NL6813382A - - Google Patents
Info
- Publication number
- NL6813382A NL6813382A NL6813382A NL6813382A NL6813382A NL 6813382 A NL6813382 A NL 6813382A NL 6813382 A NL6813382 A NL 6813382A NL 6813382 A NL6813382 A NL 6813382A NL 6813382 A NL6813382 A NL 6813382A
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US66864867A | 1967-09-18 | 1967-09-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL6813382A true NL6813382A (xx) | 1969-03-20 |
Family
ID=24683196
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL6813382A NL6813382A (xx) | 1967-09-18 | 1968-09-18 |
Country Status (8)
| Country | Link |
|---|---|
| AT (1) | AT287742B (xx) |
| BE (1) | BE720748A (xx) |
| CH (1) | CH520957A (xx) |
| DE (1) | DE1797352A1 (xx) |
| ES (1) | ES358264A1 (xx) |
| FR (1) | FR1597523A (xx) |
| GB (1) | GB1217719A (xx) |
| NL (1) | NL6813382A (xx) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102004004865B4 (de) | 2004-01-30 | 2008-01-10 | Qimonda Ag | Antireflexschicht, die mit einem Photoresist beschichtet ist, enthaltend Polymere auf der Basis von Zimtsäure für die 157 nm Photolithographie |
-
1968
- 1968-09-10 FR FR1597523D patent/FR1597523A/fr not_active Expired
- 1968-09-12 BE BE720748D patent/BE720748A/xx unknown
- 1968-09-16 AT AT899268A patent/AT287742B/de not_active IP Right Cessation
- 1968-09-16 CH CH1379268A patent/CH520957A/de not_active IP Right Cessation
- 1968-09-18 GB GB4425168A patent/GB1217719A/en not_active Expired
- 1968-09-18 NL NL6813382A patent/NL6813382A/xx unknown
- 1968-09-18 ES ES358264A patent/ES358264A1/es not_active Expired
- 1968-09-18 DE DE19681797352 patent/DE1797352A1/de active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| GB1217719A (en) | 1970-12-31 |
| ES358264A1 (es) | 1970-04-01 |
| CH520957A (de) | 1972-03-31 |
| AT287742B (de) | 1971-02-10 |
| BE720748A (xx) | 1969-03-12 |
| FR1597523A (xx) | 1970-06-29 |
| DE1797352A1 (de) | 1971-03-18 |