GB1353739A - Light exposure means for shadow or contact printing - Google Patents
Light exposure means for shadow or contact printingInfo
- Publication number
- GB1353739A GB1353739A GB3880970A GB3880970A GB1353739A GB 1353739 A GB1353739 A GB 1353739A GB 3880970 A GB3880970 A GB 3880970A GB 3880970 A GB3880970 A GB 3880970A GB 1353739 A GB1353739 A GB 1353739A
- Authority
- GB
- United Kingdom
- Prior art keywords
- prism
- light
- bright zone
- mask
- contact printing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
1353739 Lighting arrangement for contact printing RANK ORGANISATION Ltd 3 Nov 1971 [12 Aug 1970 19 March 1971] 38809/70 and 7288/71 Headings G2A and G2J Light exposure means, for use in shadow or contact printing, comprises a light source arranged to provide, in a printing plane, an effective brightness distribution having a bright zone surrounding a central less bright zone, this distribution being such that when a mask is illuminated in the printing plane under conditions of transitional Fresnel-Fraunhofer diffraction, this being the diffraction which is observable at a distance from a coherently illuminated line or slit of the same order as the line or slit width, the illumination condition produced by the light incident on any given part of the mask produces diffraction patterns which tend to cancel each other over part of said patterns. In the embodiment of Fig. 4, light from a point source 1 is reflected through 90 degrees by an element 5, passes through a collimator 7 and finally through a wedge prism 6 which is rotated by a motor 8 and belt drive 9. As the prism rotates the emergent collimated light beam performs a conical scan of a mask 2 and lightsensitive substrate 3 to produce the bright zone surrounding the less bright zone. Alternatively the positions of the prism and collimator are inter-changed Fig.3 (not shown). In other embodiments the conical, or a cylindrical scan, is achieved by placing a rotatable mirror Fig. 5 (not shown) or a rotatable rhomb prism Fig. 6 (not shown) in the light path. In further embodiments, which avoid the use of moving components, the beam from a point light source is split into several component beams, arranged in an annulus, by a multiple prism Figs. 7 and 8 (not shown) and by an annular array of reflectors Figs. 9 and 10 (not shown).
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB3880970A GB1353739A (en) | 1970-08-12 | 1970-08-12 | Light exposure means for shadow or contact printing |
IT69432/71A IT939738B (en) | 1970-08-12 | 1971-07-19 | LIGHTING DEVICE FOR PHOTOLITHOGRAPHIC PRINTING OF MICROCIRCUIT COMPONENTS |
NL7111033A NL7111033A (en) | 1970-08-12 | 1971-08-11 | |
US00171286A US3795446A (en) | 1970-08-12 | 1971-08-12 | Lithography |
JP46061359A JPS5143750B1 (en) | 1970-08-12 | 1971-08-12 | |
FR7129530A FR2104273A5 (en) | 1970-08-12 | 1971-08-12 | |
DE19712140549 DE2140549C3 (en) | 1970-08-12 | 1971-08-12 | Lighting device for the production of microcircuits according to the mask printing process |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB3880970A GB1353739A (en) | 1970-08-12 | 1970-08-12 | Light exposure means for shadow or contact printing |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1353739A true GB1353739A (en) | 1974-05-22 |
Family
ID=10405817
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB3880970A Expired GB1353739A (en) | 1970-08-12 | 1970-08-12 | Light exposure means for shadow or contact printing |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB1353739A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4974919A (en) * | 1986-10-30 | 1990-12-04 | Canon Kabushiki Kaisha | Illuminating device |
GB2329036A (en) * | 1997-09-05 | 1999-03-10 | Sharp Kk | Optical system for redistributing optical extent and illumination source |
US6155688A (en) * | 1997-09-05 | 2000-12-05 | Sharp Kabushiki Kaisha | Dark field projection display |
-
1970
- 1970-08-12 GB GB3880970A patent/GB1353739A/en not_active Expired
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4974919A (en) * | 1986-10-30 | 1990-12-04 | Canon Kabushiki Kaisha | Illuminating device |
GB2329036A (en) * | 1997-09-05 | 1999-03-10 | Sharp Kk | Optical system for redistributing optical extent and illumination source |
US6155688A (en) * | 1997-09-05 | 2000-12-05 | Sharp Kabushiki Kaisha | Dark field projection display |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
732 | Registration of transactions, instruments or events in the register (sect. 32/1977) | ||
PCNP | Patent ceased through non-payment of renewal fee |