NL6908366A - - Google Patents
Info
- Publication number
- NL6908366A NL6908366A NL6908366A NL6908366A NL6908366A NL 6908366 A NL6908366 A NL 6908366A NL 6908366 A NL6908366 A NL 6908366A NL 6908366 A NL6908366 A NL 6908366A NL 6908366 A NL6908366 A NL 6908366A
- Authority
- NL
- Netherlands
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/026—Deposition thru hole in mask
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/043—Dual dielectric
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/05—Etch and refill
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/051—Etching
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19681769605 DE1769605A1 (de) | 1968-06-14 | 1968-06-14 | Verfahren zum Herstellen epitaktischer Aufwachsschichten aus Halbleitermaterial fuer elektrische Bauelemente |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL6908366A true NL6908366A (https=) | 1969-12-16 |
Family
ID=5700202
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL6908366A NL6908366A (https=) | 1968-06-14 | 1969-06-02 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US3653991A (https=) |
| AT (2) | AT308828B (https=) |
| CH (1) | CH499879A (https=) |
| DE (1) | DE1769605A1 (https=) |
| FR (1) | FR1595220A (https=) |
| GB (1) | GB1229128A (https=) |
| NL (1) | NL6908366A (https=) |
| SE (1) | SE356439B (https=) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6076652A (en) | 1971-04-16 | 2000-06-20 | Texas Instruments Incorporated | Assembly line system and apparatus controlling transfer of a workpiece |
| US3941647A (en) * | 1973-03-08 | 1976-03-02 | Siemens Aktiengesellschaft | Method of producing epitaxially semiconductor layers |
| US4349394A (en) * | 1979-12-06 | 1982-09-14 | Siemens Corporation | Method of making a zener diode utilizing gas-phase epitaxial deposition |
| US4522662A (en) * | 1983-08-12 | 1985-06-11 | Hewlett-Packard Company | CVD lateral epitaxial growth of silicon over insulators |
| GB2183090B (en) * | 1985-10-07 | 1989-09-13 | Canon Kk | Method for selective formation of deposited film |
| GB2185758B (en) * | 1985-12-28 | 1990-09-05 | Canon Kk | Method for forming deposited film |
| DE3726971A1 (de) * | 1987-08-13 | 1989-02-23 | Standard Elektrik Lorenz Ag | Methode zur herstellung planarer epitaxieschichten mittels selektiver metallorganischer gasphasenepitaxie (movpe) |
| US5064684A (en) * | 1989-08-02 | 1991-11-12 | Eastman Kodak Company | Waveguides, interferometers, and methods of their formation |
| US20090087967A1 (en) * | 2005-11-14 | 2009-04-02 | Todd Michael A | Precursors and processes for low temperature selective epitaxial growth |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL133151C (https=) * | 1959-05-28 | 1900-01-01 | ||
| US3296040A (en) * | 1962-08-17 | 1967-01-03 | Fairchild Camera Instr Co | Epitaxially growing layers of semiconductor through openings in oxide mask |
| US3345209A (en) * | 1964-04-02 | 1967-10-03 | Ibm | Growth control of disproportionation process |
| US3428500A (en) * | 1964-04-25 | 1969-02-18 | Fujitsu Ltd | Process of epitaxial deposition on one side of a substrate with simultaneous vapor etching of the opposite side |
| NL6513397A (https=) * | 1964-11-02 | 1966-05-03 | Siemens Ag | |
| DE1287047B (de) * | 1965-02-18 | 1969-01-16 | Siemens Ag | Verfahren und Vorrichtung zum Abscheiden einer einkristallinen Halbleiterschicht |
| US3345223A (en) * | 1965-09-28 | 1967-10-03 | Ibm | Epitaxial deposition of semiconductor materials |
| US3472689A (en) * | 1967-01-19 | 1969-10-14 | Rca Corp | Vapor deposition of silicon-nitrogen insulating coatings |
| GB1147014A (en) * | 1967-01-27 | 1969-04-02 | Westinghouse Electric Corp | Improvements in diffusion masking |
-
1968
- 1968-06-14 DE DE19681769605 patent/DE1769605A1/de active Pending
- 1968-12-17 FR FR1595220D patent/FR1595220A/fr not_active Expired
-
1969
- 1969-06-02 NL NL6908366A patent/NL6908366A/xx unknown
- 1969-06-10 SE SE08257/69A patent/SE356439B/xx unknown
- 1969-06-12 AT AT1050569A patent/AT308828B/de not_active IP Right Cessation
- 1969-06-12 CH CH902369A patent/CH499879A/de not_active IP Right Cessation
- 1969-06-12 AT AT559469A patent/AT306794B/de not_active IP Right Cessation
- 1969-06-13 GB GB1229128D patent/GB1229128A/en not_active Expired
- 1969-06-16 US US833818A patent/US3653991A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| AT308828B (de) | 1973-07-25 |
| DE1769605A1 (de) | 1971-07-01 |
| SE356439B (https=) | 1973-05-28 |
| FR1595220A (https=) | 1970-06-08 |
| GB1229128A (https=) | 1971-04-21 |
| CH499879A (de) | 1970-11-30 |
| AT306794B (de) | 1973-04-25 |
| US3653991A (en) | 1972-04-04 |