NL6412070A - - Google Patents

Info

Publication number
NL6412070A
NL6412070A NL6412070A NL6412070A NL6412070A NL 6412070 A NL6412070 A NL 6412070A NL 6412070 A NL6412070 A NL 6412070A NL 6412070 A NL6412070 A NL 6412070A NL 6412070 A NL6412070 A NL 6412070A
Authority
NL
Netherlands
Application number
NL6412070A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL6412070A publication Critical patent/NL6412070A/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387Polyamides or polyimides
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/008Azides
    • G03F7/012Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/32Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • ing And Chemical Polishing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Printing Methods (AREA)
NL6412070A 1963-10-26 1964-10-16 NL6412070A (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK0051191 1963-10-26

Publications (1)

Publication Number Publication Date
NL6412070A true NL6412070A (xx) 1965-04-27

Family

ID=7225906

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6412070A NL6412070A (xx) 1963-10-26 1964-10-16

Country Status (6)

Country Link
US (1) US3321309A (xx)
AT (1) AT250407B (xx)
CH (1) CH433989A (xx)
DE (1) DE1447017B2 (xx)
GB (1) GB1071560A (xx)
NL (1) NL6412070A (xx)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1447931A1 (de) * 1965-09-08 1968-12-12 Basf Ag Verfahren zum Herstellen von Reliefformen fuer Druckzwecke
DE1572070C3 (de) * 1966-03-12 1979-03-22 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Kopiermaterial
US3650744A (en) * 1970-03-02 1972-03-21 Gen Electric Etching method using photopolymerizable vapors as the photoresist
US4036644A (en) * 1973-03-16 1977-07-19 International Business Machines Corporation Photoresist process and photosensitive O-quinone diazide article with aliphatic carboxylic acid as adhesion promotor
JPS5236042B2 (xx) * 1973-11-19 1977-09-13
JPS5239289B2 (xx) * 1974-07-01 1977-10-04
JPS5677843A (en) * 1979-11-30 1981-06-26 Fujitsu Ltd Resist pattern forming method
US4549824A (en) * 1983-12-30 1985-10-29 International Business Machines Corporation Ink additives for efficient thermal ink transfer printing processes

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE456355A (xx) * 1939-10-07
US2474923A (en) * 1945-01-23 1949-07-05 Du Pont Modification of polyamides
NL92921C (xx) * 1954-06-19

Also Published As

Publication number Publication date
AT250407B (de) 1966-11-10
DE1447017B2 (de) 1971-08-12
US3321309A (en) 1967-05-23
DE1447017A1 (de) 1968-11-07
CH433989A (de) 1967-04-15
GB1071560A (en) 1967-06-07

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