FR1597523A - - Google Patents

Info

Publication number
FR1597523A
FR1597523A FR1597523DA FR1597523A FR 1597523 A FR1597523 A FR 1597523A FR 1597523D A FR1597523D A FR 1597523DA FR 1597523 A FR1597523 A FR 1597523A
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Other languages
French (fr)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Application granted granted Critical
Publication of FR1597523A publication Critical patent/FR1597523A/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
FR1597523D 1967-09-18 1968-09-10 Expired FR1597523A (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US66864867A 1967-09-18 1967-09-18

Publications (1)

Publication Number Publication Date
FR1597523A true FR1597523A (xx) 1970-06-29

Family

ID=24683196

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1597523D Expired FR1597523A (xx) 1967-09-18 1968-09-10

Country Status (8)

Country Link
AT (1) AT287742B (xx)
BE (1) BE720748A (xx)
CH (1) CH520957A (xx)
DE (1) DE1797352A1 (xx)
ES (1) ES358264A1 (xx)
FR (1) FR1597523A (xx)
GB (1) GB1217719A (xx)
NL (1) NL6813382A (xx)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004004865B4 (de) * 2004-01-30 2008-01-10 Qimonda Ag Antireflexschicht, die mit einem Photoresist beschichtet ist, enthaltend Polymere auf der Basis von Zimtsäure für die 157 nm Photolithographie

Also Published As

Publication number Publication date
BE720748A (xx) 1969-03-12
GB1217719A (en) 1970-12-31
DE1797352A1 (de) 1971-03-18
AT287742B (de) 1971-02-10
NL6813382A (xx) 1969-03-20
CH520957A (de) 1972-03-31
ES358264A1 (es) 1970-04-01

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Legal Events

Date Code Title Description
ST Notification of lapse