NL6918388A - - Google Patents

Info

Publication number
NL6918388A
NL6918388A NL6918388A NL6918388A NL6918388A NL 6918388 A NL6918388 A NL 6918388A NL 6918388 A NL6918388 A NL 6918388A NL 6918388 A NL6918388 A NL 6918388A NL 6918388 A NL6918388 A NL 6918388A
Authority
NL
Netherlands
Application number
NL6918388A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL6918388A publication Critical patent/NL6918388A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/308—Chemical or electrical treatment, e.g. electrolytic etching using masks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30604—Chemical etching
    • H01L21/30608—Anisotropic liquid etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Element Separation (AREA)
NL6918388A 1968-12-31 1969-12-08 NL6918388A (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US78817768A 1968-12-31 1968-12-31

Publications (1)

Publication Number Publication Date
NL6918388A true NL6918388A (enrdf_load_stackoverflow) 1970-07-02

Family

ID=25143680

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6918388A NL6918388A (enrdf_load_stackoverflow) 1968-12-31 1969-12-08

Country Status (4)

Country Link
DE (1) DE1965408C3 (enrdf_load_stackoverflow)
FR (1) FR2027429B1 (enrdf_load_stackoverflow)
GB (1) GB1288278A (enrdf_load_stackoverflow)
NL (1) NL6918388A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2058343A1 (enrdf_load_stackoverflow) * 1969-08-18 1971-05-28 Rca Corp

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1439351A (en) * 1972-06-02 1976-06-16 Texas Instruments Inc Capacitor
US4238275A (en) * 1978-12-29 1980-12-09 International Business Machines Corporation Pyrocatechol-amine-water solution for the determination of defects
US4235014A (en) 1979-03-26 1980-11-25 Western Electric Company, Inc. Apparatus for assembling a plurality of articles
US4253280A (en) 1979-03-26 1981-03-03 Western Electric Company, Inc. Method of labelling directional characteristics of an article having two opposite major surfaces
JPH067594B2 (ja) * 1987-11-20 1994-01-26 富士通株式会社 半導体基板の製造方法
JPH0775245B2 (ja) * 1990-11-16 1995-08-09 信越半導体株式会社 誘電体分離基板及びその製造方法
JPH0775244B2 (ja) * 1990-11-16 1995-08-09 信越半導体株式会社 誘電体分離基板及びその製造方法
RU2220449C1 (ru) 2002-12-19 2003-12-27 Акционерное общество закрытого типа "ЛИТЭКС" Способ маркирования изделий с помощью набора меток и метка для маркирования

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3425879A (en) * 1965-10-24 1969-02-04 Texas Instruments Inc Method of making shaped epitaxial deposits
NL144778B (nl) * 1966-12-20 1975-01-15 Western Electric Co Werkwijze voor het vervaardigen van een halfgeleiderinrichting door anisotroop etsen alsmede aldus vervaardigde inrichting.

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2058343A1 (enrdf_load_stackoverflow) * 1969-08-18 1971-05-28 Rca Corp

Also Published As

Publication number Publication date
DE1965408A1 (de) 1970-07-16
GB1288278A (enrdf_load_stackoverflow) 1972-09-06
DE1965408B2 (de) 1978-02-16
FR2027429A1 (enrdf_load_stackoverflow) 1970-09-25
FR2027429B1 (enrdf_load_stackoverflow) 1973-08-10
DE1965408C3 (de) 1979-01-25

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