FR2104273A5 - - Google Patents

Info

Publication number
FR2104273A5
FR2104273A5 FR7129530A FR7129530A FR2104273A5 FR 2104273 A5 FR2104273 A5 FR 2104273A5 FR 7129530 A FR7129530 A FR 7129530A FR 7129530 A FR7129530 A FR 7129530A FR 2104273 A5 FR2104273 A5 FR 2104273A5
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7129530A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rank Organization Ltd
Original Assignee
Rank Organization Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB3880970A external-priority patent/GB1353739A/en
Application filed by Rank Organization Ltd filed Critical Rank Organization Ltd
Application granted granted Critical
Publication of FR2104273A5 publication Critical patent/FR2104273A5/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
FR7129530A 1970-08-12 1971-08-12 Expired FR2104273A5 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB3880970A GB1353739A (en) 1970-08-12 1970-08-12 Light exposure means for shadow or contact printing
GB728871 1971-03-19

Publications (1)

Publication Number Publication Date
FR2104273A5 true FR2104273A5 (en) 1972-04-14

Family

ID=26241318

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7129530A Expired FR2104273A5 (en) 1970-08-12 1971-08-12

Country Status (5)

Country Link
US (1) US3795446A (en)
JP (1) JPS5143750B1 (en)
FR (1) FR2104273A5 (en)
IT (1) IT939738B (en)
NL (1) NL7111033A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2282120A2 (en) * 1974-08-16 1976-03-12 Ibm METHOD AND DEVICE FOR EXPOSING LAYERS SENSITIVE TO LIGHT WITH REMOVAL OF GHOST LINES
FR2356975A1 (en) * 1976-06-30 1978-01-27 Ibm CONTACT TYPE PHOTOLITHOGRAPHIC PRINTING PROCESS FOR OBTAINING HIGH RESOLUTION PROFILES AND APPARATUS USING SUCH A PROCESS
EP0500456A1 (en) * 1991-02-19 1992-08-26 Fujitsu Limited Projection exposure method and an optical mask for use in projection exposure

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60218635A (en) * 1984-04-13 1985-11-01 Canon Inc Lighting device
JPH0536586A (en) * 1991-08-02 1993-02-12 Canon Inc Image projection method and manufacture of semiconductor device using same method
JPH0567558A (en) * 1991-09-06 1993-03-19 Nikon Corp Exposure method
JP3194155B2 (en) * 1992-01-31 2001-07-30 キヤノン株式会社 Semiconductor device manufacturing method and projection exposure apparatus using the same
JP3210123B2 (en) * 1992-03-27 2001-09-17 キヤノン株式会社 Imaging method and device manufacturing method using the method
JP3278896B2 (en) * 1992-03-31 2002-04-30 キヤノン株式会社 Illumination apparatus and projection exposure apparatus using the same
DK69492D0 (en) * 1992-05-26 1992-05-26 Purup Prepress As DEVICE FOR EXPOSURE OF A MEDIUM, DEVICE FOR POINT EXPOSURE OF A MEDIA, AND A DEVICE FOR HOLDING A MEDIA
US6245487B1 (en) * 1999-08-26 2001-06-12 Polyfibron Technologies, Inc. Methods for enhancing images on relief image printing plates

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3582208A (en) * 1967-06-01 1971-06-01 Lester E Idler Method and means for producing multidensity tint screens
US3548713A (en) * 1967-10-10 1970-12-22 Gerber Scientific Instr Co Photo-exposure device using annular light beam
US3559546A (en) * 1967-11-01 1971-02-02 Sylvania Electric Prod Cathode ray tube screen exposure
US3601018A (en) * 1968-08-26 1971-08-24 Zenith Radio Corp Method and apparatus for exposing curved substrates
US3615449A (en) * 1969-09-25 1971-10-26 Rca Corp Method of generating high area-density periodic arrays by diffraction imaging
US3610752A (en) * 1970-01-15 1971-10-05 Atomic Energy Commission Preparing printed circuit boards by refracted rays

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2282120A2 (en) * 1974-08-16 1976-03-12 Ibm METHOD AND DEVICE FOR EXPOSING LAYERS SENSITIVE TO LIGHT WITH REMOVAL OF GHOST LINES
FR2356975A1 (en) * 1976-06-30 1978-01-27 Ibm CONTACT TYPE PHOTOLITHOGRAPHIC PRINTING PROCESS FOR OBTAINING HIGH RESOLUTION PROFILES AND APPARATUS USING SUCH A PROCESS
EP0500456A1 (en) * 1991-02-19 1992-08-26 Fujitsu Limited Projection exposure method and an optical mask for use in projection exposure
US5418093A (en) * 1991-02-19 1995-05-23 Fujitsu Limited Projection exposure method and an optical mask for use in projection exposure

Also Published As

Publication number Publication date
NL7111033A (en) 1972-02-15
DE2140549A1 (en) 1972-02-17
DE2140549B2 (en) 1976-01-02
JPS5143750B1 (en) 1976-11-24
US3795446A (en) 1974-03-05
IT939738B (en) 1973-02-10

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Legal Events

Date Code Title Description
ST Notification of lapse