 | ケーエルエー・インストルメンツ・コーポレーション | 電子ビーム検査方法とそのシステム |
| JPH06215714A (ja) * | 1992-06-05 | 1994-08-05 | Hitachi Ltd | 電界放出型透過電子顕微鏡 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL98715C (en:Method) * | 1953-09-04 | |||
| GB990239A (en) * | 1961-08-17 | 1965-04-28 | Christopher William Baisley Gr | Improvements in measuring systems for electron diffraction patterns |
-
1971
- 1971-09-21 JP JP46073581A patent/JPS5126227B2/ja not_active Expired
-
1972
- 1972-09-04 NL NL7212014A patent/NL7212014A/xx not_active Application Discontinuation
- 1972-09-15 US US00289425A patent/US3795809A/en not_active Expired - Lifetime
- 1972-09-18 GB GB4320072A patent/GB1411793A/en not_active Expired
- 1972-09-20 FR FR7233337A patent/FR2153346B1/fr not_active Expired
- 1972-09-21 DE DE2246404A patent/DE2246404C3/de not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2246404A1 (de) | 1973-04-05 |
| GB1411793A (en) | 1975-10-29 |
| DE2246404B2 (de) | 1973-11-22 |
| FR2153346B1 (en:Method) | 1976-01-23 |
| DE2246404C3 (de) | 1979-08-30 |
| JPS4839164A (en:Method) | 1973-06-08 |
| FR2153346A1 (en:Method) | 1973-05-04 |
| JPS5126227B2 (en:Method) | 1976-08-05 |
| US3795809A (en) | 1974-03-05 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| BV | The patent application has lapsed |