NL7007474A - - Google Patents

Info

Publication number
NL7007474A
NL7007474A NL7007474A NL7007474A NL7007474A NL 7007474 A NL7007474 A NL 7007474A NL 7007474 A NL7007474 A NL 7007474A NL 7007474 A NL7007474 A NL 7007474A NL 7007474 A NL7007474 A NL 7007474A
Authority
NL
Netherlands
Application number
NL7007474A
Other versions
NL140365B (nl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7007474A publication Critical patent/NL7007474A/xx
Publication of NL140365B publication Critical patent/NL140365B/xx

Links

Classifications

    • H10W74/43—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
    • H10P14/46—
    • H10P95/00—
    • H10W74/40—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/043—Dual dielectric
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/051—Etching
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/053—Field effect transistors fets
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/106—Masks, special
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/942—Masking
    • Y10S438/944—Shadow

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Weting (AREA)
  • Electron Beam Exposure (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Bipolar Transistors (AREA)
  • ing And Chemical Polishing (AREA)
  • Local Oxidation Of Silicon (AREA)
  • Formation Of Insulating Films (AREA)
NL707007474A 1969-10-15 1970-05-22 Werkwijze voor het vervaardigen van een elektronische microstructuur. NL140365B (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP44081843A JPS4939873B1 (cg-RX-API-DMAC10.html) 1969-10-15 1969-10-15

Publications (2)

Publication Number Publication Date
NL7007474A true NL7007474A (cg-RX-API-DMAC10.html) 1971-04-19
NL140365B NL140365B (nl) 1973-11-15

Family

ID=13757738

Family Applications (1)

Application Number Title Priority Date Filing Date
NL707007474A NL140365B (nl) 1969-10-15 1970-05-22 Werkwijze voor het vervaardigen van een elektronische microstructuur.

Country Status (5)

Country Link
US (1) US3690966A (cg-RX-API-DMAC10.html)
JP (1) JPS4939873B1 (cg-RX-API-DMAC10.html)
DE (1) DE2024822C3 (cg-RX-API-DMAC10.html)
GB (1) GB1311684A (cg-RX-API-DMAC10.html)
NL (1) NL140365B (cg-RX-API-DMAC10.html)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3747202A (en) * 1971-11-22 1973-07-24 Honeywell Inf Systems Method of making beam leads on substrates
US3775262A (en) * 1972-02-09 1973-11-27 Ncr Method of making insulated gate field effect transistor
US3926694A (en) * 1972-07-24 1975-12-16 Signetics Corp Double diffused metal oxide semiconductor structure with isolated source and drain and method
JPS5024084A (cg-RX-API-DMAC10.html) * 1973-07-05 1975-03-14
DE3015356A1 (de) * 1980-04-22 1981-10-29 Robert Bosch Gmbh, 7000 Stuttgart Freitragende schichten sowie verfahren zur herstellung freitragender schichten, insbesondere fuer sensoren fuer brennkraftmaschinen
NL188432C (nl) * 1980-12-26 1992-06-16 Nippon Telegraph & Telephone Werkwijze voor het vervaardigen van een mosfet.
JPS5831336A (ja) * 1981-08-19 1983-02-24 Konishiroku Photo Ind Co Ltd ホトマスク素材
CN113053736B (zh) * 2021-03-11 2024-05-03 捷捷半导体有限公司 一种半导体器件制作方法

Also Published As

Publication number Publication date
GB1311684A (en) 1973-03-28
DE2024822A1 (de) 1971-04-22
DE2024822B2 (de) 1977-09-15
JPS4939873B1 (cg-RX-API-DMAC10.html) 1974-10-29
US3690966A (en) 1972-09-12
DE2024822C3 (de) 1978-05-24
NL140365B (nl) 1973-11-15

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