NL7204863A - - Google Patents
Info
- Publication number
- NL7204863A NL7204863A NL7204863A NL7204863A NL7204863A NL 7204863 A NL7204863 A NL 7204863A NL 7204863 A NL7204863 A NL 7204863A NL 7204863 A NL7204863 A NL 7204863A NL 7204863 A NL7204863 A NL 7204863A
- Authority
- NL
- Netherlands
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/02—Electron guns
- H01J3/021—Electron guns using a field emission, photo emission, or secondary emission electron source
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2233871A JPS5323663B1 (enExample) | 1971-04-12 | 1971-04-12 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| NL7204863A true NL7204863A (enExample) | 1972-10-16 |
| NL155979B NL155979B (nl) | 1978-02-15 |
Family
ID=12079897
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL7204863.A NL155979B (nl) | 1971-04-12 | 1972-04-12 | Elektronenkanon van het veldemissie-type. |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US3786268A (enExample) |
| JP (1) | JPS5323663B1 (enExample) |
| DE (1) | DE2217660A1 (enExample) |
| NL (1) | NL155979B (enExample) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5420828B2 (enExample) * | 1972-06-09 | 1979-07-25 | ||
| DE2851743C2 (de) * | 1978-11-30 | 1980-08-28 | Kernforschungsanlage Juelich Gmbh, 5170 Juelich | ElektronenstoBspektrometer |
| JPS57191950A (en) * | 1981-05-22 | 1982-11-25 | Hitachi Ltd | Charged-particle source |
| WO1987004846A1 (en) * | 1986-02-03 | 1987-08-13 | Crewe Albert V | Electron beam memory system with ultra-compact, high current density electron gun |
| US4760567A (en) * | 1986-08-11 | 1988-07-26 | Electron Beam Memories | Electron beam memory system with ultra-compact, high current density electron gun |
| US4740705A (en) * | 1986-08-11 | 1988-04-26 | Electron Beam Memories | Axially compact field emission cathode assembly |
| JP3131339B2 (ja) * | 1993-12-22 | 2001-01-31 | 三菱電機株式会社 | 陰極、陰極線管および陰極線管の作動方法 |
| US5848118A (en) * | 1997-06-19 | 1998-12-08 | Lear Corporation | Method and apparatus for detecting inhomogeneities in seat assemblies |
| FR2792770A1 (fr) * | 1999-04-22 | 2000-10-27 | Cit Alcatel | Fonctionnement a haute pression d'une cathode froide a emission de champ |
| EP1993119B1 (en) | 2005-09-05 | 2017-11-08 | ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Charged particle beam emitting device and method for operating a charged particle beam emitting device |
| JP5203456B2 (ja) | 2008-06-20 | 2013-06-05 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置、及びその制御方法 |
| US8188451B1 (en) * | 2008-09-24 | 2012-05-29 | Kla-Tencor Corporation | Electron generation and delivery system for contamination sensitive emitters |
| EP2365511B1 (en) * | 2010-03-10 | 2013-05-08 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Feedback loop for emitter flash cleaning |
| WO2016103432A1 (ja) | 2014-12-26 | 2016-06-30 | 株式会社 日立ハイテクノロジーズ | 複合荷電粒子線装置およびその制御方法 |
| JP6762635B1 (ja) * | 2020-04-16 | 2020-09-30 | 株式会社Ｐｈｏｔｏ ｅｌｅｃｔｒｏｎ Ｓｏｕｌ | 電子銃、電子線適用装置、および、電子ビームの射出方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1246744A (en) * | 1969-01-02 | 1971-09-15 | Graham Stuart Plows | Electron beam apparatus |
-
1971
- 1971-04-12 JP JP2233871A patent/JPS5323663B1/ja active Pending
-
1972
- 1972-04-12 DE DE19722217660 patent/DE2217660A1/de active Pending
- 1972-04-12 NL NL7204863.A patent/NL155979B/xx not_active IP Right Cessation
- 1972-04-12 US US00243215A patent/US3786268A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5323663B1 (enExample) | 1978-07-15 |
| US3786268A (en) | 1974-01-15 |
| NL155979B (nl) | 1978-02-15 |
| DE2217660A1 (de) | 1972-11-16 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| NL80 | Information provided on patent owner name for an already discontinued patent |
Owner name: HITACHI |
|
| V4 | Discontinued because of reaching the maximum lifetime of a patent |