JPS4931197B1 - - Google Patents

Info

Publication number
JPS4931197B1
JPS4931197B1 JP44095146A JP9514669A JPS4931197B1 JP S4931197 B1 JPS4931197 B1 JP S4931197B1 JP 44095146 A JP44095146 A JP 44095146A JP 9514669 A JP9514669 A JP 9514669A JP S4931197 B1 JPS4931197 B1 JP S4931197B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP44095146A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4931197B1 publication Critical patent/JPS4931197B1/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
JP44095146A 1968-12-31 1969-11-28 Pending JPS4931197B1 (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US78825068A 1968-12-31 1968-12-31

Publications (1)

Publication Number Publication Date
JPS4931197B1 true JPS4931197B1 (enrdf_load_stackoverflow) 1974-08-20

Family

ID=25143901

Family Applications (1)

Application Number Title Priority Date Filing Date
JP44095146A Pending JPS4931197B1 (enrdf_load_stackoverflow) 1968-12-31 1969-11-28

Country Status (6)

Country Link
US (1) US3608519A (enrdf_load_stackoverflow)
JP (1) JPS4931197B1 (enrdf_load_stackoverflow)
DE (1) DE1949767C3 (enrdf_load_stackoverflow)
FR (1) FR2027422A1 (enrdf_load_stackoverflow)
GB (1) GB1281539A (enrdf_load_stackoverflow)
NL (1) NL6919568A (enrdf_load_stackoverflow)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3783821A (en) * 1971-03-02 1974-01-08 K Willmott Planetary workholders
NL7103019A (enrdf_load_stackoverflow) * 1971-03-06 1972-09-08
US3783822A (en) * 1972-05-10 1974-01-08 J Wollam Apparatus for use in deposition of films from a vapor phase
US3850138A (en) * 1972-06-22 1974-11-26 Varian Spa Leini Substrate carrying apparatus for use in coating equipment
SE393967B (sv) * 1974-11-29 1977-05-31 Sateko Oy Forfarande och for utforande av stroleggning mellan lagren i ett virkespaket
US3939798A (en) * 1974-12-19 1976-02-24 Texas Instruments Incorporated Optical thin film coater
GB2089840B (en) * 1980-12-20 1983-12-14 Cambridge Instr Ltd Chemical vapour deposition apparatus incorporating radiant heat source for substrate
US4501766A (en) * 1982-02-03 1985-02-26 Tokyo Shibaura Denki Kabushiki Kaisha Film depositing apparatus and a film depositing method
US4673799A (en) * 1985-03-01 1987-06-16 Focus Semiconductor Systems, Inc. Fluidized bed heater for semiconductor processing
JPH01125923A (ja) * 1987-11-11 1989-05-18 Sumitomo Chem Co Ltd 気相成長装置
JPH07122132B2 (ja) * 1990-11-01 1995-12-25 松下電器産業株式会社 薄膜形成方法および薄膜形成装置
KR100333237B1 (ko) * 1993-10-29 2002-09-12 어플라이드 머티어리얼스, 인코포레이티드 플라즈마에칭챔버내에서오염물질을감소시키는장치및방법
US5558721A (en) * 1993-11-15 1996-09-24 The Furukawa Electric Co., Ltd. Vapor phase growth system and a gas-drive motor
US5472592A (en) * 1994-07-19 1995-12-05 American Plating Systems Electrolytic plating apparatus and method
CA2282771A1 (en) * 1999-09-17 2001-03-17 Dale William Mackenzie Method and apparatus for boronizing a metal workpiece
US6475284B1 (en) * 1999-09-20 2002-11-05 Moore Epitaxial, Inc. Gas dispersion head
US6578600B1 (en) 2000-10-31 2003-06-17 International Business Machines Corporation Gas isolation box
US20030010775A1 (en) * 2001-06-21 2003-01-16 Hyoung June Kim Methods and apparatuses for heat treatment of semiconductor films upon thermally susceptible non-conducting substrates
US6632282B2 (en) * 2001-09-24 2003-10-14 Neocera, Inc. Planetary multi-substrate holder system for material deposition
DE10320597A1 (de) * 2003-04-30 2004-12-02 Aixtron Ag Verfahren und Vorrichtung zum Abscheiden von Halbleiterschichten mit zwei Prozessgasen, von denen das eine vorkonditioniert ist
US7794667B2 (en) * 2005-10-19 2010-09-14 Moore Epitaxial, Inc. Gas ring and method of processing substrates
US20080079220A1 (en) * 2006-08-29 2008-04-03 Aviza Technology, Inc. Rotary seal for diffusion furnance incorporating nonmetallic seals
JP2013502079A (ja) 2009-08-12 2013-01-17 ジョージア ステート ユニバーシティ リサーチ ファウンデーション，インコーポレイテッド 高圧化学蒸着装置、方法、およびそれにより製造される組成物
JP5310512B2 (ja) * 2009-12-02 2013-10-09 東京エレクトロン株式会社 基板処理装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2260471A (en) * 1940-09-28 1941-10-28 Eastman Kodak Co Nonreflecting coating for glass
US2532971A (en) * 1947-04-12 1950-12-05 Pacific Universal Products Cor Method and apparatus for producing optical coatings
US2997979A (en) * 1958-09-15 1961-08-29 Tassara Luigi Apparatus for applying metallic film to electrical components and the like
US3128205A (en) * 1961-09-11 1964-04-07 Optical Coating Laboratory Inc Apparatus for vacuum coating
US3205087A (en) * 1961-12-15 1965-09-07 Martin Marietta Corp Selective vacuum deposition of thin film
US3442572A (en) * 1964-08-25 1969-05-06 Optical Coating Laboratory Inc Circular variable filter
US3424629A (en) * 1965-12-13 1969-01-28 Ibm High capacity epitaxial apparatus and method
US3408982A (en) * 1966-08-25 1968-11-05 Emil R. Capita Vapor plating apparatus including rotatable substrate support
US3486237A (en) * 1967-09-29 1969-12-30 Bausch & Lomb Positioning tool for vacuum chamber workholder
US3523517A (en) * 1968-09-04 1970-08-11 Sloan Instr Corp Rotating workpiece holder

Also Published As

Publication number Publication date
FR2027422A1 (enrdf_load_stackoverflow) 1970-09-25
DE1949767A1 (de) 1970-10-15
DE1949767B2 (de) 1974-01-10
GB1281539A (en) 1972-07-12
NL6919568A (enrdf_load_stackoverflow) 1970-07-02
US3608519A (en) 1971-09-28
DE1949767C3 (de) 1974-08-15

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