NL7111033A - - Google Patents

Info

Publication number
NL7111033A
NL7111033A NL7111033A NL7111033A NL7111033A NL 7111033 A NL7111033 A NL 7111033A NL 7111033 A NL7111033 A NL 7111033A NL 7111033 A NL7111033 A NL 7111033A NL 7111033 A NL7111033 A NL 7111033A
Authority
NL
Netherlands
Application number
NL7111033A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB3880970A external-priority patent/GB1353739A/en
Application filed filed Critical
Publication of NL7111033A publication Critical patent/NL7111033A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
NL7111033A 1970-08-12 1971-08-11 NL7111033A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB3880970A GB1353739A (en) 1970-08-12 1970-08-12 Light exposure means for shadow or contact printing
GB728871 1971-03-19

Publications (1)

Publication Number Publication Date
NL7111033A true NL7111033A (en) 1972-02-15

Family

ID=26241318

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7111033A NL7111033A (en) 1970-08-12 1971-08-11

Country Status (5)

Country Link
US (1) US3795446A (en)
JP (1) JPS5143750B1 (en)
FR (1) FR2104273A5 (en)
IT (1) IT939738B (en)
NL (1) NL7111033A (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2439208A1 (en) * 1974-08-16 1976-03-11 Ibm Deutschland EXPOSURE DEVICE
FR2356975A1 (en) * 1976-06-30 1978-01-27 Ibm CONTACT TYPE PHOTOLITHOGRAPHIC PRINTING PROCESS FOR OBTAINING HIGH RESOLUTION PROFILES AND APPARATUS USING SUCH A PROCESS
JPS60218635A (en) * 1984-04-13 1985-11-01 Canon Inc Lighting device
KR960010023B1 (en) * 1991-02-19 1996-07-25 후지쓰 가부시끼가이샤 Projection exposure method and an optical mask for use in projection exposure
JPH0536586A (en) * 1991-08-02 1993-02-12 Canon Inc Image projection method and manufacture of semiconductor device using same method
JPH0567558A (en) * 1991-09-06 1993-03-19 Nikon Corp Exposure method
JP3194155B2 (en) * 1992-01-31 2001-07-30 キヤノン株式会社 Semiconductor device manufacturing method and projection exposure apparatus using the same
JP3210123B2 (en) * 1992-03-27 2001-09-17 キヤノン株式会社 Imaging method and device manufacturing method using the method
JP3278896B2 (en) * 1992-03-31 2002-04-30 キヤノン株式会社 Illumination apparatus and projection exposure apparatus using the same
DK69492D0 (en) * 1992-05-26 1992-05-26 Purup Prepress As DEVICE FOR EXPOSURE OF A MEDIUM, DEVICE FOR POINT EXPOSURE OF A MEDIA, AND A DEVICE FOR HOLDING A MEDIA
US6245487B1 (en) * 1999-08-26 2001-06-12 Polyfibron Technologies, Inc. Methods for enhancing images on relief image printing plates

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3582208A (en) * 1967-06-01 1971-06-01 Lester E Idler Method and means for producing multidensity tint screens
US3548713A (en) * 1967-10-10 1970-12-22 Gerber Scientific Instr Co Photo-exposure device using annular light beam
US3559546A (en) * 1967-11-01 1971-02-02 Sylvania Electric Prod Cathode ray tube screen exposure
US3601018A (en) * 1968-08-26 1971-08-24 Zenith Radio Corp Method and apparatus for exposing curved substrates
US3615449A (en) * 1969-09-25 1971-10-26 Rca Corp Method of generating high area-density periodic arrays by diffraction imaging
US3610752A (en) * 1970-01-15 1971-10-05 Atomic Energy Commission Preparing printed circuit boards by refracted rays

Also Published As

Publication number Publication date
DE2140549B2 (en) 1976-01-02
DE2140549A1 (en) 1972-02-17
JPS5143750B1 (en) 1976-11-24
IT939738B (en) 1973-02-10
FR2104273A5 (en) 1972-04-14
US3795446A (en) 1974-03-05

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Legal Events

Date Code Title Description
BN A decision not to publish the application has become irrevocable