NL6919568A - - Google Patents

Info

Publication number
NL6919568A
NL6919568A NL6919568A NL6919568A NL6919568A NL 6919568 A NL6919568 A NL 6919568A NL 6919568 A NL6919568 A NL 6919568A NL 6919568 A NL6919568 A NL 6919568A NL 6919568 A NL6919568 A NL 6919568A
Authority
NL
Netherlands
Application number
NL6919568A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL6919568A publication Critical patent/NL6919568A/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
NL6919568A 1968-12-31 1969-12-30 NL6919568A (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US78825068A 1968-12-31 1968-12-31

Publications (1)

Publication Number Publication Date
NL6919568A true NL6919568A (enrdf_load_stackoverflow) 1970-07-02

Family

ID=25143901

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6919568A NL6919568A (enrdf_load_stackoverflow) 1968-12-31 1969-12-30

Country Status (6)

Country Link
US (1) US3608519A (enrdf_load_stackoverflow)
JP (1) JPS4931197B1 (enrdf_load_stackoverflow)
DE (1) DE1949767C3 (enrdf_load_stackoverflow)
FR (1) FR2027422A1 (enrdf_load_stackoverflow)
GB (1) GB1281539A (enrdf_load_stackoverflow)
NL (1) NL6919568A (enrdf_load_stackoverflow)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3783821A (en) * 1971-03-02 1974-01-08 K Willmott Planetary workholders
NL7103019A (enrdf_load_stackoverflow) * 1971-03-06 1972-09-08
US3783822A (en) * 1972-05-10 1974-01-08 J Wollam Apparatus for use in deposition of films from a vapor phase
US3850138A (en) * 1972-06-22 1974-11-26 Varian Spa Leini Substrate carrying apparatus for use in coating equipment
SE393967B (sv) * 1974-11-29 1977-05-31 Sateko Oy Forfarande och for utforande av stroleggning mellan lagren i ett virkespaket
US3939798A (en) * 1974-12-19 1976-02-24 Texas Instruments Incorporated Optical thin film coater
GB2089840B (en) * 1980-12-20 1983-12-14 Cambridge Instr Ltd Chemical vapour deposition apparatus incorporating radiant heat source for substrate
US4501766A (en) * 1982-02-03 1985-02-26 Tokyo Shibaura Denki Kabushiki Kaisha Film depositing apparatus and a film depositing method
US4673799A (en) * 1985-03-01 1987-06-16 Focus Semiconductor Systems, Inc. Fluidized bed heater for semiconductor processing
JPH01125923A (ja) * 1987-11-11 1989-05-18 Sumitomo Chem Co Ltd 気相成長装置
JPH07122132B2 (ja) * 1990-11-01 1995-12-25 松下電器産業株式会社 薄膜形成方法および薄膜形成装置
KR100333237B1 (ko) * 1993-10-29 2002-09-12 어플라이드 머티어리얼스, 인코포레이티드 플라즈마에칭챔버내에서오염물질을감소시키는장치및방법
US5558721A (en) * 1993-11-15 1996-09-24 The Furukawa Electric Co., Ltd. Vapor phase growth system and a gas-drive motor
US5472592A (en) * 1994-07-19 1995-12-05 American Plating Systems Electrolytic plating apparatus and method
CA2282771A1 (en) * 1999-09-17 2001-03-17 Dale William Mackenzie Method and apparatus for boronizing a metal workpiece
US6475284B1 (en) * 1999-09-20 2002-11-05 Moore Epitaxial, Inc. Gas dispersion head
US6578600B1 (en) * 2000-10-31 2003-06-17 International Business Machines Corporation Gas isolation box
EP1271620B1 (en) * 2001-06-21 2013-05-29 Hyoung June Kim Method and apparatus for heat treatment of semiconductor films
US6632282B2 (en) * 2001-09-24 2003-10-14 Neocera, Inc. Planetary multi-substrate holder system for material deposition
DE10320597A1 (de) * 2003-04-30 2004-12-02 Aixtron Ag Verfahren und Vorrichtung zum Abscheiden von Halbleiterschichten mit zwei Prozessgasen, von denen das eine vorkonditioniert ist
US7794667B2 (en) * 2005-10-19 2010-09-14 Moore Epitaxial, Inc. Gas ring and method of processing substrates
US20080079220A1 (en) * 2006-08-29 2008-04-03 Aviza Technology, Inc. Rotary seal for diffusion furnance incorporating nonmetallic seals
JP2013502079A (ja) 2009-08-12 2013-01-17 ジョージア ステート ユニバーシティ リサーチ ファウンデーション，インコーポレイテッド 高圧化学蒸着装置、方法、およびそれにより製造される組成物
JP5310512B2 (ja) * 2009-12-02 2013-10-09 東京エレクトロン株式会社 基板処理装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2260471A (en) * 1940-09-28 1941-10-28 Eastman Kodak Co Nonreflecting coating for glass
US2532971A (en) * 1947-04-12 1950-12-05 Pacific Universal Products Cor Method and apparatus for producing optical coatings
US2997979A (en) * 1958-09-15 1961-08-29 Tassara Luigi Apparatus for applying metallic film to electrical components and the like
US3128205A (en) * 1961-09-11 1964-04-07 Optical Coating Laboratory Inc Apparatus for vacuum coating
US3205087A (en) * 1961-12-15 1965-09-07 Martin Marietta Corp Selective vacuum deposition of thin film
US3442572A (en) * 1964-08-25 1969-05-06 Optical Coating Laboratory Inc Circular variable filter
US3424629A (en) * 1965-12-13 1969-01-28 Ibm High capacity epitaxial apparatus and method
US3408982A (en) * 1966-08-25 1968-11-05 Emil R. Capita Vapor plating apparatus including rotatable substrate support
US3486237A (en) * 1967-09-29 1969-12-30 Bausch & Lomb Positioning tool for vacuum chamber workholder
US3523517A (en) * 1968-09-04 1970-08-11 Sloan Instr Corp Rotating workpiece holder

Also Published As

Publication number Publication date
GB1281539A (en) 1972-07-12
JPS4931197B1 (enrdf_load_stackoverflow) 1974-08-20
FR2027422A1 (enrdf_load_stackoverflow) 1970-09-25
DE1949767B2 (de) 1974-01-10
US3608519A (en) 1971-09-28
DE1949767C3 (de) 1974-08-15
DE1949767A1 (de) 1970-10-15

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