NL6807439A - - Google Patents
Info
- Publication number
- NL6807439A NL6807439A NL6807439A NL6807439A NL6807439A NL 6807439 A NL6807439 A NL 6807439A NL 6807439 A NL6807439 A NL 6807439A NL 6807439 A NL6807439 A NL 6807439A NL 6807439 A NL6807439 A NL 6807439A
- Authority
- NL
- Netherlands
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/3002—Details
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/04—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using optical elements ; using other beam accessed elements, e.g. electron or ion beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/3002—Details
- H01J37/3007—Electron or ion-optical systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/302—Controlling tubes by external information, e.g. programme control
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/15—Means for deflecting or directing discharge
- H01J2237/151—Electrostatic means
- H01J2237/1514—Prisms
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S101/00—Printing
- Y10S101/37—Printing employing electrostatic force
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL6807439A NL6807439A (US07166745-20070123-C00016.png) | 1968-05-27 | 1968-05-27 | |
| GB26485/69A GB1269156A (en) | 1968-05-27 | 1969-05-23 | Electron beam apparatus for recording image elements |
| US827510A US3638231A (en) | 1968-05-27 | 1969-05-26 | Device for recording with electron rays |
| DE19691926849 DE1926849A1 (de) | 1968-05-27 | 1969-05-27 | Vorrichtung zur Registrierung mit Elektronenstrahlen |
| CA052646A CA921548A (en) | 1968-05-27 | 1969-05-27 | Device for recording with electron rays |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL6807439A NL6807439A (US07166745-20070123-C00016.png) | 1968-05-27 | 1968-05-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL6807439A true NL6807439A (US07166745-20070123-C00016.png) | 1969-12-01 |
Family
ID=19803740
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL6807439A NL6807439A (US07166745-20070123-C00016.png) | 1968-05-27 | 1968-05-27 |
Country Status (5)
Families Citing this family (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1301030B (de) * | 1967-10-19 | 1969-08-14 | Hakle Werke Hans Klenk | Halter fuer Papierrollen |
| US4041532A (en) * | 1971-04-28 | 1977-08-09 | Decca Limited Of Decca House | Method of recording wide-band signals on a thermoplastic film by use of a beam of electrons |
| US3750189A (en) * | 1971-10-18 | 1973-07-31 | Ibm | Light scanning and printing system |
| DE2241850C3 (de) * | 1972-08-25 | 1978-06-29 | European Rotogravure Association, 8000 Muenchen | Verfahren zur Herstellung von Druckformen mittels eines Energiestrahles |
| US4000440A (en) * | 1974-07-26 | 1976-12-28 | International Business Machines Corporation | Method and apparatus for controlling brightness and alignment of a beam of charged particles |
| JPS5129091A (ja) * | 1974-09-06 | 1976-03-11 | Kogyo Gijutsuin | Pataankeiseisochi |
| US4010318A (en) * | 1975-05-20 | 1977-03-01 | Rca Corporation | Probe forming electron optical column having means for examining magnified image of the probe source |
| US3956635A (en) * | 1975-06-13 | 1976-05-11 | International Business Machines Corporation | Combined multiple beam size and spiral scan method for electron beam writing of microcircuit patterns |
| JPS5251871A (en) * | 1975-10-23 | 1977-04-26 | Rikagaku Kenkyusho | Projecting method for charge particle beams |
| JPS5283177A (en) * | 1975-12-31 | 1977-07-11 | Fujitsu Ltd | Electron beam exposure device |
| US4393312A (en) * | 1976-02-05 | 1983-07-12 | Bell Telephone Laboratories, Incorporated | Variable-spot scanning in an electron beam exposure system |
| GB1523033A (en) * | 1976-03-03 | 1978-08-31 | Crosfield Electronics Ltd | Image reproducing systems |
| JPS52126760U (US07166745-20070123-C00016.png) * | 1976-03-24 | 1977-09-27 | ||
| JPS52122083A (en) * | 1976-04-02 | 1977-10-13 | Jeol Ltd | Electron beam exposing device |
| NL177578C (nl) * | 1976-05-14 | 1985-10-16 | Thomson Csf | Inrichting voor het beschrijven van een voorwerp met een deeltjesbundel. |
| JPS6051261B2 (ja) * | 1976-05-26 | 1985-11-13 | 株式会社東芝 | 荷電粒子ビ−ム描画装置 |
| JPS52151568A (en) * | 1976-06-11 | 1977-12-16 | Jeol Ltd | Electron beam exposure apparatus |
| DE2627632A1 (de) * | 1976-06-19 | 1977-12-22 | Jenoptik Jena Gmbh | Verfahren und einrichtung zur nichtthermischen elektronenstrahlbearbeitung |
| FR2361190A1 (fr) * | 1976-08-09 | 1978-03-10 | Zeiss Carl Fa | Procede et dispositif d'usinage a froid par faisceau electronique |
| JPS5625233Y2 (US07166745-20070123-C00016.png) * | 1976-09-01 | 1981-06-15 | ||
| JPS6040186B2 (ja) * | 1976-11-04 | 1985-09-10 | 富士通株式会社 | 磁場形成装置 |
| CA1166766A (en) * | 1977-02-23 | 1984-05-01 | Hans C. Pfeiffer | Method and apparatus for forming a variable size electron beam |
| FR2412939A1 (fr) * | 1977-12-23 | 1979-07-20 | Anvar | Implanteur d'ions a fort courant |
| US4277685A (en) * | 1978-06-12 | 1981-07-07 | Ohio-Nuclear, Inc. | Adjustable collimator |
| JPS54101982U (US07166745-20070123-C00016.png) * | 1978-10-12 | 1979-07-18 | ||
| US4243866A (en) * | 1979-01-11 | 1981-01-06 | International Business Machines Corporation | Method and apparatus for forming a variable size electron beam |
| DE2947444C2 (de) * | 1979-11-24 | 1983-12-08 | Dr.-Ing. Rudolf Hell Gmbh, 2300 Kiel | Elektronenstrahl-Gravierverfahren |
| WO1982001787A1 (en) * | 1980-11-22 | 1982-05-27 | Grieger Dieter | Method for engraving by means of an electron beam |
| US4445041A (en) * | 1981-06-02 | 1984-04-24 | Hewlett-Packard Company | Electron beam blanker |
| DE3138896A1 (de) * | 1981-09-30 | 1983-04-14 | Siemens AG, 1000 Berlin und 8000 München | Elektronenoptisches system mit vario-formstrahl zur erzeugung und messung von mikrostrukturen |
| NL8602196A (nl) * | 1986-08-29 | 1988-03-16 | Philips Nv | Geladen deeltjes bestralingsapparaat met optisch vervormbaar bundel begrenzend diafragma. |
| GB8911392D0 (en) * | 1989-05-18 | 1989-07-05 | Humphreys Colin J | Fabrication of electronic devices |
| JP5420678B2 (ja) * | 2009-12-11 | 2014-02-19 | 株式会社日立製作所 | 電子線バイプリズム装置および電子線装置 |
| EP2365514B1 (en) * | 2010-03-10 | 2015-08-26 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Twin beam charged particle column and method of operating thereof |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3118050A (en) * | 1960-04-06 | 1964-01-14 | Alloyd Electronics Corp | Electron beam devices and processes |
| US3113896A (en) * | 1961-01-31 | 1963-12-10 | Space Technology Lab Inc | Electron beam masking for etching electrical circuits |
| DE1301209B (de) * | 1964-07-24 | 1969-08-14 | Steigerwald Strahltech | Verfahren zum Abtragen, insbesondere zum Perforieren von flexiblen Kunststoffen |
| US3491236A (en) * | 1967-09-28 | 1970-01-20 | Gen Electric | Electron beam fabrication of microelectronic circuit patterns |
-
1968
- 1968-05-27 NL NL6807439A patent/NL6807439A/xx unknown
-
1969
- 1969-05-23 GB GB26485/69A patent/GB1269156A/en not_active Expired
- 1969-05-26 US US827510A patent/US3638231A/en not_active Expired - Lifetime
- 1969-05-27 CA CA052646A patent/CA921548A/en not_active Expired
- 1969-05-27 DE DE19691926849 patent/DE1926849A1/de active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| CA921548A (en) | 1973-02-20 |
| GB1269156A (en) | 1972-04-06 |
| DE1926849A1 (de) | 1969-12-11 |
| US3638231A (en) | 1972-01-25 |
