NL7205566A - - Google Patents
Info
- Publication number
- NL7205566A NL7205566A NL7205566A NL7205566A NL7205566A NL 7205566 A NL7205566 A NL 7205566A NL 7205566 A NL7205566 A NL 7205566A NL 7205566 A NL7205566 A NL 7205566A NL 7205566 A NL7205566 A NL 7205566A
- Authority
- NL
- Netherlands
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/228—Gas flow assisted PVD deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3471—Introduction of auxiliary energy into the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/342—Hollow targets
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| BE102716 | 1971-04-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL7205566A true NL7205566A (https=) | 1972-10-31 |
Family
ID=3841508
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL7205566A NL7205566A (https=) | 1971-04-27 | 1972-04-25 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US3801355A (https=) |
| JP (1) | JPS5511744B1 (https=) |
| BE (1) | BE766345A (https=) |
| CH (1) | CH561286A5 (https=) |
| DE (1) | DE2220086C3 (https=) |
| FR (1) | FR2134336B1 (https=) |
| IT (1) | IT965683B (https=) |
| NL (1) | NL7205566A (https=) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1356769A (en) * | 1973-03-27 | 1974-06-12 | Cit Alcatel | Apparatus and method for depositing thin layers on a substrate |
| FR2245779B1 (https=) * | 1973-09-28 | 1978-02-10 | Cit Alcatel | |
| DE2857102C2 (de) * | 1978-07-08 | 1983-12-01 | Wolfgang Ing.(grad.) 7981 Grünkraut Kieferle | Vorrichtung zum Eindiffundieren und Auflagern einer Metall- oder Legierungsschicht auf ein elektrisch leitendes Werkstück |
| US4268711A (en) * | 1979-04-26 | 1981-05-19 | Optical Coating Laboratory, Inc. | Method and apparatus for forming films from vapors using a contained plasma source |
| GB2085482B (en) * | 1980-10-06 | 1985-03-06 | Optical Coating Laboratory Inc | Forming thin film oxide layers using reactive evaporation techniques |
| US4687560A (en) * | 1985-08-16 | 1987-08-18 | The United States Of America As Represented By The United States Department Of Energy | Method of synthesizing a plurality of reactants and producing thin films of electro-optically active transition metal oxides |
| US4915906A (en) * | 1988-06-17 | 1990-04-10 | Canadian Patents And Development Limited/Societie Canadienne Des Brevets Et D'exploitation Limitee | Novel zinc-based alloys, preparation and use thereof for producing thermal-sprayed coatings having improved corrosion resistance and adherence |
| US6015595A (en) * | 1998-05-28 | 2000-01-18 | Felts; John T. | Multiple source deposition plasma apparatus |
| CN1539090A (zh) | 2001-04-12 | 2004-10-20 | �ź㴫 | 高折射率差纤维波导及其应用 |
| WO2004049042A2 (en) * | 2002-11-22 | 2004-06-10 | Omniguide Communications Inc. | Dielectric waveguide and method of making the same |
| CA2658210A1 (en) * | 2008-04-04 | 2009-10-04 | Sulzer Metco Ag | Method and apparatus for the coating and for the surface treatment of substrates by means of a plasma beam |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1065108A (en) * | 1964-04-09 | 1967-04-12 | Western Electric Co | Production of oxide films on solid substrates |
| FR1502647A (https=) * | 1965-12-17 | 1968-02-07 | ||
| DE1905058C3 (de) * | 1969-02-01 | 1973-10-04 | Leybold-Heraeus Gmbh & Co, Kg, 5000 Koeln-Bayental | Vorrichtung für die Beschichtung von Werkstücken durch Hochfrequenz-Plasmazerstäubung von Werkstoffen im Vakuum |
-
1971
- 1971-04-27 BE BE766345A patent/BE766345A/xx unknown
- 1971-11-30 FR FR7142871A patent/FR2134336B1/fr not_active Expired
-
1972
- 1972-04-12 CH CH534672A patent/CH561286A5/xx not_active IP Right Cessation
- 1972-04-20 US US00246019A patent/US3801355A/en not_active Expired - Lifetime
- 1972-04-24 DE DE2220086A patent/DE2220086C3/de not_active Expired
- 1972-04-25 NL NL7205566A patent/NL7205566A/xx unknown
- 1972-04-26 JP JP4214872A patent/JPS5511744B1/ja active Pending
- 1972-04-27 IT IT23575/72A patent/IT965683B/it active
Also Published As
| Publication number | Publication date |
|---|---|
| BE766345A (fr) | 1971-09-16 |
| DE2220086A1 (de) | 1972-11-16 |
| DE2220086B2 (de) | 1981-07-23 |
| FR2134336A1 (https=) | 1972-12-08 |
| FR2134336B1 (https=) | 1974-05-10 |
| US3801355A (en) | 1974-04-02 |
| DE2220086C3 (de) | 1982-05-06 |
| CH561286A5 (https=) | 1975-04-30 |
| IT965683B (it) | 1974-02-11 |
| JPS5511744B1 (https=) | 1980-03-27 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| BN | A decision not to publish the application has become irrevocable |