GB1353739A - Light exposure means for shadow or contact printing - Google Patents

Light exposure means for shadow or contact printing

Info

Publication number
GB1353739A
GB1353739A GB3880970A GB3880970A GB1353739A GB 1353739 A GB1353739 A GB 1353739A GB 3880970 A GB3880970 A GB 3880970A GB 3880970 A GB3880970 A GB 3880970A GB 1353739 A GB1353739 A GB 1353739A
Authority
GB
United Kingdom
Prior art keywords
prism
light
bright zone
mask
contact printing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3880970A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rank Organization Ltd
Original Assignee
Rank Organization Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rank Organization Ltd filed Critical Rank Organization Ltd
Priority to GB3880970A priority Critical patent/GB1353739A/en
Priority to IT69432/71A priority patent/IT939738B/en
Priority to NL7111033A priority patent/NL7111033A/xx
Priority to US00171286A priority patent/US3795446A/en
Priority to JP46061359A priority patent/JPS5143750B1/ja
Priority to FR7129530A priority patent/FR2104273A5/fr
Priority to DE19712140549 priority patent/DE2140549C3/en
Publication of GB1353739A publication Critical patent/GB1353739A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems
    • G03F7/70075Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583Speckle reduction, e.g. coherence control or amplitude/wavefront splitting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

1353739 Lighting arrangement for contact printing RANK ORGANISATION Ltd 3 Nov 1971 [12 Aug 1970 19 March 1971] 38809/70 and 7288/71 Headings G2A and G2J Light exposure means, for use in shadow or contact printing, comprises a light source arranged to provide, in a printing plane, an effective brightness distribution having a bright zone surrounding a central less bright zone, this distribution being such that when a mask is illuminated in the printing plane under conditions of transitional Fresnel-Fraunhofer diffraction, this being the diffraction which is observable at a distance from a coherently illuminated line or slit of the same order as the line or slit width, the illumination condition produced by the light incident on any given part of the mask produces diffraction patterns which tend to cancel each other over part of said patterns. In the embodiment of Fig. 4, light from a point source 1 is reflected through 90 degrees by an element 5, passes through a collimator 7 and finally through a wedge prism 6 which is rotated by a motor 8 and belt drive 9. As the prism rotates the emergent collimated light beam performs a conical scan of a mask 2 and lightsensitive substrate 3 to produce the bright zone surrounding the less bright zone. Alternatively the positions of the prism and collimator are inter-changed Fig.3 (not shown). In other embodiments the conical, or a cylindrical scan, is achieved by placing a rotatable mirror Fig. 5 (not shown) or a rotatable rhomb prism Fig. 6 (not shown) in the light path. In further embodiments, which avoid the use of moving components, the beam from a point light source is split into several component beams, arranged in an annulus, by a multiple prism Figs. 7 and 8 (not shown) and by an annular array of reflectors Figs. 9 and 10 (not shown).
GB3880970A 1970-08-12 1970-08-12 Light exposure means for shadow or contact printing Expired GB1353739A (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
GB3880970A GB1353739A (en) 1970-08-12 1970-08-12 Light exposure means for shadow or contact printing
IT69432/71A IT939738B (en) 1970-08-12 1971-07-19 LIGHTING DEVICE FOR PHOTOLITHOGRAPHIC PRINTING OF MICROCIRCUIT COMPONENTS
NL7111033A NL7111033A (en) 1970-08-12 1971-08-11
US00171286A US3795446A (en) 1970-08-12 1971-08-12 Lithography
JP46061359A JPS5143750B1 (en) 1970-08-12 1971-08-12
FR7129530A FR2104273A5 (en) 1970-08-12 1971-08-12
DE19712140549 DE2140549C3 (en) 1970-08-12 1971-08-12 Lighting device for the production of microcircuits according to the mask printing process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB3880970A GB1353739A (en) 1970-08-12 1970-08-12 Light exposure means for shadow or contact printing

Publications (1)

Publication Number Publication Date
GB1353739A true GB1353739A (en) 1974-05-22

Family

ID=10405817

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3880970A Expired GB1353739A (en) 1970-08-12 1970-08-12 Light exposure means for shadow or contact printing

Country Status (1)

Country Link
GB (1) GB1353739A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4974919A (en) * 1986-10-30 1990-12-04 Canon Kabushiki Kaisha Illuminating device
GB2329036A (en) * 1997-09-05 1999-03-10 Sharp Kk Optical system for redistributing optical extent and illumination source
US6155688A (en) * 1997-09-05 2000-12-05 Sharp Kabushiki Kaisha Dark field projection display

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4974919A (en) * 1986-10-30 1990-12-04 Canon Kabushiki Kaisha Illuminating device
GB2329036A (en) * 1997-09-05 1999-03-10 Sharp Kk Optical system for redistributing optical extent and illumination source
US6155688A (en) * 1997-09-05 2000-12-05 Sharp Kabushiki Kaisha Dark field projection display

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Legal Events

Date Code Title Description
PS Patent sealed
732 Registration of transactions, instruments or events in the register (sect. 32/1977)
PCNP Patent ceased through non-payment of renewal fee