NL6414317A - - Google Patents

Info

Publication number
NL6414317A
NL6414317A NL6414317A NL6414317A NL6414317A NL 6414317 A NL6414317 A NL 6414317A NL 6414317 A NL6414317 A NL 6414317A NL 6414317 A NL6414317 A NL 6414317A NL 6414317 A NL6414317 A NL 6414317A
Authority
NL
Netherlands
Application number
NL6414317A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL6414317A publication Critical patent/NL6414317A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0381—Macromolecular compounds which are rendered insoluble or differentially wettable using a combination of a phenolic resin and a polyoxyethylene resin
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
    • C08L61/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L71/00—Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
    • C08L71/02—Polyalkylene oxides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/126—Halogen compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
NL6414317A 1963-12-09 1964-12-09 NL6414317A (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US32924763A 1963-12-09 1963-12-09

Publications (1)

Publication Number Publication Date
NL6414317A true NL6414317A (xx) 1965-06-10

Family

ID=23284526

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6414317A NL6414317A (xx) 1963-12-09 1964-12-09

Country Status (4)

Country Link
US (1) US3615532A (xx)
BE (1) BE656799A (xx)
DE (3) DE1447920B2 (xx)
NL (1) NL6414317A (xx)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7109179A (xx) * 1970-07-13 1972-01-17
JPS4833905A (xx) * 1971-09-02 1973-05-15
GB1375461A (xx) * 1972-05-05 1974-11-27
US3793033A (en) * 1972-09-05 1974-02-19 Minnesota Mining & Mfg Development-free printing plate
US3899332A (en) * 1972-09-11 1975-08-12 Lith Kem Corp Printing plate and method of making the same
US3837858A (en) * 1972-09-11 1974-09-24 Lith Kem Corp Printing plate and method of making the same
US3836366A (en) * 1972-09-11 1974-09-17 Lith Kem Corp Planographic printing plates and method for their preparation
US4036644A (en) * 1973-03-16 1977-07-19 International Business Machines Corporation Photoresist process and photosensitive O-quinone diazide article with aliphatic carboxylic acid as adhesion promotor
US4123279A (en) * 1974-03-25 1978-10-31 Fuji Photo Film Co., Ltd. Light-sensitive o-quinonediazide containing planographic printing plate
US4259430A (en) * 1974-05-01 1981-03-31 International Business Machines Corporation Photoresist O-quinone diazide containing composition and resist mask formation process
US4009033A (en) * 1975-09-22 1977-02-22 International Business Machines Corporation High speed positive photoresist composition
DE2626419C2 (de) * 1976-06-12 1982-10-21 Ibm Deutschland Gmbh, 7000 Stuttgart Lichtempfindliches Gemisch
JPS533216A (en) * 1976-06-28 1978-01-12 Fuji Photo Film Co Ltd Diazo photosensitive composition
US4284706A (en) * 1979-12-03 1981-08-18 International Business Machines Corporation Lithographic resist composition for a lift-off process
JPS58502169A (ja) * 1981-12-21 1983-12-15 インステイテユ−ト　ヒミイ　アカデミイ　ナウク　エスエスエスア−ル フォト−及び電子線レジスト

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1292577A (fr) * 1960-07-06 1962-05-04 Union Carbide Corp Compositions photosensibles pour clichés

Also Published As

Publication number Publication date
DE1447920B2 (de) 1971-09-23
BE656799A (xx) 1965-04-01
US3615532A (en) 1971-10-26
DE1772274B1 (de) 1971-10-28
DE1447920A1 (de) 1969-04-24
DE1797518B2 (de) 1974-01-10
DE1797518A1 (de) 1971-11-04
DE1797518C3 (de) 1974-08-15

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