NL7205566A - - Google Patents

Info

Publication number
NL7205566A
NL7205566A NL7205566A NL7205566A NL7205566A NL 7205566 A NL7205566 A NL 7205566A NL 7205566 A NL7205566 A NL 7205566A NL 7205566 A NL7205566 A NL 7205566A NL 7205566 A NL7205566 A NL 7205566A
Authority
NL
Netherlands
Application number
NL7205566A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7205566A publication Critical patent/NL7205566A/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3471—Introduction of auxiliary energy into the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/342—Hollow targets

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
NL7205566A 1971-04-27 1972-04-25 NL7205566A (enrdf_load_html_response)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
BE102716 1971-04-27

Publications (1)

Publication Number Publication Date
NL7205566A true NL7205566A (enrdf_load_html_response) 1972-10-31

Family

ID=3841508

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7205566A NL7205566A (enrdf_load_html_response) 1971-04-27 1972-04-25

Country Status (8)

Country Link
US (1) US3801355A (enrdf_load_html_response)
JP (1) JPS5511744B1 (enrdf_load_html_response)
BE (1) BE766345A (enrdf_load_html_response)
CH (1) CH561286A5 (enrdf_load_html_response)
DE (1) DE2220086C3 (enrdf_load_html_response)
FR (1) FR2134336B1 (enrdf_load_html_response)
IT (1) IT965683B (enrdf_load_html_response)
NL (1) NL7205566A (enrdf_load_html_response)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1356769A (en) * 1973-03-27 1974-06-12 Cit Alcatel Apparatus and method for depositing thin layers on a substrate
FR2245779B1 (enrdf_load_html_response) * 1973-09-28 1978-02-10 Cit Alcatel
DE2857102C2 (de) * 1978-07-08 1983-12-01 Wolfgang Ing.(grad.) 7981 Grünkraut Kieferle Vorrichtung zum Eindiffundieren und Auflagern einer Metall- oder Legierungsschicht auf ein elektrisch leitendes Werkstück
US4268711A (en) * 1979-04-26 1981-05-19 Optical Coating Laboratory, Inc. Method and apparatus for forming films from vapors using a contained plasma source
GB2085482B (en) * 1980-10-06 1985-03-06 Optical Coating Laboratory Inc Forming thin film oxide layers using reactive evaporation techniques
US4687560A (en) * 1985-08-16 1987-08-18 The United States Of America As Represented By The United States Department Of Energy Method of synthesizing a plurality of reactants and producing thin films of electro-optically active transition metal oxides
US4915906A (en) * 1988-06-17 1990-04-10 Canadian Patents And Development Limited/Societie Canadienne Des Brevets Et D'exploitation Limitee Novel zinc-based alloys, preparation and use thereof for producing thermal-sprayed coatings having improved corrosion resistance and adherence
US6015595A (en) * 1998-05-28 2000-01-18 Felts; John T. Multiple source deposition plasma apparatus
JP2004533390A (ja) 2001-04-12 2004-11-04 オムニガイド コミュニケーションズ インコーポレイテッド 高屈折率コントラストの光導波路および用途
US20040141702A1 (en) * 2002-11-22 2004-07-22 Vladimir Fuflyigin Dielectric waveguide and method of making the same
CA2658210A1 (en) * 2008-04-04 2009-10-04 Sulzer Metco Ag Method and apparatus for the coating and for the surface treatment of substrates by means of a plasma beam

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1065108A (en) * 1964-04-09 1967-04-12 Western Electric Co Production of oxide films on solid substrates
FR1502647A (enrdf_load_html_response) * 1965-12-17 1968-02-07
DE1905058C3 (de) * 1969-02-01 1973-10-04 Leybold-Heraeus Gmbh & Co, Kg, 5000 Koeln-Bayental Vorrichtung für die Beschichtung von Werkstücken durch Hochfrequenz-Plasmazerstäubung von Werkstoffen im Vakuum

Also Published As

Publication number Publication date
BE766345A (fr) 1971-09-16
DE2220086C3 (de) 1982-05-06
CH561286A5 (enrdf_load_html_response) 1975-04-30
JPS5511744B1 (enrdf_load_html_response) 1980-03-27
FR2134336B1 (enrdf_load_html_response) 1974-05-10
FR2134336A1 (enrdf_load_html_response) 1972-12-08
DE2220086A1 (de) 1972-11-16
DE2220086B2 (de) 1981-07-23
IT965683B (it) 1974-02-11
US3801355A (en) 1974-04-02

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Legal Events

Date Code Title Description
BN A decision not to publish the application has become irrevocable