ES358264A1 - Procedimiento para la produccion de una placa de imprimir planografica bimetalica. - Google Patents
Procedimiento para la produccion de una placa de imprimir planografica bimetalica.Info
- Publication number
- ES358264A1 ES358264A1 ES358264A ES358264A ES358264A1 ES 358264 A1 ES358264 A1 ES 358264A1 ES 358264 A ES358264 A ES 358264A ES 358264 A ES358264 A ES 358264A ES 358264 A1 ES358264 A1 ES 358264A1
- Authority
- ES
- Spain
- Prior art keywords
- allyl
- ester
- esters
- ambient temperature
- actinic radiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- -1 allylic ester Chemical class 0.000 abstract 7
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 abstract 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 abstract 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 abstract 3
- 239000011347 resin Substances 0.000 abstract 3
- 229920005989 resin Polymers 0.000 abstract 3
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 abstract 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 abstract 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 abstract 2
- 150000002148 esters Chemical class 0.000 abstract 2
- 238000006116 polymerization reaction Methods 0.000 abstract 2
- 230000005855 radiation Effects 0.000 abstract 2
- NQBWNECTZUOWID-UHFFFAOYSA-N (E)-cinnamyl (E)-cinnamate Natural products C=1C=CC=CC=1C=CC(=O)OCC=CC1=CC=CC=C1 NQBWNECTZUOWID-UHFFFAOYSA-N 0.000 abstract 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 abstract 1
- 239000001636 3-phenylprop-2-enyl 3-phenylprop-2-enoate Substances 0.000 abstract 1
- NQBWNECTZUOWID-MZXMXVKLSA-N Cinnamyl cinnamate Chemical compound C=1C=CC=CC=1/C=C/C(=O)OC\C=C\C1=CC=CC=C1 NQBWNECTZUOWID-MZXMXVKLSA-N 0.000 abstract 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 abstract 1
- 244000028419 Styrax benzoin Species 0.000 abstract 1
- 235000000126 Styrax benzoin Nutrition 0.000 abstract 1
- 235000008411 Sumatra benzointree Nutrition 0.000 abstract 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 abstract 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 abstract 1
- 125000001931 aliphatic group Chemical group 0.000 abstract 1
- 125000003545 alkoxy group Chemical group 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 150000008425 anthrones Chemical class 0.000 abstract 1
- 229960002130 benzoin Drugs 0.000 abstract 1
- 239000012965 benzophenone Substances 0.000 abstract 1
- 150000008366 benzophenones Chemical class 0.000 abstract 1
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- 229920001577 copolymer Polymers 0.000 abstract 1
- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 abstract 1
- 125000004185 ester group Chemical group 0.000 abstract 1
- 235000019382 gum benzoic Nutrition 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 125000005843 halogen group Chemical group 0.000 abstract 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 239000000178 monomer Substances 0.000 abstract 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
- 150000004053 quinones Chemical class 0.000 abstract 1
- 230000001235 sensitizing effect Effects 0.000 abstract 1
- 239000007787 solid Substances 0.000 abstract 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US66864867A | 1967-09-18 | 1967-09-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES358264A1 true ES358264A1 (es) | 1970-04-01 |
Family
ID=24683196
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES358264A Expired ES358264A1 (es) | 1967-09-18 | 1968-09-18 | Procedimiento para la produccion de una placa de imprimir planografica bimetalica. |
Country Status (8)
| Country | Link |
|---|---|
| AT (1) | AT287742B (es) |
| BE (1) | BE720748A (es) |
| CH (1) | CH520957A (es) |
| DE (1) | DE1797352A1 (es) |
| ES (1) | ES358264A1 (es) |
| FR (1) | FR1597523A (es) |
| GB (1) | GB1217719A (es) |
| NL (1) | NL6813382A (es) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102004004865B4 (de) | 2004-01-30 | 2008-01-10 | Qimonda Ag | Antireflexschicht, die mit einem Photoresist beschichtet ist, enthaltend Polymere auf der Basis von Zimtsäure für die 157 nm Photolithographie |
-
1968
- 1968-09-10 FR FR1597523D patent/FR1597523A/fr not_active Expired
- 1968-09-12 BE BE720748D patent/BE720748A/xx unknown
- 1968-09-16 AT AT899268A patent/AT287742B/de not_active IP Right Cessation
- 1968-09-16 CH CH1379268A patent/CH520957A/de not_active IP Right Cessation
- 1968-09-18 NL NL6813382A patent/NL6813382A/xx unknown
- 1968-09-18 DE DE19681797352 patent/DE1797352A1/de active Pending
- 1968-09-18 ES ES358264A patent/ES358264A1/es not_active Expired
- 1968-09-18 GB GB4425168A patent/GB1217719A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| GB1217719A (en) | 1970-12-31 |
| DE1797352A1 (de) | 1971-03-18 |
| BE720748A (es) | 1969-03-12 |
| CH520957A (de) | 1972-03-31 |
| FR1597523A (es) | 1970-06-29 |
| AT287742B (de) | 1971-02-10 |
| NL6813382A (es) | 1969-03-20 |
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