AT250407B - Verfahren zur Herstellung ätzfester Kopierschichten auf Metallunterlagen - Google Patents
Verfahren zur Herstellung ätzfester Kopierschichten auf MetallunterlagenInfo
- Publication number
- AT250407B AT250407B AT902964A AT902964A AT250407B AT 250407 B AT250407 B AT 250407B AT 902964 A AT902964 A AT 902964A AT 902964 A AT902964 A AT 902964A AT 250407 B AT250407 B AT 250407B
- Authority
- AT
- Austria
- Prior art keywords
- etch
- production
- metal substrates
- proof copy
- copy layers
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0387—Polyamides or polyimides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
- G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- ing And Chemical Polishing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Printing Methods (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEK0051191 | 1963-10-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AT250407B true AT250407B (de) | 1966-11-10 |
Family
ID=7225906
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT902964A AT250407B (de) | 1963-10-26 | 1964-10-23 | Verfahren zur Herstellung ätzfester Kopierschichten auf Metallunterlagen |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3321309A (de) |
| AT (1) | AT250407B (de) |
| CH (1) | CH433989A (de) |
| DE (1) | DE1447017B2 (de) |
| GB (1) | GB1071560A (de) |
| NL (1) | NL6412070A (de) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1447931A1 (de) * | 1965-09-08 | 1968-12-12 | Basf Ag | Verfahren zum Herstellen von Reliefformen fuer Druckzwecke |
| DE1572070C3 (de) * | 1966-03-12 | 1979-03-22 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches Kopiermaterial |
| US3650744A (en) * | 1970-03-02 | 1972-03-21 | Gen Electric | Etching method using photopolymerizable vapors as the photoresist |
| US4036644A (en) * | 1973-03-16 | 1977-07-19 | International Business Machines Corporation | Photoresist process and photosensitive O-quinone diazide article with aliphatic carboxylic acid as adhesion promotor |
| JPS5236042B2 (de) * | 1973-11-19 | 1977-09-13 | ||
| JPS5239289B2 (de) * | 1974-07-01 | 1977-10-04 | ||
| JPS5677843A (en) * | 1979-11-30 | 1981-06-26 | Fujitsu Ltd | Resist pattern forming method |
| US4549824A (en) * | 1983-12-30 | 1985-10-29 | International Business Machines Corporation | Ink additives for efficient thermal ink transfer printing processes |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE456355A (de) * | 1939-10-07 | |||
| US2474923A (en) * | 1945-01-23 | 1949-07-05 | Du Pont | Modification of polyamides |
| BE539017A (de) * | 1954-06-19 |
-
1963
- 1963-10-26 DE DE19631447017 patent/DE1447017B2/de not_active Withdrawn
-
1964
- 1964-10-16 NL NL6412070A patent/NL6412070A/xx unknown
- 1964-10-23 CH CH1377164A patent/CH433989A/de unknown
- 1964-10-23 GB GB43386/64A patent/GB1071560A/en not_active Expired
- 1964-10-23 AT AT902964A patent/AT250407B/de active
- 1964-10-23 US US406163A patent/US3321309A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US3321309A (en) | 1967-05-23 |
| DE1447017A1 (de) | 1968-11-07 |
| CH433989A (de) | 1967-04-15 |
| NL6412070A (de) | 1965-04-27 |
| GB1071560A (en) | 1967-06-07 |
| DE1447017B2 (de) | 1971-08-12 |
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