NL6813787A - - Google Patents

Info

Publication number
NL6813787A
NL6813787A NL6813787A NL6813787A NL6813787A NL 6813787 A NL6813787 A NL 6813787A NL 6813787 A NL6813787 A NL 6813787A NL 6813787 A NL6813787 A NL 6813787A NL 6813787 A NL6813787 A NL 6813787A
Authority
NL
Netherlands
Application number
NL6813787A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL6813787A publication Critical patent/NL6813787A/xx

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00—Subject matter not provided for in other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/043—Dual dielectric
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/051—Etching
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/053—Field effect transistors fets
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/141—Self-alignment coat gate
NL6813787A 1967-09-26 1968-09-26 NL6813787A (en:Method)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US67063567A 1967-09-26 1967-09-26

Publications (1)

Publication Number Publication Date
NL6813787A true NL6813787A (en:Method) 1969-03-28

Family

ID=24691194

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6813787A NL6813787A (en:Method) 1967-09-26 1968-09-26

Country Status (6)

Country Link
US (1) US3528168A (en:Method)
DE (1) DE1789024A1 (en:Method)
FR (1) FR1585978A (en:Method)
GB (1) GB1242896A (en:Method)
NL (1) NL6813787A (en:Method)
SE (1) SE351526B (en:Method)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3781806A (en) * 1969-12-15 1973-12-25 Nippon Telegraph & Telephone Semiconductor switching element and a semiconductor switching involving the same
US3659161A (en) * 1970-01-02 1972-04-25 Licentia Gmbh Blocking field effect transistor
DE2120388A1 (de) * 1970-04-28 1971-12-16 Agency Ind Science Techn Verbindungshalbleitervorrichtung
DE2021923B2 (de) * 1970-05-05 1976-07-22 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zum herstellen eines feldeffekttransistors mit isolierter gateelektrode
US3753806A (en) * 1970-09-23 1973-08-21 Motorola Inc Increasing field inversion voltage of metal oxide on silicon integrated circuits
US3700976A (en) * 1970-11-02 1972-10-24 Hughes Aircraft Co Insulated gate field effect transistor adapted for microwave applications
USRE28952E (en) * 1971-03-17 1976-08-31 Rca Corporation Shaped riser on substrate step for promoting metal film continuity
US3703667A (en) * 1971-03-17 1972-11-21 Rca Corp Shaped riser on substrate step for promoting metal film continuity
JPS575052B1 (en:Method) * 1971-06-16 1982-01-28
JPS5712542B2 (en:Method) * 1971-08-11 1982-03-11
US3927418A (en) * 1971-12-11 1975-12-16 Sony Corp Charge transfer device
FR2228301B1 (en:Method) * 1973-05-03 1977-10-14 Ibm
JPS5069975A (en:Method) * 1973-10-23 1975-06-11
US4830975A (en) * 1983-01-13 1989-05-16 National Semiconductor Corporation Method of manufacture a primos device
US4588454A (en) * 1984-12-21 1986-05-13 Linear Technology Corporation Diffusion of dopant into a semiconductor wafer
US5293073A (en) * 1989-06-27 1994-03-08 Kabushiki Kaisha Toshiba Electrode structure of a semiconductor device which uses a copper wire as a bonding wire
US5882958A (en) * 1997-09-03 1999-03-16 Wanlass; Frank M. Damascene method for source drain definition of silicon on insulator MOS transistors
US6180465B1 (en) * 1998-11-20 2001-01-30 Advanced Micro Devices Method of making high performance MOSFET with channel scaling mask feature
US6200865B1 (en) * 1998-12-04 2001-03-13 Advanced Micro Devices, Inc. Use of sacrificial dielectric structure to form semiconductor device with a self-aligned threshold adjust and overlying low-resistance gate
US6210999B1 (en) 1998-12-04 2001-04-03 Advanced Micro Devices, Inc. Method and test structure for low-temperature integration of high dielectric constant gate dielectrics into self-aligned semiconductor devices
JP2009141260A (ja) * 2007-12-10 2009-06-25 Elpida Memory Inc 半導体装置、及びその製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE637065A (en:Method) * 1962-09-07
GB1094068A (en) * 1963-12-26 1967-12-06 Rca Corp Semiconductive devices and methods of producing them
US3246173A (en) * 1964-01-29 1966-04-12 Rca Corp Signal translating circuit employing insulated-gate field effect transistors coupledthrough a common semiconductor substrate
US3374407A (en) * 1964-06-01 1968-03-19 Rca Corp Field-effect transistor with gate-insulator variations to achieve remote cutoff characteristic
US3305708A (en) * 1964-11-25 1967-02-21 Rca Corp Insulated-gate field-effect semiconductor device
GB1045429A (en) * 1965-03-31 1966-10-12 Standard Telephones Cables Ltd Transistors

Also Published As

Publication number Publication date
GB1242896A (en) 1971-08-18
SE351526B (en:Method) 1972-11-27
US3528168A (en) 1970-09-15
DE1789024A1 (de) 1972-01-05
FR1585978A (en:Method) 1970-02-06

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