NL6615541A - - Google Patents

Info

Publication number
NL6615541A
NL6615541A NL6615541A NL6615541A NL6615541A NL 6615541 A NL6615541 A NL 6615541A NL 6615541 A NL6615541 A NL 6615541A NL 6615541 A NL6615541 A NL 6615541A NL 6615541 A NL6615541 A NL 6615541A
Authority
NL
Netherlands
Application number
NL6615541A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL6615541A publication Critical patent/NL6615541A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)
NL6615541A 1965-11-10 1966-11-03 NL6615541A (en:Method)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US507103A US3397672A (en) 1965-11-10 1965-11-10 Control system for vapor-deposition coating apparatus

Publications (1)

Publication Number Publication Date
NL6615541A true NL6615541A (en:Method) 1967-05-11

Family

ID=24017264

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6615541A NL6615541A (en:Method) 1965-11-10 1966-11-03

Country Status (7)

Country Link
US (1) US3397672A (en:Method)
BE (1) BE689369A (en:Method)
DE (1) DE1521573A1 (en:Method)
ES (1) ES333150A1 (en:Method)
FR (1) FR1498949A (en:Method)
GB (1) GB1168813A (en:Method)
NL (1) NL6615541A (en:Method)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3636916A (en) * 1966-03-14 1972-01-25 Optical Coating Laboratory Inc Coating apparatus and system
GB1168641A (en) * 1966-05-19 1969-10-29 British Iron Steel Research Formation of Polymer Coatings on Substrates.
FR1534681A (fr) * 1966-06-15 1968-08-02 Michel A Braguier Procédé de métallisation au zinc en continu d'une bande en matière diélectrique
GB1173978A (en) * 1967-11-14 1969-12-10 Edwards High Vaccum Internat L Vacuum Deposition Apparatus
GB1281572A (en) * 1968-11-22 1972-07-12 Vepa Ag Device and method for treating a material length
US3907607A (en) * 1969-07-14 1975-09-23 Corning Glass Works Continuous processing of ribbon material
US3853093A (en) * 1970-01-14 1974-12-10 Optical Coating Laboratory Inc Optical thickness rate monitor
US3709192A (en) * 1970-06-01 1973-01-09 Sierracin Corp Coating control system
DE2345157C2 (de) * 1973-09-07 1975-09-18 August Thyssen-Huette Ag, 4100 Duisburg Vorrichtung zum Abstreifen von Metall beim Feuermetallisieren von Metallbändern
DE3330092A1 (de) * 1983-08-20 1985-03-07 Leybold-Heraeus GmbH, 5000 Köln Verfahren zum einstellen der oertlichen verdampfungsleistung an verdampfern in vakuumaufdampfprozessen
DE3706495A1 (de) * 1987-04-29 1988-09-15 Vtu Angel Kancev Stromversorgungsschaltung fuer elektronenstrahl-verdampfer
US6652654B1 (en) * 2000-09-27 2003-11-25 Bechtel Bwxt Idaho, Llc System configured for applying multiple modifying agents to a substrate
US6623686B1 (en) * 2000-09-28 2003-09-23 Bechtel Bwxt Idaho, Llc System configured for applying a modifying agent to a non-equidimensional substrate
US20050244580A1 (en) * 2004-04-30 2005-11-03 Eastman Kodak Company Deposition apparatus for temperature sensitive materials
WO2015092998A1 (ja) * 2013-12-20 2015-06-25 株式会社アルバック 電子銃装置及び真空蒸着装置
DE102020200366A1 (de) * 2019-04-23 2020-10-29 Sms Group Gmbh PVD Dickenregelung
CN113817992B (zh) * 2021-10-28 2025-02-11 成都天一国泰真空设备有限公司 一种用于真空镀膜机电子枪的电磁铁偏转结构
CN115491663B (zh) * 2022-11-21 2023-03-24 常州翊迈新材料科技有限公司 燃料电池金属极板涂层厚度在线监控装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2860075A (en) * 1951-01-27 1958-11-11 Continental Can Co Method of making a heater for vacuum deposition
CH311812A (de) * 1951-11-05 1955-12-15 Zeiss Carl Fa Aufdampfeinrichtung.
US2872341A (en) * 1954-09-10 1959-02-03 Int Resistance Co Method of providing an adherent metal coating on a fluorocarbon resin
US2903547A (en) * 1957-08-21 1959-09-08 Continental Can Co Vaporizing element connector and method
US2930879A (en) * 1957-12-16 1960-03-29 New York Air Brake Co Vaporization of metals
DE1156521B (de) * 1961-09-05 1963-10-31 Heraeus Gmbh W C Elektronenstrahlkanone zum Erhitzen von Metallen
US3146335A (en) * 1962-03-29 1964-08-25 United Aircraft Corp Focusing device for electron beams
DE1199097B (de) * 1962-09-25 1965-08-19 Heraeus Gmbh W C Vorrichtung zum Vakuumbedampfen breiter Baender, insbesondere mit Metallen, durch Erhitzen des Verdampfungsgutes mittels Elektronenstrahlen
DE1261971B (de) * 1963-02-13 1968-02-29 United Aircraft Corp Einrichtung zum Schweissen, Schneiden oder zur Materialbearbeitung mittels eines Ladungstraegerstrahls
US3235480A (en) * 1963-04-08 1966-02-15 Electra Mfg Company Thermionic evaporation rate controller
GB1065060A (en) * 1963-04-19 1967-04-12 United Aircraft Corp Improvements in and relating to apparatus for working articles with energised beams
US3235647A (en) * 1963-06-06 1966-02-15 Temescal Metallurgical Corp Electron bombardment heating with adjustable impact pattern
US3244855A (en) * 1963-07-19 1966-04-05 United States Steel Corp System for correcting the shift of an electron-gun beam from the desired region of impingement
US3281265A (en) * 1963-09-17 1966-10-25 United States Steel Corp Method and apparatus for controlling coating thickness by electron beam evaporation
US3276902A (en) * 1963-10-01 1966-10-04 Itt Method of vapor deposition employing an electron beam

Also Published As

Publication number Publication date
US3397672A (en) 1968-08-20
FR1498949A (fr) 1967-10-20
GB1168813A (en) 1969-10-29
BE689369A (en:Method) 1967-05-08
ES333150A1 (es) 1967-07-16
DE1521573A1 (de) 1969-11-06

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